JP2005521747A - フェニルオルガノシリコン中間体を製造する方法 - Google Patents
フェニルオルガノシリコン中間体を製造する方法 Download PDFInfo
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- JP2005521747A JP2005521747A JP2003582167A JP2003582167A JP2005521747A JP 2005521747 A JP2005521747 A JP 2005521747A JP 2003582167 A JP2003582167 A JP 2003582167A JP 2003582167 A JP2003582167 A JP 2003582167A JP 2005521747 A JP2005521747 A JP 2005521747A
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- solvent
- phenyl
- mixture
- dialkyl ether
- aromatic halogenated
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract description 108
- 239000002904 solvent Substances 0.000 claims abstract description 52
- 238000000034 method Methods 0.000 claims abstract description 46
- 125000003118 aryl group Chemical group 0.000 claims abstract description 29
- -1 phenyl Grignard reagent Chemical class 0.000 claims abstract description 27
- 239000007818 Grignard reagent Substances 0.000 claims abstract description 22
- 150000004795 grignard reagents Chemical class 0.000 claims abstract description 20
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 20
- 239000002243 precursor Substances 0.000 claims abstract description 15
- 239000005046 Chlorosilane Substances 0.000 claims abstract description 11
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000011877 solvent mixture Substances 0.000 claims abstract description 3
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Substances ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 claims description 58
- 239000000203 mixture Substances 0.000 claims description 30
- 150000001983 dialkylethers Chemical class 0.000 claims description 22
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- 238000006243 chemical reaction Methods 0.000 claims description 17
- 230000008569 process Effects 0.000 claims description 12
- 239000006184 cosolvent Substances 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
- 239000000460 chlorine Substances 0.000 claims description 8
- 229910052801 chlorine Inorganic materials 0.000 claims description 8
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 8
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 7
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 7
- 229910052794 bromium Chemical group 0.000 claims description 7
- 150000004820 halides Chemical class 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 5
- 229920002554 vinyl polymer Chemical group 0.000 claims description 4
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical group C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims description 3
- 239000005055 methyl trichlorosilane Substances 0.000 claims description 3
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 claims description 3
- 239000005049 silicon tetrachloride Substances 0.000 claims description 3
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 claims description 2
- BSGONOOEHPZOMN-UHFFFAOYSA-N dichloro(ethenyl)silane Chemical compound Cl[SiH](Cl)C=C BSGONOOEHPZOMN-UHFFFAOYSA-N 0.000 claims description 2
- NWKBSEBOBPHMKL-UHFFFAOYSA-N dichloro(methyl)silane Chemical compound C[SiH](Cl)Cl NWKBSEBOBPHMKL-UHFFFAOYSA-N 0.000 claims description 2
- VIRVTHOOZABTPR-UHFFFAOYSA-N dichloro(phenyl)silane Chemical compound Cl[SiH](Cl)C1=CC=CC=C1 VIRVTHOOZABTPR-UHFFFAOYSA-N 0.000 claims description 2
- MAYIDWCWWMOISO-UHFFFAOYSA-N dichloro-bis(ethenyl)silane Chemical compound C=C[Si](Cl)(Cl)C=C MAYIDWCWWMOISO-UHFFFAOYSA-N 0.000 claims description 2
- YLJJAVFOBDSYAN-UHFFFAOYSA-N dichloro-ethenyl-methylsilane Chemical compound C[Si](Cl)(Cl)C=C YLJJAVFOBDSYAN-UHFFFAOYSA-N 0.000 claims description 2
- GNEPOXWQWFSSOU-UHFFFAOYSA-N dichloro-methyl-phenylsilane Chemical compound C[Si](Cl)(Cl)C1=CC=CC=C1 GNEPOXWQWFSSOU-UHFFFAOYSA-N 0.000 claims description 2
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000005054 phenyltrichlorosilane Substances 0.000 claims description 2
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 claims description 2
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 claims description 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 2
- 239000005050 vinyl trichlorosilane Substances 0.000 claims description 2
- MVPPADPHJFYWMZ-IDEBNGHGSA-N chlorobenzene Chemical group Cl[13C]1=[13CH][13CH]=[13CH][13CH]=[13CH]1 MVPPADPHJFYWMZ-IDEBNGHGSA-N 0.000 claims 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 2
- 238000011437 continuous method Methods 0.000 claims 1
- 238000005859 coupling reaction Methods 0.000 abstract description 18
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 abstract description 16
- 229910052749 magnesium Inorganic materials 0.000 abstract description 9
- 239000011777 magnesium Substances 0.000 abstract description 9
- 239000003054 catalyst Substances 0.000 abstract description 3
- 239000007795 chemical reaction product Substances 0.000 abstract description 3
- 238000001914 filtration Methods 0.000 abstract description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract description 2
- 229910000077 silane Inorganic materials 0.000 abstract description 2
- IWCVDCOJSPWGRW-UHFFFAOYSA-M magnesium;benzene;chloride Chemical compound [Mg+2].[Cl-].C1=CC=[C-]C=C1 IWCVDCOJSPWGRW-UHFFFAOYSA-M 0.000 description 39
- 239000000543 intermediate Substances 0.000 description 16
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 11
- 239000007788 liquid Substances 0.000 description 8
- 239000011541 reaction mixture Substances 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- 239000012530 fluid Substances 0.000 description 7
- 230000008878 coupling Effects 0.000 description 6
- 238000010168 coupling process Methods 0.000 description 6
- 239000012535 impurity Substances 0.000 description 6
- 238000004817 gas chromatography Methods 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- KVNYFPKFSJIPBJ-UHFFFAOYSA-N ortho-diethylbenzene Natural products CCC1=CC=CC=C1CC KVNYFPKFSJIPBJ-UHFFFAOYSA-N 0.000 description 4
- IIYFAKIEWZDVMP-UHFFFAOYSA-N tridecane Chemical compound CCCCCCCCCCCCC IIYFAKIEWZDVMP-UHFFFAOYSA-N 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000009977 dual effect Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- SZNYYWIUQFZLLT-UHFFFAOYSA-N 2-methyl-1-(2-methylpropoxy)propane Chemical compound CC(C)COCC(C)C SZNYYWIUQFZLLT-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 235000011089 carbon dioxide Nutrition 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical group 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002431 hydrogen Chemical group 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- RQUBQBFVDOLUKC-UHFFFAOYSA-N 1-ethoxy-2-methylpropane Chemical compound CCOCC(C)C RQUBQBFVDOLUKC-UHFFFAOYSA-N 0.000 description 1
- PZHIWRCQKBBTOW-UHFFFAOYSA-N 1-ethoxybutane Chemical compound CCCCOCC PZHIWRCQKBBTOW-UHFFFAOYSA-N 0.000 description 1
- ZYVYEJXMYBUCMN-UHFFFAOYSA-N 1-methoxy-2-methylpropane Chemical compound COCC(C)C ZYVYEJXMYBUCMN-UHFFFAOYSA-N 0.000 description 1
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 1
- 238000003747 Grignard reaction Methods 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- XOBKSJJDNFUZPF-UHFFFAOYSA-N Methoxyethane Chemical compound CCOC XOBKSJJDNFUZPF-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 230000009918 complex formation Effects 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- ZLRROLLKQDRDPI-UHFFFAOYSA-L disodium;4,5-dihydroxybenzene-1,3-disulfonate;hydrate Chemical compound O.[Na+].[Na+].OC1=CC(S([O-])(=O)=O)=CC(S([O-])(=O)=O)=C1O ZLRROLLKQDRDPI-UHFFFAOYSA-L 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 230000002140 halogenating effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 159000000003 magnesium salts Chemical class 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010887 waste solvent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C7/00—Purification; Separation; Use of additives
- C07C7/04—Purification; Separation; Use of additives by distillation
- C07C7/05—Purification; Separation; Use of additives by distillation with the aid of auxiliary compounds
- C07C7/08—Purification; Separation; Use of additives by distillation with the aid of auxiliary compounds by extractive distillation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
- C07F7/122—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-C linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Water Supply & Treatment (AREA)
Abstract
Description
次の例のための装置は、加熱マントル及び支持ジャッキ上に置かれた500ml三つ口丸底ガラスフラスコから成り、しかも該ガラスフラスコには、中央口に機械撹拌機、添加漏斗とサンプリングのためのゴムセプタムを備えたクライゼンアダプター、該フラスコの第3口に第2クライゼンアダプターが適合され、第2クライゼンアダプターは温度計及び10球型水凝縮器を保持し、該水凝縮器の上には、ドライアイス凝縮器がイソプロパノール凝縮器の上に置かれたドライアイス/イソプロパノール還流凝縮器が置かれていた。該装置はまた、窒素導入システムも備えている。
比率が1:0.08:4のPhMgCl/ジエチルエーテル/PhClであるPhCl中のPhMgClグリニャールの使用/カップリング1:4:3のPhMgCl/PhCl/MeSiCl3のモル比
PhMgCl:ジエチルエーテルのモル比が1:4であるジエチルエーテル中のPhMgClの使用/カップリングPhMgCl:ジエチルエーテル:PhCl:MeSiCl3について1:4:3:3のモル比
カップリングPhMgCl/ジエチルエーテル/PhCl/MeSiCl3について1:4:2:5のモル比
1:4のPhMgCl/PhClのモル比でもってのPhCl中のPhMgClの使用/1:5.5:1.5のPhMgCl/PhCl/MeViSiCl2のモル比でもってPhCl中のPhMgClを用いてのMeViSiCl2とのカップリング
PhMgCl:PhCl:MeSiCl3のモル比が1:5.5:3であるところの1:4のPhMgCl/PhClのモル比でもってのPhCl中のMeSiCl3とPhCl中のPhMgClとのカップリング反応
Claims (19)
- フェニル含有オルガノシリコン中間体を製造する方法であって、該方法が
(I)フェニル含有グリニャール試薬を一般式RaSiX4-a(ここで、各Rは独立してフェニル基、ビニル基、メチル基又は水素から選択され、Xは塩素又は臭素であり、そしてaは0、1又は2の値を有する)を有する前駆体クロロシランと接触させ、
(II)該フェニル含有グリニャール試薬を該前駆体クロロシランと反応させてフェニル含有オルガノシリコン中間体を形成させる
ことを含み、しかも該反応を次の群すなわち
(i)ジアルキルエーテル溶媒と芳香族ハロゲン化溶媒との混合物、
(ii)ジアルキルエーテル溶媒の混合物と芳香族ハロゲン化溶媒との混合物
を含む溶媒の存在下で行う方法。 - 方法が約0℃から約200℃の温度にて行われる、請求項1に記載の方法。
- 方法が約周囲圧から約200psigの圧力にて行われる、請求項1に記載の方法。
- 方法が不活性雰囲気中で行われる、請求項1に記載の方法。
- 不活性雰囲気が窒素である、請求項4に記載の方法。
- 芳香族ハロゲン化溶媒対ジアルキルエーテル溶媒の比率が約0.2:2から0.5:2の範囲にある、請求項1に記載の方法。
- ジアルキルエーテルがジエチルエーテルである、請求項1に記載の方法。
- フェニル含有オルガノシリコン中間体を製造する方法であって、該方法がマグネシウム金属を
(i)フェニルハライド(ここで、ハライドは塩素及び臭素から選択される)、
(ii)一般式RaSiX4-a(ここで、各Rは独立してフェニル基、ビニル基、メチル基又は水素から選択され、Xは塩素又は臭素であり、そしてaは0、1又は2の値を有する)を有するクロロシラン、
(iii)共溶媒であって
(a)ジアルキルエーテル溶媒と芳香族ハロゲン化溶媒との混合物、
(b)ジアルキルエーテル溶媒の混合物と芳香族ハロゲン化溶媒との混合物
から成る群から選択された共溶媒
を含む混合物と接触させることを含む方法。 - 方法が約0℃から約200℃の温度にて行われる、請求項8に記載の方法。
- 方法が約周囲圧から約200psigの圧力にて行われる、請求項8に記載の方法。
- 方法が不活性雰囲気中で行われる、請求項8に記載の方法。
- 不活性雰囲気が窒素である、請求項11に記載の方法。
- 芳香族ハロゲン化溶媒対ジアルキルエーテル溶媒の比率が約0.2:2から0.5:2の範囲にある、請求項8に記載の方法。
- ジアルキルエーテルがジエチルエーテルである、請求項8に記載の方法。
- ジアルキルエーテルがジエチルエーテルであり、そして共溶媒がクロロベンゼンである、請求項1に記載の方法。
- ジアルキルエーテルがジエチルエーテルであり、そして共溶媒がクロロベンゼンである、請求項8に記載の方法。
- 方法が連続法である、請求項8に記載の方法。
- クロロベンゼン溶媒及びジアルキルエーテル溶媒がグリニャール反応器に循環し戻される、請求項16に記載の方法。
- 前駆体クロロシランが、四塩化ケイ素、メチルトリクロロシラン、ジメチルジクロロシラン、フェニルメチルジクロロシラン、フェニルトリクロロシラン、ジフェニルジクロロシラン、ビニルトリクロロシラン、ヒドリドトリクロロシラン、ジビニルジクロロシラン、メチルビニルジクロロシラン、フェニルビニルジクロロシラン、ヒドリドメチルジクロロシラン、ヒドリドフェニルジクロロシラン、ヒドリドビニルジクロロシラン及びジヒドリドジクロロシランから成る群から選択される、請求項8に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/117,259 US7084206B2 (en) | 2002-04-04 | 2002-04-04 | Process for preparing phenylorganosilicon intermediates |
PCT/US2003/009696 WO2003084970A1 (en) | 2002-04-04 | 2003-03-28 | Process for preparing phenylorganosilicon intermediates |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005521747A true JP2005521747A (ja) | 2005-07-21 |
JP4435572B2 JP4435572B2 (ja) | 2010-03-17 |
Family
ID=28674162
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003582167A Expired - Fee Related JP4435572B2 (ja) | 2002-04-04 | 2003-03-28 | フェニルオルガノシリコン中間体を製造する方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7084206B2 (ja) |
EP (1) | EP1495032B1 (ja) |
JP (1) | JP4435572B2 (ja) |
KR (1) | KR100953007B1 (ja) |
CN (1) | CN1298725C (ja) |
AU (1) | AU2003226138A1 (ja) |
DE (1) | DE60314113T2 (ja) |
WO (1) | WO2003084970A1 (ja) |
Cited By (1)
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WO2013100166A1 (en) | 2011-12-27 | 2013-07-04 | Dow Corning Toray Co., Ltd. | Method of producing an organic silicon compound |
Families Citing this family (7)
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ATE449778T1 (de) * | 2004-01-06 | 2009-12-15 | Dow Corning | Grignard-verfahren mit verbesserter ausbeutung an diphenylchlorsilanen |
RU2354660C2 (ru) * | 2004-01-06 | 2009-05-10 | Дау Корнинг Корпорейшн | Способ гриньяра с повышенным содержанием дифенилхлорсиланов |
WO2006083665A1 (en) * | 2005-02-01 | 2006-08-10 | Dow Corning Corporation | Method of making phenyl-containing chlorosilanes with aliphatic or cycloparaffinic hydrocarbon solvents |
CN103304588A (zh) * | 2012-03-06 | 2013-09-18 | 蚌埠合众硅氟新材料有限公司 | 一种由四氯化硅制备氯硅烷的方法 |
EP2970343B1 (en) | 2013-03-15 | 2017-10-25 | Dow Corning Corporation | A method of preparing dialkyl-diaryl-, and alkylaryl-dihalosilanes with high selectivity in a grignard coupling reaction |
CN103601701A (zh) * | 2013-11-25 | 2014-02-26 | 成都摩尔生物医药有限公司 | 一种左旋氯哌斯汀芬地柞酸盐的制备方法 |
CN104193775B (zh) * | 2014-08-08 | 2017-02-01 | 广东省工业技术研究院(广州有色金属研究院) | 格氏法制备含苯基乙烯基的有机硅封端剂的方法 |
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US2795628A (en) * | 1954-05-12 | 1957-06-11 | Metal & Thermit Corp | Preparation of phenyl magnesium chloride |
US2795627A (en) * | 1954-05-12 | 1957-06-11 | Metal & Thermit Corp | Preparation of phenyl magnesium chloride |
US2894012A (en) * | 1955-02-01 | 1959-07-07 | Metal & Thermit Corp | Grignard reactions in presence of cyclic ethers |
US4687874A (en) * | 1980-02-12 | 1987-08-18 | Exxon Research And Engineering Company | Selective hydroformylation process using alkyl diaryl phosphine rhodium carbonyl hydride catalysts |
DD243031A1 (de) * | 1985-11-29 | 1987-02-18 | Nuenchritz Chemie | Verfahren zur herstellung von triorganosiliciumverbindungen |
DD243028A1 (de) * | 1985-11-29 | 1987-02-18 | Nuenchritz Chemie | Verfahren zur herstellung von vinyldiorganochlorsilanen |
JPH03109389A (ja) * | 1989-09-22 | 1991-05-09 | Hitachi Chem Co Ltd | ビス(3,4―ジメチルフエニル)ジメチルシランの製造法 |
US5596120A (en) * | 1995-10-23 | 1997-01-21 | Dow Corning Corporation | Process for preparation of organosilanes |
RU2174124C2 (ru) * | 1999-12-03 | 2001-09-27 | Государственный научный центр Российской Федерации Государственный научно-исследовательский институт химии и технологии элементоорганических соединений | Способ получения трифенилсиланола |
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WO2013100166A1 (en) | 2011-12-27 | 2013-07-04 | Dow Corning Toray Co., Ltd. | Method of producing an organic silicon compound |
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US20030191238A1 (en) | 2003-10-09 |
WO2003084970A1 (en) | 2003-10-16 |
EP1495032B1 (en) | 2007-05-30 |
DE60314113T2 (de) | 2008-01-24 |
AU2003226138A1 (en) | 2003-10-20 |
DE60314113D1 (de) | 2007-07-12 |
KR20040111481A (ko) | 2004-12-31 |
US7084206B2 (en) | 2006-08-01 |
JP4435572B2 (ja) | 2010-03-17 |
CN1298725C (zh) | 2007-02-07 |
CN1656105A (zh) | 2005-08-17 |
KR100953007B1 (ko) | 2010-04-14 |
EP1495032A1 (en) | 2005-01-12 |
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