JP4871662B2 - 光学系、描画装置、及びデバイス製造方法 - Google Patents

光学系、描画装置、及びデバイス製造方法 Download PDF

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Publication number
JP4871662B2
JP4871662B2 JP2006195489A JP2006195489A JP4871662B2 JP 4871662 B2 JP4871662 B2 JP 4871662B2 JP 2006195489 A JP2006195489 A JP 2006195489A JP 2006195489 A JP2006195489 A JP 2006195489A JP 4871662 B2 JP4871662 B2 JP 4871662B2
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charged
lens
optical system
array
charged beam
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Expired - Fee Related
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JP2006195489A
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Japanese (ja)
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JP2008027965A5 (enExample
JP2008027965A (ja
Inventor
兼一 長永
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Canon Inc
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Canon Inc
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  • Electron Beam Exposure (AREA)
JP2006195489A 2006-07-18 2006-07-18 光学系、描画装置、及びデバイス製造方法 Expired - Fee Related JP4871662B2 (ja)

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JP2006195489A JP4871662B2 (ja) 2006-07-18 2006-07-18 光学系、描画装置、及びデバイス製造方法

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JP2006195489A JP4871662B2 (ja) 2006-07-18 2006-07-18 光学系、描画装置、及びデバイス製造方法

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JP2008027965A JP2008027965A (ja) 2008-02-07
JP2008027965A5 JP2008027965A5 (enExample) 2009-09-03
JP4871662B2 true JP4871662B2 (ja) 2012-02-08

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JP2006195489A Expired - Fee Related JP4871662B2 (ja) 2006-07-18 2006-07-18 光学系、描画装置、及びデバイス製造方法

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8445869B2 (en) 2008-04-15 2013-05-21 Mapper Lithography Ip B.V. Projection lens arrangement
US8890094B2 (en) 2008-02-26 2014-11-18 Mapper Lithography Ip B.V. Projection lens arrangement
US8258484B2 (en) 2008-04-15 2012-09-04 Mapper Lithography Ip B.V. Beamlet blanker arrangement
NL2002031C (en) * 2008-09-26 2010-03-29 Mapper Lithography Ip Bv Patterned beamlet system.
KR101714005B1 (ko) 2010-07-13 2017-03-09 삼성전자 주식회사 광학 소자 및 이를 포함하는 노광 장치
US11984295B2 (en) 2020-01-06 2024-05-14 Asml Netherlands B.V. Charged particle assessment tool, inspection method

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