JP2005517784A5 - - Google Patents

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Publication number
JP2005517784A5
JP2005517784A5 JP2003569713A JP2003569713A JP2005517784A5 JP 2005517784 A5 JP2005517784 A5 JP 2005517784A5 JP 2003569713 A JP2003569713 A JP 2003569713A JP 2003569713 A JP2003569713 A JP 2003569713A JP 2005517784 A5 JP2005517784 A5 JP 2005517784A5
Authority
JP
Japan
Prior art keywords
percent
formula
sio
spin
organosiloxane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003569713A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005517784A (ja
Filing date
Publication date
Priority claimed from US10/078,919 external-priority patent/US7011889B2/en
Priority claimed from US10/161,561 external-priority patent/US6962727B2/en
Application filed filed Critical
Publication of JP2005517784A publication Critical patent/JP2005517784A/ja
Publication of JP2005517784A5 publication Critical patent/JP2005517784A5/ja
Pending legal-status Critical Current

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JP2003569713A 2002-02-19 2003-02-19 オルガノシロキサン Pending JP2005517784A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/078,919 US7011889B2 (en) 1998-03-20 2002-02-19 Organosiloxanes
US10/161,561 US6962727B2 (en) 1998-03-20 2002-06-03 Organosiloxanes
PCT/US2003/005171 WO2003070809A2 (en) 2002-02-19 2003-02-19 Organosiloxanes and their use in dielectric films of semiconductors

Publications (2)

Publication Number Publication Date
JP2005517784A JP2005517784A (ja) 2005-06-16
JP2005517784A5 true JP2005517784A5 (https=) 2006-04-06

Family

ID=27759927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003569713A Pending JP2005517784A (ja) 2002-02-19 2003-02-19 オルガノシロキサン

Country Status (4)

Country Link
US (1) US6962727B2 (https=)
JP (1) JP2005517784A (https=)
AU (1) AU2003219826A1 (https=)
WO (1) WO2003070809A2 (https=)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6713234B2 (en) * 1999-02-18 2004-03-30 Micron Technology, Inc. Fabrication of semiconductor devices using anti-reflective coatings
AU2814000A (en) * 1999-02-26 2000-09-14 Trikon Holdings Limited A method of processing a polymer layer
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
JP2003502449A (ja) 1999-06-10 2003-01-21 ハネウエル・インターナシヨナル・インコーポレーテツド フォトリソグラフィ用スピンオンガラス反射防止コーティング
US7115531B2 (en) * 2000-08-21 2006-10-03 Dow Global Technologies Inc. Organosilicate resins as hardmasks for organic polymer dielectrics in fabrication of microelectronic devices
JP2006526672A (ja) * 2003-04-11 2006-11-24 シレクス オサケユキチュア 低ｋ誘電体形成用有機シルセスキオキサン重合体
WO2004101651A1 (en) * 2003-05-08 2004-11-25 Honeywell International Inc. Minimization of coating defects for compositions comprising silicon-based compounds and methods of producing and processing
JP4702055B2 (ja) * 2003-07-29 2011-06-15 東亞合成株式会社 珪素含有高分子化合物及びその製造方法
US7488565B2 (en) * 2003-10-01 2009-02-10 Chevron U.S.A. Inc. Photoresist compositions comprising diamondoid derivatives
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP4542927B2 (ja) * 2005-03-17 2010-09-15 富士フイルム株式会社 膜形成用組成物、該組成物から得られた絶縁膜およびそれを有する電子デバイス
US7329716B2 (en) * 2005-04-18 2008-02-12 Yazaki Corporation Siloxane oligomers by phase transfer catalysis
KR20070095736A (ko) * 2006-03-22 2007-10-01 제일모직주식회사 유기실란계 중합체를 포함하는 레지스트 하층막용 하드마스크 조성물 및 이를 이용한 반도체 집적회로 디바이스의 제조방법
US8450148B2 (en) * 2006-12-14 2013-05-28 Infineon Technologies, Ag Molding compound adhesion for map-molded flip-chip
TWI434891B (zh) * 2007-02-22 2014-04-21 賽倫斯股份有限公司 積體電路用高矽含量矽氧烷聚合物
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8111797B2 (en) * 2007-05-08 2012-02-07 Tdc Acquisition Holdings, Inc. Enhanced system and method for detecting the leading edge of a waveform
KR20100114075A (ko) * 2008-01-15 2010-10-22 다우 코닝 코포레이션 실세스퀴옥산 수지
CN102318044A (zh) * 2008-05-08 2012-01-11 巴斯夫欧洲公司 包含碳化硅层的层型结构、其制备方法及其用途
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
KR101869246B1 (ko) * 2012-01-13 2018-07-20 엘지이노텍 주식회사 발광소자 패키지
JP6270514B2 (ja) * 2014-02-03 2018-01-31 スリーエム イノベイティブ プロパティズ カンパニー ボンド磁石用バインダー、ボンド磁石用組成物、ボンド磁石及びその製造方法
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング
US10325863B2 (en) * 2017-02-28 2019-06-18 Kabushiki Kaisha Toshiba Semiconductor device and method for manufacturing same
WO2026079244A1 (ja) * 2024-10-08 2026-04-16 東亞合成株式会社 シロキサン系化合物、コーティング層付構造体、蒸着膜形成用組成物、蒸着膜、硬化物及びコーティング層付構造体の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1561922A (https=) * 1966-08-16 1969-04-04
DE3278567D1 (en) * 1981-10-03 1988-07-07 Japan Synthetic Rubber Co Ltd Solvent-soluble organopolysilsesquioxanes, processes for producing the same, and compositions and semiconductor devices using the same
US4808687A (en) * 1988-01-04 1989-02-28 Dow Corning Corporation Novel organopolysiloxanes derived from bis-silyl substituted heterocyclic compounds
JP2718231B2 (ja) * 1990-01-10 1998-02-25 三菱電機株式会社 高純度末端ヒドロキシフェニルラダーシロキサンプレポリマーの製造方法および高純度末端ヒドロキシフェニルラダーポリシロキサンの製造方法
JPH05190684A (ja) * 1992-01-16 1993-07-30 Mitsubishi Electric Corp 半導体装置およびその製造方法
US5494750A (en) * 1993-05-10 1996-02-27 Shin-Etsu Chemical Co., Ltd. Heat-curable silicone elastomer composition
US5589162A (en) * 1994-04-28 1996-12-31 Kao Corporation Hair setting agent composition
DE19531568A1 (de) * 1995-08-28 1997-03-06 Bayer Ag Flüssige Organopolysiloxan-Harze, ein Verfahren zu deren Herstellung, niedrigviskose Polydiorganosiloxan-Zusammensetzungen, enthaltend flüssige Organopolysiloxan-Harze und deren Verwendung
US6143855A (en) * 1997-04-21 2000-11-07 Alliedsignal Inc. Organohydridosiloxane resins with high organic content

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