JP2005504855A5 - - Google Patents

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Publication number
JP2005504855A5
JP2005504855A5 JP2003525576A JP2003525576A JP2005504855A5 JP 2005504855 A5 JP2005504855 A5 JP 2005504855A5 JP 2003525576 A JP2003525576 A JP 2003525576A JP 2003525576 A JP2003525576 A JP 2003525576A JP 2005504855 A5 JP2005504855 A5 JP 2005504855A5
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JP
Japan
Prior art keywords
chamber
processing chamber
plasma
processing
polymer material
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Application number
JP2003525576A
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English (en)
Japanese (ja)
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JP4163617B2 (ja
JP2005504855A (ja
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Priority claimed from US09/947,035 external-priority patent/US6617152B2/en
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Publication of JP2005504855A publication Critical patent/JP2005504855A/ja
Publication of JP2005504855A5 publication Critical patent/JP2005504855A5/ja
Application granted granted Critical
Publication of JP4163617B2 publication Critical patent/JP4163617B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003525576A 2001-09-04 2002-07-18 高分子材基板上に細胞成長表面を形成するための方法 Expired - Fee Related JP4163617B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/947,035 US6617152B2 (en) 2001-09-04 2001-09-04 Method for creating a cell growth surface on a polymeric substrate
PCT/US2002/022926 WO2003020872A1 (en) 2001-09-04 2002-07-18 Method for creating a cell growth surface on a polymeric substrate

Publications (3)

Publication Number Publication Date
JP2005504855A JP2005504855A (ja) 2005-02-17
JP2005504855A5 true JP2005504855A5 (enExample) 2006-01-05
JP4163617B2 JP4163617B2 (ja) 2008-10-08

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ID=25485405

Family Applications (1)

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JP2003525576A Expired - Fee Related JP4163617B2 (ja) 2001-09-04 2002-07-18 高分子材基板上に細胞成長表面を形成するための方法

Country Status (6)

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US (2) US6617152B2 (enExample)
EP (1) EP1430108B1 (enExample)
JP (1) JP4163617B2 (enExample)
CA (1) CA2459353A1 (enExample)
DK (1) DK1430108T3 (enExample)
WO (1) WO2003020872A1 (enExample)

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