CN1919525B - 用作底层填充组合物的助熔剂和促进剂的羟基喹啉 - Google Patents
用作底层填充组合物的助熔剂和促进剂的羟基喹啉 Download PDFInfo
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- CN1919525B CN1919525B CN2006101265024A CN200610126502A CN1919525B CN 1919525 B CN1919525 B CN 1919525B CN 2006101265024 A CN2006101265024 A CN 2006101265024A CN 200610126502 A CN200610126502 A CN 200610126502A CN 1919525 B CN1919525 B CN 1919525B
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- Prior art keywords
- oxyquinoline
- resin
- acid
- cyanate
- methyl
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 52
- 150000004322 quinolinols Chemical class 0.000 title abstract 3
- 230000004907 flux Effects 0.000 claims abstract description 26
- 150000001875 compounds Chemical class 0.000 claims description 17
- 230000009477 glass transition Effects 0.000 claims description 5
- LISFMEBWQUVKPJ-UHFFFAOYSA-N quinolin-2-ol Chemical compound C1=CC=C2NC(=O)C=CC2=C1 LISFMEBWQUVKPJ-UHFFFAOYSA-N 0.000 abstract description 3
- 230000007797 corrosion Effects 0.000 abstract description 2
- 238000005260 corrosion Methods 0.000 abstract description 2
- 230000002378 acidificating effect Effects 0.000 abstract 2
- 238000001879 gelation Methods 0.000 abstract 1
- 230000002028 premature Effects 0.000 abstract 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 40
- -1 cinnamyl compound Chemical class 0.000 description 36
- 229920005989 resin Polymers 0.000 description 31
- 239000011347 resin Substances 0.000 description 31
- 229960003540 oxyquinoline Drugs 0.000 description 29
- 239000000945 filler Substances 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 19
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate Chemical compound [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 17
- 239000000463 material Substances 0.000 description 16
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 15
- 239000003822 epoxy resin Substances 0.000 description 15
- 229920000647 polyepoxide Polymers 0.000 description 15
- 239000003795 chemical substances by application Substances 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- 239000000758 substrate Substances 0.000 description 14
- 229910000679 solder Inorganic materials 0.000 description 13
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- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 10
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- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 239000005062 Polybutadiene Substances 0.000 description 8
- 125000003118 aryl group Chemical group 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- 239000012065 filter cake Substances 0.000 description 8
- 150000002430 hydrocarbons Chemical group 0.000 description 8
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- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 6
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- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
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- 125000001931 aliphatic group Chemical group 0.000 description 4
- 239000000908 ammonium hydroxide Substances 0.000 description 4
- 150000008064 anhydrides Chemical class 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 150000002431 hydrogen Chemical group 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 150000003053 piperidines Chemical class 0.000 description 4
- 229920000570 polyether Polymers 0.000 description 4
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- 150000003254 radicals Chemical class 0.000 description 4
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- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
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- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
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- 150000001408 amides Chemical class 0.000 description 3
- 229940106691 bisphenol a Drugs 0.000 description 3
- 239000004202 carbamide Substances 0.000 description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
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- 238000001914 filtration Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
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- 150000003839 salts Chemical class 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 2
- DEABFUINOSGCMK-UHFFFAOYSA-N (4-ethylphenyl) cyanate Chemical compound CCC1=CC=C(OC#N)C=C1 DEABFUINOSGCMK-UHFFFAOYSA-N 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 2
- SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 2
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- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N 1H-imidazole Chemical compound C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- NWINIEGDLHHNLH-UHFFFAOYSA-N 2-methyl-1h-quinolin-4-one Chemical compound C1=CC=CC2=NC(C)=CC(O)=C21 NWINIEGDLHHNLH-UHFFFAOYSA-N 0.000 description 2
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 2
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Images
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
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- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Epoxy Resins (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Wire Bonding (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
Description
Claims (1)
Applications Claiming Priority (2)
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US11/211,406 | 2005-08-25 | ||
US11/211,406 US7378523B2 (en) | 2005-08-25 | 2005-08-25 | Quinolinols as fluxing and accelerating agents for underfill compositions |
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CN100457375C (zh) * | 2007-08-11 | 2009-02-04 | 厦门大学 | 一种可抑制焊点界面化合物生长的免清洗水基型助焊剂 |
CN107251209B (zh) * | 2015-03-19 | 2019-12-27 | 纳美仕有限公司 | 倒装芯片安装体的制造方法、倒装芯片安装体及先供给型底部填充用树脂组合物 |
WO2017065957A1 (en) * | 2015-10-16 | 2017-04-20 | Basf Se | Energy curable high reactivity multi vinylether or acrylate functional resins |
CN108495893A (zh) | 2015-11-17 | 2018-09-04 | 汉高知识产权控股有限责任公司 | 用于三维硅通孔(tsv)封装的底部填充膜的树脂组合物及用于其制备的组合物 |
JP6660771B2 (ja) * | 2016-03-03 | 2020-03-11 | ナミックス株式会社 | フィルム状樹脂組成物 |
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US5521271A (en) * | 1994-09-29 | 1996-05-28 | Minnesota Mining And Manufacturing Company | Liquid toners with hydrocarbon solvents |
EP1032038A2 (en) * | 1999-02-12 | 2000-08-30 | National Starch and Chemical Investment Holding Corporation | Conductive and resitive material with electrical stability for use in electronics devices |
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JPS5430440B2 (zh) * | 1974-03-19 | 1979-10-01 | ||
US5344592A (en) * | 1993-02-16 | 1994-09-06 | E. I. Du Pont De Nemours And Company | Organic vehicle for electronic composition |
JPH07316399A (ja) * | 1994-05-26 | 1995-12-05 | Sumitomo Chem Co Ltd | 熱硬化性樹脂組成物および電子部品 |
US5482809A (en) * | 1994-06-16 | 1996-01-09 | Minnesota Mining And Manufacturing Company | Liquid toners from soluble polymeric dispersants with reactive groups |
US5744533A (en) | 1997-06-04 | 1998-04-28 | Johnson Matthey, Inc. | Adhesive composition for bonding a semiconductor device |
JPH11140276A (ja) * | 1997-11-11 | 1999-05-25 | Sumitomo Chem Co Ltd | 多官能シアン酸エステル樹脂組成物および樹脂封止型半導体装置 |
JP5184729B2 (ja) | 1999-12-20 | 2013-04-17 | スリーエム イノベイティブ プロパティズ カンパニー | 周囲温度安定一液性硬化性エポキシ接着剤 |
US6498260B2 (en) | 2000-03-29 | 2002-12-24 | Georgia Tech Research Corp. | Thermally degradable epoxy underfills for flip-chip applications |
US6849940B1 (en) * | 2000-11-20 | 2005-02-01 | Ati Technologies, Inc. | Integrated circuit package for the transfer of heat generated by the inte circuit and method of fabricating same |
NL1016779C2 (nl) * | 2000-12-02 | 2002-06-04 | Cornelis Johannes Maria V Rijn | Matrijs, werkwijze voor het vervaardigen van precisieproducten met behulp van een matrijs, alsmede precisieproducten, in het bijzonder microzeven en membraanfilters, vervaardigd met een dergelijke matrijs. |
US20020111420A1 (en) * | 2001-02-12 | 2002-08-15 | International Business Machines Corporation | Underfill compositions |
US6583201B2 (en) * | 2001-04-25 | 2003-06-24 | National Starch And Chemical Investment Holding Corporation | Conductive materials with electrical stability for use in electronics devices |
US20030111519A1 (en) | 2001-09-04 | 2003-06-19 | 3M Innovative Properties Company | Fluxing compositions |
US20040113127A1 (en) * | 2002-12-17 | 2004-06-17 | Min Gary Yonggang | Resistor compositions having a substantially neutral temperature coefficient of resistance and methods and compositions relating thereto |
US7001938B2 (en) * | 2003-01-27 | 2006-02-21 | Resolution Performance Products Llc | Epoxy resin curing compositions and resin compositions including same |
US7105617B2 (en) | 2003-02-06 | 2006-09-12 | Georgia Tech Research Corporation | Metal 8-hydroxyquinoline-functionalized polymers and related materials and methods of making and using the same |
US7108806B2 (en) * | 2003-02-28 | 2006-09-19 | National Starch And Chemical Investment Holding Corporation | Conductive materials with electrical stability and good impact resistance for use in electronics devices |
JP4582090B2 (ja) * | 2004-02-20 | 2010-11-17 | 宇部興産株式会社 | ポリイミドシロキサン溶液組成物 |
US20050247916A1 (en) * | 2004-05-06 | 2005-11-10 | Mccormick Demetrius | Compositions for use in electronics devices |
-
2005
- 2005-08-25 US US11/211,406 patent/US7378523B2/en not_active Expired - Fee Related
-
2006
- 2006-08-22 SG SG200605715-2A patent/SG130161A1/en unknown
- 2006-08-22 CN CN2006101265024A patent/CN1919525B/zh not_active Expired - Fee Related
- 2006-08-23 EP EP06017528A patent/EP1758163B1/en not_active Not-in-force
- 2006-08-23 DE DE602006009448T patent/DE602006009448D1/de active Active
- 2006-08-23 JP JP2006226255A patent/JP4648881B2/ja not_active Expired - Fee Related
- 2006-08-23 AT AT06017528T patent/ATE444565T1/de not_active IP Right Cessation
- 2006-08-24 KR KR1020060080518A patent/KR20070024402A/ko active IP Right Grant
- 2006-08-24 TW TW095131063A patent/TWI398474B/zh not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5521271A (en) * | 1994-09-29 | 1996-05-28 | Minnesota Mining And Manufacturing Company | Liquid toners with hydrocarbon solvents |
EP1032038A2 (en) * | 1999-02-12 | 2000-08-30 | National Starch and Chemical Investment Holding Corporation | Conductive and resitive material with electrical stability for use in electronics devices |
Also Published As
Publication number | Publication date |
---|---|
US7378523B2 (en) | 2008-05-27 |
TW200728375A (en) | 2007-08-01 |
ATE444565T1 (de) | 2009-10-15 |
CN1919525A (zh) | 2007-02-28 |
EP1758163A1 (en) | 2007-02-28 |
JP2007056266A (ja) | 2007-03-08 |
US20070049722A1 (en) | 2007-03-01 |
TWI398474B (zh) | 2013-06-11 |
DE602006009448D1 (de) | 2009-11-12 |
JP4648881B2 (ja) | 2011-03-09 |
SG130161A1 (en) | 2007-03-20 |
KR20070024402A (ko) | 2007-03-02 |
EP1758163B1 (en) | 2009-09-30 |
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