JP2012004308A5 - - Google Patents

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Publication number
JP2012004308A5
JP2012004308A5 JP2010137473A JP2010137473A JP2012004308A5 JP 2012004308 A5 JP2012004308 A5 JP 2012004308A5 JP 2010137473 A JP2010137473 A JP 2010137473A JP 2010137473 A JP2010137473 A JP 2010137473A JP 2012004308 A5 JP2012004308 A5 JP 2012004308A5
Authority
JP
Japan
Prior art keywords
substrate
stage
radiation plate
exposure apparatus
mirror surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010137473A
Other languages
English (en)
Japanese (ja)
Other versions
JP5517766B2 (ja
JP2012004308A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2010137473A priority Critical patent/JP5517766B2/ja
Priority claimed from JP2010137473A external-priority patent/JP5517766B2/ja
Priority to US13/157,618 priority patent/US8810770B2/en
Publication of JP2012004308A publication Critical patent/JP2012004308A/ja
Publication of JP2012004308A5 publication Critical patent/JP2012004308A5/ja
Application granted granted Critical
Publication of JP5517766B2 publication Critical patent/JP5517766B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2010137473A 2010-06-16 2010-06-16 露光装置およびデバイス製造方法 Expired - Fee Related JP5517766B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2010137473A JP5517766B2 (ja) 2010-06-16 2010-06-16 露光装置およびデバイス製造方法
US13/157,618 US8810770B2 (en) 2010-06-16 2011-06-10 Exposure apparatus and article manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010137473A JP5517766B2 (ja) 2010-06-16 2010-06-16 露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2012004308A JP2012004308A (ja) 2012-01-05
JP2012004308A5 true JP2012004308A5 (enExample) 2013-07-11
JP5517766B2 JP5517766B2 (ja) 2014-06-11

Family

ID=45328373

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010137473A Expired - Fee Related JP5517766B2 (ja) 2010-06-16 2010-06-16 露光装置およびデバイス製造方法

Country Status (2)

Country Link
US (1) US8810770B2 (enExample)
JP (1) JP5517766B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150331338A1 (en) * 2012-12-17 2015-11-19 Asml Netherlands B.V. Substrate Support for a Lithographic Apparatus and Lithographic Apparatus
NL2016541A (en) 2015-04-21 2016-10-24 Asml Netherlands Bv Lithographic Apparatus.
JP7060584B2 (ja) 2016-09-02 2022-04-26 エーエスエムエル ネザーランズ ビー．ブイ． 冷却装置およびリソグラフィ装置
WO2018041491A1 (en) 2016-09-02 2018-03-08 Asml Netherlands B.V. Lithographic apparatus
JP7481390B2 (ja) * 2022-04-15 2024-05-10 トヨタ自動車株式会社 光軸調整治具

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5363196A (en) * 1992-01-10 1994-11-08 Ultratech Stepper, Inc. Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stage
JPH06124873A (ja) * 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JP3448787B2 (ja) * 1994-08-30 2003-09-22 株式会社ニコン ステージ位置計測装置
US5661548A (en) * 1994-11-30 1997-08-26 Nikon Corporation Projection exposure method and apparatus including a changing system for changing the reference image-formation position used to generate a focus signal
JPH0992613A (ja) 1995-09-21 1997-04-04 Nikon Corp 温調装置及び走査型露光装置
US6012697A (en) * 1996-04-12 2000-01-11 Nikon Corporation Stage and supporting mechanism for supporting movable mirror on stage
JP4745556B2 (ja) * 2001-08-20 2011-08-10 キヤノン株式会社 位置決め装置、露光装置、及びデバイス製造方法
US20040169832A1 (en) * 2001-08-24 2004-09-02 Nikon Corporation Vacuum chamber having instrument-mounting bulkhead exhibiting reduced deformation in response to pressure differential, and energy-beam systems comprising same
JP2004273926A (ja) * 2003-03-11 2004-09-30 Canon Inc 露光装置
JP2005033179A (ja) * 2003-06-18 2005-02-03 Canon Inc 露光装置及びデバイス製造方法
JP2006317316A (ja) * 2005-05-13 2006-11-24 Canon Inc ステージ装置およびステージ装置を用いた露光装置
US7649611B2 (en) * 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008159677A (ja) * 2006-12-21 2008-07-10 Canon Inc ステージ装置および露光装置
CN101569000B (zh) * 2007-09-03 2011-07-13 佳能安内华股份有限公司 衬底热处理设备和衬底热处理方法

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