JP2005295762A5 - - Google Patents

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Publication number
JP2005295762A5
JP2005295762A5 JP2004110837A JP2004110837A JP2005295762A5 JP 2005295762 A5 JP2005295762 A5 JP 2005295762A5 JP 2004110837 A JP2004110837 A JP 2004110837A JP 2004110837 A JP2004110837 A JP 2004110837A JP 2005295762 A5 JP2005295762 A5 JP 2005295762A5
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JP
Japan
Prior art keywords
cooling
stage apparatus
coil
stage
heat conducting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004110837A
Other languages
English (en)
Japanese (ja)
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JP2005295762A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004110837A priority Critical patent/JP2005295762A/ja
Priority claimed from JP2004110837A external-priority patent/JP2005295762A/ja
Priority to US11/094,311 priority patent/US7301602B2/en
Publication of JP2005295762A publication Critical patent/JP2005295762A/ja
Publication of JP2005295762A5 publication Critical patent/JP2005295762A5/ja
Withdrawn legal-status Critical Current

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JP2004110837A 2004-04-05 2004-04-05 ステージ装置および露光装置 Withdrawn JP2005295762A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004110837A JP2005295762A (ja) 2004-04-05 2004-04-05 ステージ装置および露光装置
US11/094,311 US7301602B2 (en) 2004-04-05 2005-03-31 Stage apparatus and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004110837A JP2005295762A (ja) 2004-04-05 2004-04-05 ステージ装置および露光装置

Publications (2)

Publication Number Publication Date
JP2005295762A JP2005295762A (ja) 2005-10-20
JP2005295762A5 true JP2005295762A5 (enExample) 2007-05-31

Family

ID=35053896

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004110837A Withdrawn JP2005295762A (ja) 2004-04-05 2004-04-05 ステージ装置および露光装置

Country Status (2)

Country Link
US (1) US7301602B2 (enExample)
JP (1) JP2005295762A (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4383911B2 (ja) * 2004-02-03 2009-12-16 キヤノン株式会社 露光装置及び半導体デバイスの製造方法
TWI454859B (zh) * 2006-03-30 2014-10-01 尼康股份有限公司 移動體裝置、曝光裝置與曝光方法以及元件製造方法
JP5020662B2 (ja) 2006-05-26 2012-09-05 キヤノン株式会社 ステージ装置、露光装置、及びデバイス製造方法
CN101657956B (zh) * 2007-06-13 2013-01-16 株式会社安川电机 密封直线电动机电枢以及密封直线电动机
US7579721B2 (en) * 2007-07-13 2009-08-25 Hiwin Mikrosystem Corp. Chain support structure for a planar motor
JP5349609B2 (ja) * 2009-10-21 2013-11-20 三菱電機株式会社 静止誘導器
KR20180128987A (ko) * 2011-09-16 2018-12-04 퍼시몬 테크놀로지스 코포레이션 기판 이동 장치
WO2016086983A1 (de) 2014-12-03 2016-06-09 Carl Zeiss Smt Gmbh Optische anordnung mit einem wärmeleitenden bauelement
US10268128B2 (en) 2015-07-08 2019-04-23 Asml Netherlands B.V. Lithographic apparatus
CN116613936B (zh) * 2023-06-01 2023-10-20 东营合瑞石油技术有限责任公司 一种节能永磁电机

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3402850B2 (ja) * 1995-05-09 2003-05-06 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
JP3630964B2 (ja) * 1997-12-26 2005-03-23 キヤノン株式会社 ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法
JP3483452B2 (ja) * 1998-02-04 2004-01-06 キヤノン株式会社 ステージ装置および露光装置、ならびにデバイス製造方法
JPH11307430A (ja) * 1998-04-23 1999-11-05 Canon Inc 露光装置およびデバイス製造方法ならびに駆動装置
JP3810039B2 (ja) * 1998-05-06 2006-08-16 キヤノン株式会社 ステージ装置
JP2000277957A (ja) * 1999-03-19 2000-10-06 Furukawa Electric Co Ltd:The 電子装置の冷却構造
JP3870002B2 (ja) * 2000-04-07 2007-01-17 キヤノン株式会社 露光装置
US6680126B1 (en) * 2000-04-27 2004-01-20 Applied Thin Films, Inc. Highly anisotropic ceramic thermal barrier coating materials and related composites
JP4724297B2 (ja) * 2000-12-26 2011-07-13 キヤノン株式会社 露光装置、デバイス製造方法
KR20030065686A (ko) * 2002-01-30 2003-08-09 삼성전기주식회사 히트 파이프 및 그 제조 방법
EP1457825A1 (en) * 2003-03-11 2004-09-15 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
EP1457827A1 (en) * 2003-03-11 2004-09-15 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
JP3826118B2 (ja) * 2003-07-08 2006-09-27 キヤノン株式会社 露光装置
US7224432B2 (en) * 2004-05-14 2007-05-29 Canon Kabushiki Kaisha Stage device, exposure apparatus, and device manufacturing method
JP2005353986A (ja) * 2004-06-14 2005-12-22 Canon Inc 露光装置

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