JP2005295762A - ステージ装置および露光装置 - Google Patents

ステージ装置および露光装置 Download PDF

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Publication number
JP2005295762A
JP2005295762A JP2004110837A JP2004110837A JP2005295762A JP 2005295762 A JP2005295762 A JP 2005295762A JP 2004110837 A JP2004110837 A JP 2004110837A JP 2004110837 A JP2004110837 A JP 2004110837A JP 2005295762 A JP2005295762 A JP 2005295762A
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JP
Japan
Prior art keywords
coil
mover
stage
cooling
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004110837A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005295762A5 (enExample
Inventor
Hitoshi Sato
仁至 佐藤
Giichi Miyajima
義一 宮島
Yasuto Sasaki
康人 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004110837A priority Critical patent/JP2005295762A/ja
Priority to US11/094,311 priority patent/US7301602B2/en
Publication of JP2005295762A publication Critical patent/JP2005295762A/ja
Publication of JP2005295762A5 publication Critical patent/JP2005295762A5/ja
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Motor Or Generator Cooling System (AREA)
  • Linear Motors (AREA)
JP2004110837A 2004-04-05 2004-04-05 ステージ装置および露光装置 Withdrawn JP2005295762A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004110837A JP2005295762A (ja) 2004-04-05 2004-04-05 ステージ装置および露光装置
US11/094,311 US7301602B2 (en) 2004-04-05 2005-03-31 Stage apparatus and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004110837A JP2005295762A (ja) 2004-04-05 2004-04-05 ステージ装置および露光装置

Publications (2)

Publication Number Publication Date
JP2005295762A true JP2005295762A (ja) 2005-10-20
JP2005295762A5 JP2005295762A5 (enExample) 2007-05-31

Family

ID=35053896

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004110837A Withdrawn JP2005295762A (ja) 2004-04-05 2004-04-05 ステージ装置および露光装置

Country Status (2)

Country Link
US (1) US7301602B2 (enExample)
JP (1) JP2005295762A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5423392B2 (ja) * 2007-06-13 2014-02-19 株式会社安川電機 キャンド・リニアモータ電機子およびキャンド・リニアモータ

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4383911B2 (ja) * 2004-02-03 2009-12-16 キヤノン株式会社 露光装置及び半導体デバイスの製造方法
TWI454859B (zh) * 2006-03-30 2014-10-01 尼康股份有限公司 移動體裝置、曝光裝置與曝光方法以及元件製造方法
JP5020662B2 (ja) 2006-05-26 2012-09-05 キヤノン株式会社 ステージ装置、露光装置、及びデバイス製造方法
US7579721B2 (en) * 2007-07-13 2009-08-25 Hiwin Mikrosystem Corp. Chain support structure for a planar motor
JP5349609B2 (ja) * 2009-10-21 2013-11-20 三菱電機株式会社 静止誘導器
KR20180128987A (ko) * 2011-09-16 2018-12-04 퍼시몬 테크놀로지스 코포레이션 기판 이동 장치
WO2016086983A1 (de) 2014-12-03 2016-06-09 Carl Zeiss Smt Gmbh Optische anordnung mit einem wärmeleitenden bauelement
US10268128B2 (en) 2015-07-08 2019-04-23 Asml Netherlands B.V. Lithographic apparatus
CN116613936B (zh) * 2023-06-01 2023-10-20 东营合瑞石油技术有限责任公司 一种节能永磁电机

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3402850B2 (ja) * 1995-05-09 2003-05-06 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
JP3630964B2 (ja) * 1997-12-26 2005-03-23 キヤノン株式会社 ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法
JP3483452B2 (ja) * 1998-02-04 2004-01-06 キヤノン株式会社 ステージ装置および露光装置、ならびにデバイス製造方法
JPH11307430A (ja) * 1998-04-23 1999-11-05 Canon Inc 露光装置およびデバイス製造方法ならびに駆動装置
JP3810039B2 (ja) * 1998-05-06 2006-08-16 キヤノン株式会社 ステージ装置
JP2000277957A (ja) * 1999-03-19 2000-10-06 Furukawa Electric Co Ltd:The 電子装置の冷却構造
JP3870002B2 (ja) * 2000-04-07 2007-01-17 キヤノン株式会社 露光装置
US6680126B1 (en) * 2000-04-27 2004-01-20 Applied Thin Films, Inc. Highly anisotropic ceramic thermal barrier coating materials and related composites
JP4724297B2 (ja) * 2000-12-26 2011-07-13 キヤノン株式会社 露光装置、デバイス製造方法
KR20030065686A (ko) * 2002-01-30 2003-08-09 삼성전기주식회사 히트 파이프 및 그 제조 방법
EP1457825A1 (en) * 2003-03-11 2004-09-15 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
EP1457827A1 (en) * 2003-03-11 2004-09-15 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
JP3826118B2 (ja) * 2003-07-08 2006-09-27 キヤノン株式会社 露光装置
US7224432B2 (en) * 2004-05-14 2007-05-29 Canon Kabushiki Kaisha Stage device, exposure apparatus, and device manufacturing method
JP2005353986A (ja) * 2004-06-14 2005-12-22 Canon Inc 露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5423392B2 (ja) * 2007-06-13 2014-02-19 株式会社安川電機 キャンド・リニアモータ電機子およびキャンド・リニアモータ

Also Published As

Publication number Publication date
US20050219501A1 (en) 2005-10-06
US7301602B2 (en) 2007-11-27

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