JP2005184029A5 - - Google Patents

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Publication number
JP2005184029A5
JP2005184029A5 JP2005041612A JP2005041612A JP2005184029A5 JP 2005184029 A5 JP2005184029 A5 JP 2005184029A5 JP 2005041612 A JP2005041612 A JP 2005041612A JP 2005041612 A JP2005041612 A JP 2005041612A JP 2005184029 A5 JP2005184029 A5 JP 2005184029A5
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JP
Japan
Prior art keywords
insulating film
film
memory element
region
volatile memory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005041612A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005184029A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005041612A priority Critical patent/JP2005184029A/ja
Priority claimed from JP2005041612A external-priority patent/JP2005184029A/ja
Publication of JP2005184029A publication Critical patent/JP2005184029A/ja
Publication of JP2005184029A5 publication Critical patent/JP2005184029A5/ja
Pending legal-status Critical Current

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JP2005041612A 2005-02-18 2005-02-18 不揮発性記憶素子及び半導体集積回路装置 Pending JP2005184029A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005041612A JP2005184029A (ja) 2005-02-18 2005-02-18 不揮発性記憶素子及び半導体集積回路装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005041612A JP2005184029A (ja) 2005-02-18 2005-02-18 不揮発性記憶素子及び半導体集積回路装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2001257698A Division JP2003068893A (ja) 2001-08-28 2001-08-28 不揮発性記憶素子及び半導体集積回路

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008008964A Division JP2008172251A (ja) 2008-01-18 2008-01-18 不揮発性記憶素子及び半導体集積回路装置

Publications (2)

Publication Number Publication Date
JP2005184029A JP2005184029A (ja) 2005-07-07
JP2005184029A5 true JP2005184029A5 (enExample) 2008-03-06

Family

ID=34792800

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005041612A Pending JP2005184029A (ja) 2005-02-18 2005-02-18 不揮発性記憶素子及び半導体集積回路装置

Country Status (1)

Country Link
JP (1) JP2005184029A (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100672829B1 (ko) * 2005-08-31 2007-01-22 삼성전자주식회사 전하 트랩 절연체의 제조 방법 및 소노스 타입의 비휘발성메모리 장치의 제조방법
JP4730268B2 (ja) * 2006-09-26 2011-07-20 株式会社デンソー 不揮発性半導体記憶装置のデータ書き換え方法
US8101989B2 (en) * 2006-11-20 2012-01-24 Macronix International Co., Ltd. Charge trapping devices with field distribution layer over tunneling barrier
US8320191B2 (en) 2007-08-30 2012-11-27 Infineon Technologies Ag Memory cell arrangement, method for controlling a memory cell, memory array and electronic device
US8068370B2 (en) 2008-04-18 2011-11-29 Macronix International Co., Ltd. Floating gate memory device with interpoly charge trapping structure
US8987098B2 (en) 2012-06-19 2015-03-24 Macronix International Co., Ltd. Damascene word line
US9379126B2 (en) 2013-03-14 2016-06-28 Macronix International Co., Ltd. Damascene conductor for a 3D device
US9099538B2 (en) 2013-09-17 2015-08-04 Macronix International Co., Ltd. Conductor with a plurality of vertical extensions for a 3D device
US9559113B2 (en) 2014-05-01 2017-01-31 Macronix International Co., Ltd. SSL/GSL gate oxide in 3D vertical channel NAND

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