JP2005515299A - 帯状の材料を被覆するための真空被覆設備 - Google Patents

帯状の材料を被覆するための真空被覆設備 Download PDF

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Publication number
JP2005515299A
JP2005515299A JP2003547677A JP2003547677A JP2005515299A JP 2005515299 A JP2005515299 A JP 2005515299A JP 2003547677 A JP2003547677 A JP 2003547677A JP 2003547677 A JP2003547677 A JP 2003547677A JP 2005515299 A JP2005515299 A JP 2005515299A
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JP
Japan
Prior art keywords
reel
vacuum coating
roller frame
vacuum
coating equipment
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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JP2003547677A
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English (en)
Japanese (ja)
Inventor
エルプカム・ヴォルフガング
ヘヒト・ハンス−クリスティアン
シュトゥデント・ハンス−ヨッヘン
ウンゲンツ・ペーター
Original Assignee
フオン・アルデンネ・アンラーゲンテヒニク・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング
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Application filed by フオン・アルデンネ・アンラーゲンテヒニク・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング filed Critical フオン・アルデンネ・アンラーゲンテヒニク・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング
Publication of JP2005515299A publication Critical patent/JP2005515299A/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP2003547677A 2001-11-22 2002-11-22 帯状の材料を被覆するための真空被覆設備 Pending JP2005515299A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2001157186 DE10157186C1 (de) 2001-11-22 2001-11-22 Vakuumbeschichtungsanlage zum Beschichten von bandförmigen Material
PCT/DE2002/004300 WO2003046251A1 (de) 2001-11-22 2002-11-22 Vakuumbeschichtungsanlage zum beschichten von bandförmigen material

Publications (1)

Publication Number Publication Date
JP2005515299A true JP2005515299A (ja) 2005-05-26

Family

ID=7706504

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003547677A Pending JP2005515299A (ja) 2001-11-22 2002-11-22 帯状の材料を被覆するための真空被覆設備

Country Status (4)

Country Link
JP (1) JP2005515299A (de)
CN (1) CN1589336A (de)
DE (1) DE10157186C1 (de)
WO (1) WO2003046251A1 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010519417A (ja) * 2007-02-26 2010-06-03 ライボルト オプティクス ゲゼルシャフト ミット ベシュレンクテル ハフツング 帯材状の基板を真空処理するための処理装置
JP2013539157A (ja) * 2010-07-21 2013-10-17 シーメンス アクチエンゲゼルシヤフト 基板上に超電導層を形成するための方法及び装置

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004006131B4 (de) 2004-02-07 2005-12-15 Applied Films Gmbh & Co. Kg Bandbeschichtungsanlage mit einer Vakuumkammer und einer Beschichtungswalze
DE502004009166D1 (de) * 2004-05-25 2009-04-23 Applied Materials Gmbh & Co Kg Bandbehandlungsanlage
ES2336870B1 (es) 2007-08-20 2011-02-18 Novogenio, S.L. Sistema y procedimiento para el recubrimiento en vacio y en continuo de un material en forma de banda.
DE102010040077B4 (de) 2010-08-31 2014-09-11 Von Ardenne Anlagentechnik Gmbh Vakuumbehandlungsverfahren und Vorrichtung zur Durchführung des Verfahrens
DE102011015875A1 (de) 2011-04-04 2012-10-04 Von Ardenne Anlagentechnik Gmbh Transportvorrichtung für bandförmige Substrate in einer Vakuumanlage
JP5930791B2 (ja) * 2011-04-28 2016-06-08 日東電工株式会社 真空成膜方法、及び該方法によって得られる積層体
JP5831759B2 (ja) * 2011-04-28 2015-12-09 日東電工株式会社 真空成膜方法、及び該方法によって得られる積層体
DE102013107690B4 (de) 2013-06-21 2017-12-28 Von Ardenne Gmbh Bandsubstratbehandlungsanlage
DE102013112067B4 (de) 2013-11-01 2018-01-04 Von Ardenne Gmbh Bandsubstratbehandlungsanlage
DE202014102847U1 (de) 2014-06-23 2014-07-14 Von Ardenne Gmbh Bandsubstrat-Vakuumbeschichtungsanlage
DE102014113036A1 (de) 2014-09-10 2015-08-20 Von Ardenne Gmbh Anordnung und Verfahren zur Beschichtung eines bandförmigen Substrats
DE102014115386B4 (de) 2014-10-22 2018-08-23 VON ARDENNE Asset GmbH & Co. KG Vakuum-Substratbehandlungsanlage
DE102015114187B4 (de) 2015-08-26 2018-10-11 Solayer Gmbh Durchlauf-Folienbehandlungsanlage vertikal ausgerichteter Substrate

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1078402B (de) * 1956-12-06 1960-03-24 Heraeus Gmbh W C Vorrichtung zum Vakuumbedampfen von Baendern
DE19735603C1 (de) * 1997-08-15 1998-11-19 Ardenne Anlagentech Gmbh Vakuumbeschichtungsanlage für Mehrschichtsysteme

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010519417A (ja) * 2007-02-26 2010-06-03 ライボルト オプティクス ゲゼルシャフト ミット ベシュレンクテル ハフツング 帯材状の基板を真空処理するための処理装置
US9297065B2 (en) 2007-02-26 2016-03-29 Leybold Optics Gmbh Vacuum treatment of strip-shaped substrates
JP2013539157A (ja) * 2010-07-21 2013-10-17 シーメンス アクチエンゲゼルシヤフト 基板上に超電導層を形成するための方法及び装置

Also Published As

Publication number Publication date
DE10157186C1 (de) 2003-01-16
WO2003046251A1 (de) 2003-06-05
CN1589336A (zh) 2005-03-02

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