JP2005501725A - フラックス組成物 - Google Patents
フラックス組成物 Download PDFInfo
- Publication number
- JP2005501725A JP2005501725A JP2003525081A JP2003525081A JP2005501725A JP 2005501725 A JP2005501725 A JP 2005501725A JP 2003525081 A JP2003525081 A JP 2003525081A JP 2003525081 A JP2003525081 A JP 2003525081A JP 2005501725 A JP2005501725 A JP 2005501725A
- Authority
- JP
- Japan
- Prior art keywords
- composition
- diyl
- electrical component
- solder
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 0 CC*(C)CCCc1cc(CCC=Cc2ccccc2*)cc(N=C[C@@]2C=CC=CC2O)c1 Chemical compound CC*(C)CCCc1cc(CCC=Cc2ccccc2*)cc(N=C[C@@]2C=CC=CC2O)c1 0.000 description 5
- JNTALZQQKZISTE-UKMFPDFFSA-N C/C=C(/C=N\c(cccc1)c1O)\C(\O)=C/C=C Chemical compound C/C=C(/C=N\c(cccc1)c1O)\C(\O)=C/C=C JNTALZQQKZISTE-UKMFPDFFSA-N 0.000 description 1
- POBSASSOTKISBO-UHFFFAOYSA-N C=C=C1C(O)=CC=CC1 Chemical compound C=C=C1C(O)=CC=CC1 POBSASSOTKISBO-UHFFFAOYSA-N 0.000 description 1
- JESXATFQYMPTNL-UHFFFAOYSA-N C=Cc1ccccc1O Chemical compound C=Cc1ccccc1O JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 1
- WBVRHWXXZXYGLO-UHFFFAOYSA-N CC(C1)C2C3(C4)[O]14C3C2 Chemical compound CC(C1)C2C3(C4)[O]14C3C2 WBVRHWXXZXYGLO-UHFFFAOYSA-N 0.000 description 1
- NXCABRUOYRCTMD-XDHOZWIPSA-N Nc1ccccc1/C=N/CCCNCc1ccccc1O Chemical compound Nc1ccccc1/C=N/CCCNCc1ccccc1O NXCABRUOYRCTMD-XDHOZWIPSA-N 0.000 description 1
- POLJRSQMPKDDIY-ZROIWOOFSA-N Oc(cc1)ccc1/N=C\c1ccccc1O Chemical compound Oc(cc1)ccc1/N=C\c1ccccc1O POLJRSQMPKDDIY-ZROIWOOFSA-N 0.000 description 1
- FQDNLXCEOIUHJQ-FYJGNVAPSA-N Oc1c(CNc(cc2)ccc2/N=C/c(cccc2)c2O)cccc1 Chemical compound Oc1c(CNc(cc2)ccc2/N=C/c(cccc2)c2O)cccc1 FQDNLXCEOIUHJQ-FYJGNVAPSA-N 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/563—Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/29—Compounds containing one or more carbon-to-nitrogen double bonds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
- B23K35/3613—Polymers, e.g. resins
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
- B23K35/3615—N-compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01012—Magnesium [Mg]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0102—Calcium [Ca]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01021—Scandium [Sc]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01046—Palladium [Pd]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01057—Lanthanum [La]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01063—Europium [Eu]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01066—Dysprosium [Dy]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01067—Holmium [Ho]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01068—Erbium [Er]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01087—Francium [Fr]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01322—Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3489—Composition of fluxes; Methods of application thereof; Other methods of activating the contact surfaces
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Adhesives Or Adhesive Processes (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/946,013 US20030111519A1 (en) | 2001-09-04 | 2001-09-04 | Fluxing compositions |
| PCT/US2002/021206 WO2003020816A1 (en) | 2001-09-04 | 2002-07-03 | Fluxing compositions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005501725A true JP2005501725A (ja) | 2005-01-20 |
| JP2005501725A5 JP2005501725A5 (enExample) | 2006-01-05 |
Family
ID=25483831
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003525081A Ceased JP2005501725A (ja) | 2001-09-04 | 2002-07-03 | フラックス組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20030111519A1 (enExample) |
| EP (1) | EP1423467A1 (enExample) |
| JP (1) | JP2005501725A (enExample) |
| KR (1) | KR20040044530A (enExample) |
| CN (1) | CN1549843A (enExample) |
| WO (1) | WO2003020816A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006334669A (ja) * | 2005-06-03 | 2006-12-14 | Natl Starch & Chem Investment Holding Corp | フラクシング組成物 |
| WO2008044330A1 (en) * | 2006-10-03 | 2008-04-17 | Sumitomo Bakelite Co., Ltd. | Adhesive tape |
| WO2019208615A1 (ja) * | 2018-04-26 | 2019-10-31 | 三菱瓦斯化学株式会社 | 樹脂組成物、積層体、樹脂組成物層付き半導体ウェハ、樹脂組成物層付き半導体搭載用基板、及び半導体装置 |
Families Citing this family (56)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2003234394A1 (en) * | 2002-05-23 | 2003-12-12 | 3M Innovative Properties Company | Nanoparticle filled underfill |
| US6796482B2 (en) * | 2002-10-31 | 2004-09-28 | Freescale Semiconductor, Inc. | Phase separated system for fluxing |
| US7004375B2 (en) * | 2003-05-23 | 2006-02-28 | National Starch And Chemical Investment Holding Corporation | Pre-applied fluxing underfill composition having pressure sensitive adhesive properties |
| JP4170839B2 (ja) * | 2003-07-11 | 2008-10-22 | 日東電工株式会社 | 積層シート |
| US7213739B2 (en) * | 2004-04-02 | 2007-05-08 | Fry's Metals, Inc. | Underfill fluxing curative |
| US20060025509A1 (en) * | 2004-07-29 | 2006-02-02 | Ruzhi Zhang | Fluxing no-flow underfill composition containing benzoxazines |
| US7247683B2 (en) * | 2004-08-05 | 2007-07-24 | Fry's Metals, Inc. | Low voiding no flow fluxing underfill for electronic devices |
| US7687119B2 (en) * | 2005-04-04 | 2010-03-30 | Henkel Ag & Co. Kgaa | Radiation-curable desiccant-filled adhesive/sealant |
| US20060223978A1 (en) * | 2005-04-04 | 2006-10-05 | Shengqian Kong | Radiation- or thermally-curable oxetane barrier sealants |
| US20060223937A1 (en) * | 2005-04-04 | 2006-10-05 | Herr Donald E | Radiation curable cycloaliphatic barrier sealants |
| JP4883996B2 (ja) * | 2005-05-24 | 2012-02-22 | 四国化成工業株式会社 | 水溶性プレフラックス及びその利用 |
| US20070049665A1 (en) * | 2005-08-25 | 2007-03-01 | Musa Osama M | Quinolinols and quinolinol derivatives as adhesion promoters in die attach adhesives |
| US7378523B2 (en) * | 2005-08-25 | 2008-05-27 | National Starch And Chemical Investment Holding Corporation | Quinolinols as fluxing and accelerating agents for underfill compositions |
| US20130131007A1 (en) | 2005-09-07 | 2013-05-23 | Bebaas, Inc. | Vitamin b12 compositions |
| US7468407B2 (en) * | 2005-09-26 | 2008-12-23 | National Starch And Chemical Investment Holding Copporation | Metal salts of quinolinols and quinolinol derivatives in curable compositions |
| US20070095432A1 (en) * | 2005-11-02 | 2007-05-03 | National Starch And Chemical Investment Holding Corporation | Fluxing compositions containing benzotriazoles |
| JP4757070B2 (ja) * | 2006-03-27 | 2011-08-24 | 富士通株式会社 | 半田付け用フラックス及び半導体素子の接合方法 |
| JP2008179698A (ja) * | 2007-01-24 | 2008-08-07 | Fujifilm Corp | レーザー分解用樹脂組成物およびそれを用いるパターン形成材料 |
| EP2195350B1 (en) * | 2007-09-14 | 2013-07-24 | 3M Innovative Properties Company | Ultra low viscosity iodine containing amorphous fluoropolymers |
| US20090283144A1 (en) * | 2008-05-14 | 2009-11-19 | 3M Innovative Properties Company | Solar concentrating mirror |
| US20090283133A1 (en) * | 2008-05-14 | 2009-11-19 | 3M Innovative Properties Company | Solar concentrating mirror |
| WO2010005710A1 (en) * | 2008-06-16 | 2010-01-14 | 3M Innovative Properties Company | Toughened curable compositions |
| US8334170B2 (en) * | 2008-06-27 | 2012-12-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for stacking devices |
| WO2010078105A1 (en) | 2008-12-30 | 2010-07-08 | 3M Innovative Properties Company | Broadband reflectors, concentrated solar power systems, and methods of using the same |
| KR101197193B1 (ko) * | 2010-01-05 | 2012-11-02 | 도레이첨단소재 주식회사 | 비유동성 언더필용 수지 조성물, 그를 이용한 비유동성 언더필 필름 및 그 비유동성 언더필 필름의 제조방법 |
| TWI500467B (zh) * | 2010-01-08 | 2015-09-21 | Arakawa Chem Ind | 無鉛焊劑用助熔劑組成物及無鉛焊劑膏 |
| US8070044B1 (en) * | 2010-12-02 | 2011-12-06 | Rohm And Haas Electronic Materials Llc | Polyamine flux composition and method of soldering |
| US8070043B1 (en) * | 2010-12-02 | 2011-12-06 | Rohm And Haas Electronic Materials Llc | Curable flux composition and method of soldering |
| US8070046B1 (en) * | 2010-12-02 | 2011-12-06 | Rohm And Haas Electronic Materials Llc | Amine flux composition and method of soldering |
| US8070047B1 (en) * | 2010-12-02 | 2011-12-06 | Rohm And Haas Electronic Materials Llc | Flux composition and method of soldering |
| US8070045B1 (en) * | 2010-12-02 | 2011-12-06 | Rohm And Haas Electronic Materials Llc | Curable amine flux composition and method of soldering |
| JP5856747B2 (ja) * | 2011-03-28 | 2016-02-10 | ハリマ化成株式会社 | はんだ付け用フラックスおよびはんだペースト組成物 |
| JP4897932B1 (ja) * | 2011-05-25 | 2012-03-14 | ハリマ化成株式会社 | はんだペースト用フラックスおよびはんだペースト |
| WO2013012587A2 (en) | 2011-07-15 | 2013-01-24 | 3M Innovative Properties Company | Semiconductor package resin composition and usage method thereof |
| US8434667B2 (en) | 2011-09-30 | 2013-05-07 | Rohm And Haas Electronic Materials Llc | Polyamine, carboxylic acid flux composition and method of soldering |
| US8434666B2 (en) | 2011-09-30 | 2013-05-07 | Rohm And Haas Electronic Materials Llc | Flux composition and method of soldering |
| US8430295B2 (en) | 2011-09-30 | 2013-04-30 | Rohm And Haas Electronic Materials Llc | Curable flux composition and method of soldering |
| US8430294B2 (en) | 2011-09-30 | 2013-04-30 | Rohm And Haas Electronic Materials Llc | Amine, carboxylic acid flux composition and method of soldering |
| US8430293B2 (en) | 2011-09-30 | 2013-04-30 | Rohm And Haas Electronic Materials Llc | Curable amine, carboxylic acid flux composition and method of soldering |
| JP2014091744A (ja) | 2012-10-31 | 2014-05-19 | 3M Innovative Properties Co | アンダーフィル組成物、半導体装置およびその製造方法 |
| CN103056560B (zh) * | 2012-12-28 | 2015-03-11 | 深圳市美克科技有限公司 | 软钎焊助焊剂 |
| US9631065B2 (en) * | 2013-03-12 | 2017-04-25 | Intel Corporation | Methods of forming wafer level underfill materials and structures formed thereby |
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- 2001-09-04 US US09/946,013 patent/US20030111519A1/en not_active Abandoned
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- 2002-07-03 EP EP02740016A patent/EP1423467A1/en not_active Withdrawn
- 2002-07-03 WO PCT/US2002/021206 patent/WO2003020816A1/en not_active Ceased
- 2002-07-03 CN CNA028171438A patent/CN1549843A/zh active Pending
- 2002-07-03 KR KR10-2004-7003183A patent/KR20040044530A/ko not_active Ceased
- 2002-07-03 JP JP2003525081A patent/JP2005501725A/ja not_active Ceased
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2006334669A (ja) * | 2005-06-03 | 2006-12-14 | Natl Starch & Chem Investment Holding Corp | フラクシング組成物 |
| WO2008044330A1 (en) * | 2006-10-03 | 2008-04-17 | Sumitomo Bakelite Co., Ltd. | Adhesive tape |
| US8597785B2 (en) | 2006-10-03 | 2013-12-03 | Sumitomo Bakelite Co., Ltd. | Adhesive film |
| WO2019208615A1 (ja) * | 2018-04-26 | 2019-10-31 | 三菱瓦斯化学株式会社 | 樹脂組成物、積層体、樹脂組成物層付き半導体ウェハ、樹脂組成物層付き半導体搭載用基板、及び半導体装置 |
| KR20210004943A (ko) | 2018-04-26 | 2021-01-13 | 미츠비시 가스 가가쿠 가부시키가이샤 | 수지 조성물, 적층체, 수지 조성물층이 형성된 반도체 웨이퍼, 수지 조성물층이 형성된 반도체 탑재용 기판, 및 반도체 장치 |
| JPWO2019208615A1 (ja) * | 2018-04-26 | 2021-05-27 | 三菱瓦斯化学株式会社 | 樹脂組成物、積層体、樹脂組成物層付き半導体ウェハ、樹脂組成物層付き半導体搭載用基板、及び半導体装置 |
| JP7256967B2 (ja) | 2018-04-26 | 2023-04-13 | 三菱瓦斯化学株式会社 | 樹脂組成物、積層体、樹脂組成物層付き半導体ウェハ、樹脂組成物層付き半導体搭載用基板、及び半導体装置 |
| US11924979B2 (en) | 2018-04-26 | 2024-03-05 | Mitsubishi Gas Chemical Company, Inc. | Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer and semiconductor device |
| KR102766027B1 (ko) * | 2018-04-26 | 2025-02-10 | 미츠비시 가스 가가쿠 가부시키가이샤 | 수지 조성물, 적층체, 수지 조성물층이 형성된 반도체 웨이퍼, 수지 조성물층이 형성된 반도체 탑재용 기판, 및 반도체 장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1423467A1 (en) | 2004-06-02 |
| US20030111519A1 (en) | 2003-06-19 |
| KR20040044530A (ko) | 2004-05-28 |
| CN1549843A (zh) | 2004-11-24 |
| WO2003020816A1 (en) | 2003-03-13 |
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