JP4504060B2 - 荷電粒子線露光装置 - Google Patents

荷電粒子線露光装置 Download PDF

Info

Publication number
JP4504060B2
JP4504060B2 JP2004090809A JP2004090809A JP4504060B2 JP 4504060 B2 JP4504060 B2 JP 4504060B2 JP 2004090809 A JP2004090809 A JP 2004090809A JP 2004090809 A JP2004090809 A JP 2004090809A JP 4504060 B2 JP4504060 B2 JP 4504060B2
Authority
JP
Japan
Prior art keywords
lens
charged particle
beams
area
changing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004090809A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005277239A (ja
JP2005277239A5 (enExample
Inventor
恭宏 染田
理 上村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp, Canon Inc filed Critical Hitachi High Technologies Corp
Priority to JP2004090809A priority Critical patent/JP4504060B2/ja
Publication of JP2005277239A publication Critical patent/JP2005277239A/ja
Publication of JP2005277239A5 publication Critical patent/JP2005277239A5/ja
Application granted granted Critical
Publication of JP4504060B2 publication Critical patent/JP4504060B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Electron Beam Exposure (AREA)
JP2004090809A 2004-03-26 2004-03-26 荷電粒子線露光装置 Expired - Fee Related JP4504060B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004090809A JP4504060B2 (ja) 2004-03-26 2004-03-26 荷電粒子線露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004090809A JP4504060B2 (ja) 2004-03-26 2004-03-26 荷電粒子線露光装置

Publications (3)

Publication Number Publication Date
JP2005277239A JP2005277239A (ja) 2005-10-06
JP2005277239A5 JP2005277239A5 (enExample) 2007-04-12
JP4504060B2 true JP4504060B2 (ja) 2010-07-14

Family

ID=35176539

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004090809A Expired - Fee Related JP4504060B2 (ja) 2004-03-26 2004-03-26 荷電粒子線露光装置

Country Status (1)

Country Link
JP (1) JP4504060B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101412978B1 (ko) 2011-09-01 2014-06-27 가부시키가이샤 뉴플레어 테크놀로지 멀티 하전 입자빔 묘화 장치 및 멀티 하전 입자빔 묘화 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0562892A (ja) * 1991-09-03 1993-03-12 Nikon Corp パターン形成装置
JP3336510B2 (ja) * 1993-11-29 2002-10-21 株式会社ニコン パターン転写方法およびそれに用いる装置並びにマスク
JPH11176738A (ja) * 1997-12-10 1999-07-02 Nikon Corp 荷電ビーム露光装置及び荷電ビーム露光方法
JP3357874B2 (ja) * 2001-05-30 2002-12-16 株式会社日立製作所 電子ビーム描画装置及び電子ビーム描画方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101412978B1 (ko) 2011-09-01 2014-06-27 가부시키가이샤 뉴플레어 테크놀로지 멀티 하전 입자빔 묘화 장치 및 멀티 하전 입자빔 묘화 방법

Also Published As

Publication number Publication date
JP2005277239A (ja) 2005-10-06

Similar Documents

Publication Publication Date Title
JP3787417B2 (ja) 電子ビーム露光方法及び電子ビーム露光装置
JP4761508B2 (ja) 荷電粒子露光装置およびデバイス製造方法
JP2003203836A (ja) 露光装置及びその制御方法並びにデバイス製造方法
JP3647136B2 (ja) 電子ビーム露光装置
US7388214B2 (en) Charged-particle beam exposure apparatus and method
JP2001015430A (ja) 複数の開口を持つ電子ビーム投影リソグラフィシステム
US6452193B1 (en) Electron beam exposure apparatus, electron lens, and device manufacturing method
JP2003045789A (ja) 描画装置及び描画方法
US7049610B2 (en) Charged particle beam exposure method, charged particle beam exposure apparatus, and device manufacturing method
JP4504060B2 (ja) 荷電粒子線露光装置
JP4458372B2 (ja) マルチビーム荷電粒子線装置及びマルチビーム荷電粒子線の制御方法およびデバイス製造方法
US7034314B2 (en) Projection apparatus for projecting a pattern formed on a mask onto a substrate and a control method for a projection apparatus
JP4745739B2 (ja) 静電レンズ装置、露光装置、及びデバイス製造方法
JP2007208038A (ja) 荷電粒子線露光装置
JP4468753B2 (ja) 荷電粒子線露光装置及び該装置を用いたデバイス製造方法
JP4804136B2 (ja) 荷電粒子線装置及びデバイス製造方法
JP3976835B2 (ja) 電子ビーム露光方法及び電子ビーム露光装置
JP4356064B2 (ja) 荷電粒子線露光装置および該装置を用いたデバイス製造方法
JP2001244165A (ja) 近接効果補正方法、レチクル及びデバイス製造方法
JP3728315B2 (ja) 電子ビーム露光装置、電子ビーム露光方法、および、デバイス製造方法
JP4494734B2 (ja) 荷電粒子線描画方法、荷電粒子線露光装置及びデバイス製造方法
JP4738822B2 (ja) 静電レンズ装置およびその調整方法、荷電粒子線露光装置、ならびにデバイス製造方法
JP2004266128A (ja) 荷電粒子線露光装置及び半導体デバイスの製造方法
JP4804592B2 (ja) 荷電粒子線装置及びデバイス製造方法
JPH10308340A (ja) 電子ビーム露光方法及び電子ビーム露光装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070223

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070223

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20090413

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090622

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20090709

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090805

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20091113

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100108

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100326

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100422

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130430

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130430

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140430

Year of fee payment: 4

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees