JP2005277239A5 - - Google Patents

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Publication number
JP2005277239A5
JP2005277239A5 JP2004090809A JP2004090809A JP2005277239A5 JP 2005277239 A5 JP2005277239 A5 JP 2005277239A5 JP 2004090809 A JP2004090809 A JP 2004090809A JP 2004090809 A JP2004090809 A JP 2004090809A JP 2005277239 A5 JP2005277239 A5 JP 2005277239A5
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JP
Japan
Prior art keywords
changing
exposure apparatus
area
charged particle
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004090809A
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English (en)
Japanese (ja)
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JP2005277239A (ja
JP4504060B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2004090809A priority Critical patent/JP4504060B2/ja
Priority claimed from JP2004090809A external-priority patent/JP4504060B2/ja
Publication of JP2005277239A publication Critical patent/JP2005277239A/ja
Publication of JP2005277239A5 publication Critical patent/JP2005277239A5/ja
Application granted granted Critical
Publication of JP4504060B2 publication Critical patent/JP4504060B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004090809A 2004-03-26 2004-03-26 荷電粒子線露光装置 Expired - Fee Related JP4504060B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004090809A JP4504060B2 (ja) 2004-03-26 2004-03-26 荷電粒子線露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004090809A JP4504060B2 (ja) 2004-03-26 2004-03-26 荷電粒子線露光装置

Publications (3)

Publication Number Publication Date
JP2005277239A JP2005277239A (ja) 2005-10-06
JP2005277239A5 true JP2005277239A5 (enExample) 2007-04-12
JP4504060B2 JP4504060B2 (ja) 2010-07-14

Family

ID=35176539

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004090809A Expired - Fee Related JP4504060B2 (ja) 2004-03-26 2004-03-26 荷電粒子線露光装置

Country Status (1)

Country Link
JP (1) JP4504060B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5859778B2 (ja) 2011-09-01 2016-02-16 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0562892A (ja) * 1991-09-03 1993-03-12 Nikon Corp パターン形成装置
JP3336510B2 (ja) * 1993-11-29 2002-10-21 株式会社ニコン パターン転写方法およびそれに用いる装置並びにマスク
JPH11176738A (ja) * 1997-12-10 1999-07-02 Nikon Corp 荷電ビーム露光装置及び荷電ビーム露光方法
JP3357874B2 (ja) * 2001-05-30 2002-12-16 株式会社日立製作所 電子ビーム描画装置及び電子ビーム描画方法

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