JP2005354044A - 電子機能材料からなる所望のパターンの製作方法 - Google Patents
電子機能材料からなる所望のパターンの製作方法 Download PDFInfo
- Publication number
- JP2005354044A JP2005354044A JP2005135806A JP2005135806A JP2005354044A JP 2005354044 A JP2005354044 A JP 2005354044A JP 2005135806 A JP2005135806 A JP 2005135806A JP 2005135806 A JP2005135806 A JP 2005135806A JP 2005354044 A JP2005354044 A JP 2005354044A
- Authority
- JP
- Japan
- Prior art keywords
- particles
- substrate
- layer
- functional material
- electronic functional
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 75
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 238000000034 method Methods 0.000 claims abstract description 92
- 239000002245 particle Substances 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 39
- 238000000059 patterning Methods 0.000 claims abstract description 26
- 239000000725 suspension Substances 0.000 claims abstract description 18
- 239000007788 liquid Substances 0.000 claims abstract description 17
- 238000007639 printing Methods 0.000 claims abstract description 17
- 239000002904 solvent Substances 0.000 claims abstract description 15
- 239000002270 dispersing agent Substances 0.000 claims abstract description 11
- 239000004065 semiconductor Substances 0.000 claims description 31
- 229920002120 photoresistant polymer Polymers 0.000 claims description 19
- 230000005669 field effect Effects 0.000 claims description 18
- 238000000206 photolithography Methods 0.000 claims description 18
- 229920000642 polymer Polymers 0.000 claims description 16
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical group CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 14
- 238000007649 pad printing Methods 0.000 claims description 13
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 claims description 12
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 12
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 12
- 238000010030 laminating Methods 0.000 claims description 11
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 claims description 10
- 229940005642 polystyrene sulfonic acid Drugs 0.000 claims description 10
- 239000012212 insulator Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 9
- 229920001169 thermoplastic Polymers 0.000 claims description 9
- 238000001035 drying Methods 0.000 claims description 8
- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 claims description 7
- 230000008569 process Effects 0.000 claims description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000004020 conductor Substances 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 4
- 229920000767 polyaniline Polymers 0.000 claims description 4
- 229920000123 polythiophene Polymers 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 claims description 3
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 claims description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 3
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 3
- 239000002041 carbon nanotube Substances 0.000 claims description 3
- 239000004816 latex Substances 0.000 claims description 3
- 229920000126 latex Polymers 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000010445 mica Substances 0.000 claims description 3
- 229910052618 mica group Inorganic materials 0.000 claims description 3
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 claims description 3
- 229920000128 polypyrrole Polymers 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 229960002920 sorbitol Drugs 0.000 claims description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 3
- 229910001887 tin oxide Inorganic materials 0.000 claims description 3
- 229910052723 transition metal Inorganic materials 0.000 claims description 3
- 150000003624 transition metals Chemical class 0.000 claims description 3
- 239000003431 cross linking reagent Substances 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims 1
- 230000003381 solubilizing effect Effects 0.000 abstract 1
- 229920000144 PEDOT:PSS Polymers 0.000 description 18
- 239000000976 ink Substances 0.000 description 11
- 238000003475 lamination Methods 0.000 description 8
- 239000008204 material by function Substances 0.000 description 8
- 238000009472 formulation Methods 0.000 description 6
- 238000007641 inkjet printing Methods 0.000 description 6
- 239000010409 thin film Substances 0.000 description 5
- 239000000084 colloidal system Substances 0.000 description 4
- 238000004049 embossing Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 3
- 238000012615 high-resolution technique Methods 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 101100522042 Oryza sativa subsp. japonica PSS3 gene Proteins 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 238000000018 DNA microarray Methods 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- -1 for example Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/621—Providing a shape to conductive layers, e.g. patterning or selective deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/464—Lateral top-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/60—Forming conductive regions or layers, e.g. electrodes
- H10K71/611—Forming conductive regions or layers, e.g. electrodes using printing deposition, e.g. ink jet printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
- H10K85/1135—Polyethylene dioxythiophene [PEDOT]; Derivatives thereof
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Thin Film Transistor (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
【解決手段】本発明の方法には、所望のパターンを画定するために露出した基板の領域を残し、基板1上にパターン形成材料2の第1層を造る工程、パターン形成材料が不浸透性である液体分散剤中に電子機能材料3の粒子を含む懸濁液をパターン形成材料上および露出基板上に印刷する工程、粒子を連結するために懸濁液から液体分散剤の少なくとも一部を除去する工程、およびパターン形成材料2を溶解する能力がある第1溶媒を連結粒子に塗布し、第1溶媒に対して前記連結粒子が浸透できるので、上にあるあらゆる電子機能材料3と共にパターン形成材料が基板1から除去される工程が含まれる。
【選択図】図3
Description
2 パターン形成材料
3 電子機能材料
Claims (30)
- 基板上に電子機能材料の所望のパターンを形成する方法であって、
前記所望のパターンを画定するために露出した前記基板の領域を残しながら、前記基板上にパターン形成材料の第1層を造る工程、
前記パターン形成材料が不浸透である液体分散剤中に電子機能材料の粒子を含む懸濁液を、前記パターン形成材料および前記露出基板上に印刷する工程、
前記粒子を連結するために前記懸濁液から前記液体分散剤の少なくとも一部を除去する工程、および
前記パターン形成材料を溶解する能力がある第1溶媒を前記連結粒子に塗布し、前記第1溶媒に対して前記連結粒子が浸透性であるので、上にあるあらゆる電子機能材料と共に前記パターン形成材料が前記基板から除去される工程、
を含む前記方法。 - 請求項1の方法において、前記パターン形成材料がホトレジストであり、ホトレジスト層を積層し、次いで、前記ホトレジストの選択された部分をホトリソグラフィにより除去して前記所望のパターンが形成され前記第1層を造る前記方法。
- 請求項1の方法において、前記パターン形成材料が熱可塑性ポリマーであり、前記熱可塑性ポリマーの層を積層し、次いで、前記層をマイクロ・エンボス加工して前記所望のパターンが形成され前記第1層を造る前記方法。
- 請求項3の方法において、前記熱可塑性ポリマーがポリメチルメタクリレートである前記方法。
- 前項までの請求項のいずれかの項の方法において、前記電子機能材料の前記懸濁液がコロイド状である前記方法。
- 前項までの請求項のいずれかの項の方法において、前記懸濁液が液滴の放出により印刷される前記方法。
- 前項までの請求項のいずれかの項の方法において、前記懸濁液から前記液体分散剤の少なくとも一部の除去が室温における乾燥によって、または熱的接触、マイクロ波照射、入射赤外線による加熱による加速乾燥によって、または常圧より低い圧力に印刷された懸濁液をさらすことによって行われる前記方法。
- 前項までの請求項のいずれかの項の方法において、前記液体分散剤が水である前記方法。
- 前項までの請求項のいずれかの項の方法において、前記第1溶媒がアセトンである前記方法。
- 前項までの請求項のいずれかの項の方法において、前記電子機能材料が絶縁体である前記方法。
- 請求項10の方法において、前記絶縁体が、二酸化珪素、マイカ、ラテックスまたは誘電性ポリマーである前記方法。
- 請求項1−9のいずれかの項の方法において、前記電子機能材料が半導体である前記方法。
- 請求項12の方法において、前記半導体が、カーボン・ナノチューブ、積層遷移金属ジカルコゲニドのフレーク、ペンタセン粒子または有機半導体ポリマーである前記方法。
- 請求項13の方法において、前記有機半導体ポリマーがポリ−3−ヘキシルチオフェンである前記方法。
- 請求項1−9のいずれかの項の方法において、前記電子機能材料が導体である前記方法。
- 請求項15の方法において、前記導体が、金属、インジウム・すず酸化物、すず酸化物、ポリチオフェン、ポリアニリンまたはポリピロールである前記方法。
- 請求項16の方法において、前記ポリチオフェンがポリ(3,4−エチレンジオキシチオフェン)−ポリスチレンスルホン酸である前記方法。
- 請求項17の方法において、さらに、前記第1溶媒を塗布後、前記連結粒子をN−メチルピロリドンおよびイソプロパノールの混合物に溶解したD−ソルビトールで処理する工程を含む前記方法。
- 請求項17の方法において、さらに、前記第1溶媒を塗布後、前記連結粒子を架橋剤を含む第2溶媒で処理する工程を含む前記方法。
- 請求項18または19の方法において、前記連結粒子を処理後、前記粒子の表面を滑らかにするために前記粒子を焼きなます前記方法。
- 電界効果型トランジスターを製作する方法であって、請求項15−20のいずれかの項に規定された方法に従い基板上にソース電極およびドレイン電極を画定する所望の導体パターンを形成する工程、前記ソース電極およびドレイン電極と電気的に接触する半導体層を積層する工程、前記半導体層の上に絶縁体層を積層する工程、および前記絶縁体層の上にゲート電極を設ける工程を含む前記方法。
- 請求項21の方法において、前記絶縁層は請求項10または11の方法により積層されるか、および/または前記半導体層は請求項12−14のいずれかの項の方法により積層される前記方法。
- 請求項21の方法において、前記半導体層が液滴の放出またはパッド印刷により積層される前記方法。
- 請求項21または請求項23の方法において、前記絶縁層が液滴の放出またはパッド印刷により積層される前記方法。
- 普通の基板上に製作された電界効果型トランジスターのアレイにおいて、各電界効果型トランジスターが、請求項22−24のいずれかの項の方法により製作される前記アレイ。
- 請求項21−25のいずれかの項の方法において、前記ゲート電極が液滴の放出またはパッド印刷により積層される前記方法。
- 請求項20−26のいずれかの項の方法において、前記半導体層が有機半導体ポリマーから形成される前記方法。
- 請求項20−27のいずれかの項の方法において、前記絶縁層がポリメチルメタクリレートから形成される前記方法。
- 請求項20−28のいずれかの項の方法において、前記ゲート電極がポリ(3,4−エチレンジオキシチオフェン)−ポリスチレンスルホン酸から形成される前記方法。
- 基板上に電子機能材料からなる所望のパターンを形成する方法であって、図1−3、5および6を参照しながら本明細書で十分に説明した方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0410236A GB2413895A (en) | 2004-05-07 | 2004-05-07 | Patterning substrates by ink-jet or pad printing |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2005354044A true JP2005354044A (ja) | 2005-12-22 |
JP2005354044A5 JP2005354044A5 (ja) | 2006-10-26 |
JP4046123B2 JP4046123B2 (ja) | 2008-02-13 |
Family
ID=32482864
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005135806A Expired - Fee Related JP4046123B2 (ja) | 2004-05-07 | 2005-05-09 | パターン形成方法およびトランジスタの製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7271098B2 (ja) |
EP (1) | EP1594178A2 (ja) |
JP (1) | JP4046123B2 (ja) |
KR (1) | KR100691706B1 (ja) |
CN (1) | CN1693993A (ja) |
GB (1) | GB2413895A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101397445B1 (ko) | 2007-12-06 | 2014-05-20 | 엘지디스플레이 주식회사 | 유기박막트랜지스터 제조방법 |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2424759A (en) * | 2005-04-01 | 2006-10-04 | Seiko Epson Corp | Inkjet deposition of polythiophene semiconductor material dissolved in halogenated aromatic solvents |
GB2427509A (en) * | 2005-06-21 | 2006-12-27 | Seiko Epson Corp | Organic electronic device fabrication by micro-embossing |
KR100746332B1 (ko) * | 2005-08-03 | 2007-08-03 | 한국과학기술원 | 광가교 가능한 콜로이드 입자를 이용한 다차원 나노패턴형성방법 |
US8138075B1 (en) | 2006-02-06 | 2012-03-20 | Eberlein Dietmar C | Systems and methods for the manufacture of flat panel devices |
KR101206661B1 (ko) * | 2006-06-02 | 2012-11-30 | 삼성전자주식회사 | 동일 계열의 소재로 형성된 반도체층 및 소스/드레인전극을 포함하는 유기 전자 소자 |
KR101340727B1 (ko) | 2006-09-11 | 2013-12-12 | 엘지디스플레이 주식회사 | 박막 패턴의 제조방법 및 이를 이용한 액정표시패널 및 그제조방법 |
GB0702092D0 (en) * | 2007-02-02 | 2007-03-14 | Fracture Code Corp Aps | Graphic Code Application Apparatus and Method |
WO2009017700A1 (en) * | 2007-07-27 | 2009-02-05 | The Regents Of The University Of California | Polymer electronic devices by all-solution process |
DE102007057650A1 (de) * | 2007-11-28 | 2009-06-04 | H.C. Starck Gmbh | Strukturierung von leitfähigen Polymerschichten mittels des Lift-Off-Prozesses |
KR100969172B1 (ko) | 2009-06-22 | 2010-07-14 | 한국기계연구원 | 마스크 템플릿을 이용한 미세패턴 형성방법 |
WO2011019970A1 (en) * | 2009-08-14 | 2011-02-17 | Nano-C, Inc. | Solvent-based and water-based carbon nanotube inks with removable additives |
US9340697B2 (en) | 2009-08-14 | 2016-05-17 | Nano-C, Inc. | Solvent-based and water-based carbon nanotube inks with removable additives |
KR100991105B1 (ko) * | 2009-10-23 | 2010-11-01 | 한국기계연구원 | 자기패턴된 전도성 패턴과 도금을 이용한 고전도도 미세패턴 형성방법 |
KR100991103B1 (ko) | 2009-10-23 | 2010-11-01 | 한국기계연구원 | 표면개질된 마스크 템플릿을 이용한 미세 도전패턴 형성방법 |
KR102008982B1 (ko) * | 2011-12-22 | 2019-08-08 | 김정식 | 테두리 전극부를 형성한 투명유리판의 제조방법과 그에 의하여 제작된 투명유리판 |
CN102593047A (zh) * | 2012-02-24 | 2012-07-18 | 温州大学 | 基于油溶性纳米颗粒墨水的导电薄膜图案层制备方法 |
FR2993999B1 (fr) * | 2012-07-27 | 2014-09-12 | Nanomade Concept | Procede pour la fabrication d'une surface tactile transparente et surface tactile obtenue par un tel procede |
CN103272747B (zh) * | 2013-05-29 | 2015-07-22 | 苏州汉纳材料科技有限公司 | 图案化碳纳米管透明导电薄膜的生产方法及系统 |
KR101928666B1 (ko) * | 2017-10-11 | 2018-12-12 | 한양대학교 산학협력단 | 산 처리를 포함하는 전도성 고분자 패턴의 제조 방법 |
CN111224020A (zh) * | 2020-01-14 | 2020-06-02 | 吉林建筑大学 | 一种基于喷墨融合的薄膜电极材料沉积方法 |
US11063164B1 (en) * | 2020-09-17 | 2021-07-13 | Allen Howard Engel | Method and materials to manufacture heterojunctions, diodes, and solar cells |
CN114334617B (zh) * | 2022-01-11 | 2022-09-09 | 南京邮电大学 | 一种用于基材上有机层光刻图案化的方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5132248A (en) * | 1988-05-31 | 1992-07-21 | The United States Of America As Represented By The United States Department Of Energy | Direct write with microelectronic circuit fabrication |
WO1993019679A1 (en) * | 1992-04-07 | 1993-10-14 | The Johns Hopkins University | A percutaneous mechanical fragmentation catheter system |
EP0789383B1 (en) | 1996-02-08 | 2008-07-02 | Canon Kabushiki Kaisha | Method of manufacturing electron-emitting device, electron source and image-forming apparatus and method of examining the manufacturing |
EP1003078A3 (en) * | 1998-11-17 | 2001-11-07 | Corning Incorporated | Replicating a nanoscale pattern |
EP1138091B1 (en) | 1999-09-10 | 2007-01-17 | Koninklijke Philips Electronics N.V. | Conductive structure based on poly-3,4-alkenedioxythiophene (pedot) and polystyrenesulfonic acid (pss) |
TW490997B (en) * | 2000-03-31 | 2002-06-11 | Seiko Epson Corp | Method of manufacturing organic EL element, and organic EL element |
TW554405B (en) * | 2000-12-22 | 2003-09-21 | Seiko Epson Corp | Pattern generation method and apparatus |
GB2373095A (en) * | 2001-03-09 | 2002-09-11 | Seiko Epson Corp | Patterning substrates with evaporation residues |
US7455955B2 (en) | 2002-02-27 | 2008-11-25 | Brewer Science Inc. | Planarization method for multi-layer lithography processing |
JP2004031933A (ja) | 2002-05-09 | 2004-01-29 | Konica Minolta Holdings Inc | 有機薄膜トランジスタの製造方法及び、それにより製造された有機薄膜トランジスタと有機薄膜トランジスタシート |
EP1529317A2 (en) * | 2002-08-06 | 2005-05-11 | Avecia Limited | Organic electronic devices |
-
2004
- 2004-05-07 GB GB0410236A patent/GB2413895A/en not_active Withdrawn
-
2005
- 2005-04-04 EP EP05007294A patent/EP1594178A2/en not_active Withdrawn
- 2005-04-11 US US11/102,711 patent/US7271098B2/en not_active Expired - Fee Related
- 2005-04-22 KR KR1020050033431A patent/KR100691706B1/ko not_active IP Right Cessation
- 2005-04-28 CN CNA2005100687503A patent/CN1693993A/zh active Pending
- 2005-05-09 JP JP2005135806A patent/JP4046123B2/ja not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101397445B1 (ko) | 2007-12-06 | 2014-05-20 | 엘지디스플레이 주식회사 | 유기박막트랜지스터 제조방법 |
Also Published As
Publication number | Publication date |
---|---|
KR20060047389A (ko) | 2006-05-18 |
CN1693993A (zh) | 2005-11-09 |
EP1594178A2 (en) | 2005-11-09 |
KR100691706B1 (ko) | 2007-03-09 |
US20050250244A1 (en) | 2005-11-10 |
GB2413895A (en) | 2005-11-09 |
GB0410236D0 (en) | 2004-06-09 |
JP4046123B2 (ja) | 2008-02-13 |
US7271098B2 (en) | 2007-09-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4046123B2 (ja) | パターン形成方法およびトランジスタの製造方法 | |
DeFranco et al. | Photolithographic patterning of organic electronic materials | |
US7582509B2 (en) | Micro-embossing fabrication of electronic devices | |
US8372731B2 (en) | Device fabrication by ink-jet printing materials into bank structures, and embossing tool | |
US6966997B1 (en) | Methods for patterning polymer films, and use of the methods | |
KR100843552B1 (ko) | 나노 임프린트 공정을 이용한 나노 전극선 제조 방법 | |
JP2005354044A5 (ja) | ||
JP2006510210A (ja) | 電子装置 | |
JP2008022002A (ja) | 印刷回路基板の製造方法 | |
US8413576B2 (en) | Method of fabricating a structure | |
TW201119110A (en) | Fabrication method of organic thin-film transistors | |
JP4730275B2 (ja) | 薄膜トランジスタおよび薄膜トランジスタの製造方法 | |
Stuart et al. | Fabrication of a 3D nanoscale crossbar circuit by nanotransfer‐printing lithography | |
KR101291727B1 (ko) | 임프린트 레진의 제조방법 및 임프린팅 방법 | |
KR101050588B1 (ko) | 유기절연막 패턴형성 방법 | |
JP5332145B2 (ja) | 積層構造体、電子素子、電子素子アレイ及び表示装置 | |
KR101588290B1 (ko) | 나노 물질 패턴의 제조방법 | |
KR101588287B1 (ko) | 나노 물질 패턴의 제조방법 | |
JP2009032782A (ja) | 電子装置の製造方法 | |
JP2018037486A (ja) | 薄膜トランジスタの製造方法 | |
KR20130143417A (ko) | 나노전사 프린팅방법 및 이를 이용한 나노패턴의 제조방법 | |
KR101716851B1 (ko) | 용액재료를 이용한 미세패턴 제조방법 | |
KR101649557B1 (ko) | 전도성 패턴의 제조방법 및 이에 따라 제조되는 전도성 패턴 | |
Rogers et al. | Printed organic transistors and molded plastic lasers | |
CN107709609A (zh) | 布线图案的制造方法、导电膜的制造方法以及晶体管的制造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060907 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20070403 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070521 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070529 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070730 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20071030 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20071112 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101130 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101130 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111130 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111130 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121130 Year of fee payment: 5 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121130 Year of fee payment: 5 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131130 Year of fee payment: 6 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
LAPS | Cancellation because of no payment of annual fees |