JP2005328043A5 - - Google Patents
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- Publication number
- JP2005328043A5 JP2005328043A5 JP2005123109A JP2005123109A JP2005328043A5 JP 2005328043 A5 JP2005328043 A5 JP 2005328043A5 JP 2005123109 A JP2005123109 A JP 2005123109A JP 2005123109 A JP2005123109 A JP 2005123109A JP 2005328043 A5 JP2005328043 A5 JP 2005328043A5
- Authority
- JP
- Japan
- Prior art keywords
- polishing solution
- acid
- solution according
- ammonium salt
- phosphoric acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000005498 polishing Methods 0.000 claims 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N HCl Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N HF Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 2
- 150000003863 ammonium salts Chemical class 0.000 claims 2
- 239000003002 pH adjusting agent Substances 0.000 claims 2
- NCSXOMQDXHCTOY-UHFFFAOYSA-N 1,1,2,3-tetramethylguanidine Chemical compound CNC(=NC)N(C)C NCSXOMQDXHCTOY-UHFFFAOYSA-N 0.000 claims 1
- SJIXRGNQPBQWMK-UHFFFAOYSA-N 2-(diethylamino)ethyl 2-methylprop-2-enoate Chemical compound CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 claims 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 claims 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N Hexylamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 claims 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N Methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 claims 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N Tetraethylammonium Chemical group CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 claims 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N Triethylenetetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 claims 1
- 238000005296 abrasive Methods 0.000 claims 1
- QSRFYFHZPSGRQX-UHFFFAOYSA-N benzyl(tributyl)azanium Chemical compound CCCC[N+](CCCC)(CCCC)CC1=CC=CC=C1 QSRFYFHZPSGRQX-UHFFFAOYSA-N 0.000 claims 1
- VBQDSLGFSUGBBE-UHFFFAOYSA-N benzyl(triethyl)azanium Chemical compound CC[N+](CC)(CC)CC1=CC=CC=C1 VBQDSLGFSUGBBE-UHFFFAOYSA-N 0.000 claims 1
- YOUGRGFIHBUKRS-UHFFFAOYSA-N benzyl(trimethyl)azanium Chemical compound C[N+](C)(C)CC1=CC=CC=C1 YOUGRGFIHBUKRS-UHFFFAOYSA-N 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 125000004432 carbon atoms Chemical group C* 0.000 claims 1
- 239000008119 colloidal silica Substances 0.000 claims 1
- 239000008139 complexing agent Substances 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 230000003628 erosive Effects 0.000 claims 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims 1
- 239000003112 inhibitor Substances 0.000 claims 1
- 230000002401 inhibitory effect Effects 0.000 claims 1
- 239000011810 insulating material Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 150000007522 mineralic acids Chemical class 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 230000001629 suppression Effects 0.000 claims 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 claims 1
- USFMMZYROHDWPJ-UHFFFAOYSA-N trimethyl-[2-(2-methylprop-2-enoyloxy)ethyl]azanium Chemical compound CC(=C)C(=O)OCC[N+](C)(C)C USFMMZYROHDWPJ-UHFFFAOYSA-N 0.000 claims 1
- GETQZCLCWQTVFV-UHFFFAOYSA-O trimethylammonium Chemical compound C[NH+](C)C GETQZCLCWQTVFV-UHFFFAOYSA-O 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Claims (5)
- 非鉄配線金属の存在下で、絶縁材のエロージョンを抑制しながらバリヤ材料を優先的に除去するのに有用な研磨溶液であって、酸化剤０〜２０重量％、非鉄配線金属の除去速度を下げるためのインヒビター０．００１重量％以上を含み、
（式中、Ｒ 1 、Ｒ 2 、Ｒ 3 及びＲ 4 は基であり、Ｒ 1 は、炭素原子２〜１５個の炭素鎖長を有する）
で形成された有機物含有アンモニウム塩１ppm〜４重量％と、錯化剤１０ppb〜４重量％と、コロイダルシリカ砥粒０．１〜５０重量％と、残余としての水とを含み、７未満のｐＨを有する研磨溶液。 - 硝酸、硫酸、塩酸、フッ化水素酸及びリン酸から選択される無機酸ｐＨ調整剤を含む、請求項１記載の研磨溶液。
- 前記アンモニウム塩が、テトラエチルアンモニウム、テトラブチルアンモニウム、ベンジルトリブチルアンモニウム、ベンジルトリメチルアンモニウム、ベンジルトリエチルアンモニウム、ジアリルジメチルアンモニウム、ジエチルアミノエチルメタクリレート、ジメチルアミノエチルメタクリレート、メタクリロイルオキシエチルトリメチルアンモニウム、３−（メタクリルアミド）プロピルトリメチルアンモニウム、トリエチレンテトラミン、テトラメチルグアニジン、ヘキシルアミン及びそれらの混合物の少なくとも一種を含む化合物とで形成されている、請求項２記載の研磨溶液。
- ｐＨレベルが１．５〜５である、請求項１記載の研磨溶液。
- リン酸ｐＨ調整剤を含む、請求項４記載の研磨溶液。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/830,268 | 2004-04-21 | ||
| US10/830,268 US7253111B2 (en) | 2004-04-21 | 2004-04-21 | Barrier polishing solution |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005328043A JP2005328043A (ja) | 2005-11-24 |
| JP2005328043A5 true JP2005328043A5 (ja) | 2008-04-17 |
| JP4761815B2 JP4761815B2 (ja) | 2011-08-31 |
Family
ID=34954976
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005123109A Active JP4761815B2 (ja) | 2004-04-21 | 2005-04-21 | バリヤ研磨溶液 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7253111B2 (ja) |
| JP (1) | JP4761815B2 (ja) |
| KR (1) | KR101200566B1 (ja) |
| CN (1) | CN1696235B (ja) |
| DE (1) | DE102005016554A1 (ja) |
| FR (1) | FR2869456B1 (ja) |
| TW (1) | TWI363789B (ja) |
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| KR102080646B1 (ko) * | 2013-04-12 | 2020-02-24 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | 구리 및 티탄을 포함하는 다층막의 에칭에 사용되는 액체조성물, 및 이 조성물을 이용한 에칭방법, 다층막 배선의 제조방법, 기판 |
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2004
- 2004-04-21 US US10/830,268 patent/US7253111B2/en active Active
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2005
- 2005-04-01 TW TW094110509A patent/TWI363789B/zh active
- 2005-04-11 DE DE102005016554A patent/DE102005016554A1/de not_active Ceased
- 2005-04-20 CN CN200510067350.0A patent/CN1696235B/zh active Active
- 2005-04-20 FR FR0551010A patent/FR2869456B1/fr active Active
- 2005-04-20 KR KR1020050032664A patent/KR101200566B1/ko active IP Right Grant
- 2005-04-21 JP JP2005123109A patent/JP4761815B2/ja active Active