JP2008027965A5 - - Google Patents

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Publication number
JP2008027965A5
JP2008027965A5 JP2006195489A JP2006195489A JP2008027965A5 JP 2008027965 A5 JP2008027965 A5 JP 2008027965A5 JP 2006195489 A JP2006195489 A JP 2006195489A JP 2006195489 A JP2006195489 A JP 2006195489A JP 2008027965 A5 JP2008027965 A5 JP 2008027965A5
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JP
Japan
Prior art keywords
optical system
charged beam
charged
aperture
stages
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Application number
JP2006195489A
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English (en)
Japanese (ja)
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JP4871662B2 (ja
JP2008027965A (ja
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Priority to JP2006195489A priority Critical patent/JP4871662B2/ja
Priority claimed from JP2006195489A external-priority patent/JP4871662B2/ja
Publication of JP2008027965A publication Critical patent/JP2008027965A/ja
Publication of JP2008027965A5 publication Critical patent/JP2008027965A5/ja
Application granted granted Critical
Publication of JP4871662B2 publication Critical patent/JP4871662B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2006195489A 2006-07-18 2006-07-18 光学系、描画装置、及びデバイス製造方法 Expired - Fee Related JP4871662B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006195489A JP4871662B2 (ja) 2006-07-18 2006-07-18 光学系、描画装置、及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006195489A JP4871662B2 (ja) 2006-07-18 2006-07-18 光学系、描画装置、及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2008027965A JP2008027965A (ja) 2008-02-07
JP2008027965A5 true JP2008027965A5 (enExample) 2009-09-03
JP4871662B2 JP4871662B2 (ja) 2012-02-08

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ID=39118327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006195489A Expired - Fee Related JP4871662B2 (ja) 2006-07-18 2006-07-18 光学系、描画装置、及びデバイス製造方法

Country Status (1)

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JP (1) JP4871662B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8445869B2 (en) 2008-04-15 2013-05-21 Mapper Lithography Ip B.V. Projection lens arrangement
US8890094B2 (en) 2008-02-26 2014-11-18 Mapper Lithography Ip B.V. Projection lens arrangement
US8258484B2 (en) 2008-04-15 2012-09-04 Mapper Lithography Ip B.V. Beamlet blanker arrangement
NL2002031C (en) * 2008-09-26 2010-03-29 Mapper Lithography Ip Bv Patterned beamlet system.
KR101714005B1 (ko) 2010-07-13 2017-03-09 삼성전자 주식회사 광학 소자 및 이를 포함하는 노광 장치
EP4088301A1 (en) 2020-01-06 2022-11-16 ASML Netherlands B.V. Charged particle assessment tool, inspection method

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