JP2005136071A - クロスポイント型強誘電体メモリ - Google Patents
クロスポイント型強誘電体メモリ Download PDFInfo
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- JP2005136071A JP2005136071A JP2003369074A JP2003369074A JP2005136071A JP 2005136071 A JP2005136071 A JP 2005136071A JP 2003369074 A JP2003369074 A JP 2003369074A JP 2003369074 A JP2003369074 A JP 2003369074A JP 2005136071 A JP2005136071 A JP 2005136071A
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- 239000010410 layer Substances 0.000 claims abstract description 243
- 239000011229 interlayer Substances 0.000 claims abstract description 61
- 239000003990 capacitor Substances 0.000 claims abstract description 37
- 230000002093 peripheral effect Effects 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- 238000003491 array Methods 0.000 claims description 10
- 239000004020 conductor Substances 0.000 claims description 10
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000009413 insulation Methods 0.000 abstract description 5
- 239000012212 insulator Substances 0.000 abstract 6
- 238000003475 lamination Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 17
- 239000000463 material Substances 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 13
- 239000000758 substrate Substances 0.000 description 6
- 238000010292 electrical insulation Methods 0.000 description 5
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000010354 integration Effects 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 229910004121 SrRuO Inorganic materials 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 229910018921 CoO 3 Inorganic materials 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 229910020684 PbZr Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005621 ferroelectricity Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/22—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8221—Three dimensional integrated circuits stacked in different levels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0688—Integrated circuits having a three-dimensional layout
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B53/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
- H10B53/40—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors characterised by the peripheral circuit region
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Memories (AREA)
Abstract
【解決手段】 クロスポイント型強誘電体メモリ100は、第1メモリセルアレイ30と第2メモリセルアレイ60とが、第1層間絶縁層20と第2層間絶縁層50とを介して積層されている。第1メモリセルアレイ30は、ストライプ状に形成された下部電極36と、下部電極36と交叉する方向にストライプ状に形成された上部電極38と、下部電極36と、上部電極38との、少なくとも交叉部分に配置される強誘電体キャパシタ34と、強誘電体キャパシタ34の相互間に形成された埋め込み絶縁層32とを含む。第1層間絶縁層20は、第1絶縁層24と、第2絶縁層26との間に導電層22を有している。
【選択図】 図2
Description
複数のメモリセルアレイが、層間絶縁層を介して積層され、
前記メモリセルアレイは、
ストライプ状に形成された下部電極と、
前記下部電極と交叉する方向にストライプ状に形成された上部電極と、
前記下部電極と、前記上部電極との、少なくとも交叉部分に配置される強誘電体部とを含む強誘電体キャパシタと、
前記強誘電体キャパシタの相互間に形成された埋め込み絶縁層と、を含み、
前記層間絶縁層は、第1絶縁層と、第2絶縁層との間に導電層を有している。
1. 第1の実施の形態
図1は、第1の実施の形態に係るクロスポイント型強誘電体メモリを模式的に示す平面図であり、図2は、図1のA−A線に沿ってクロスポイント型強誘電体メモリの一部を模式的に示す断面図である。図3(a)は、第1の実施の形態に係るクロスポイント型強誘電体メモリの層間絶縁層を模式的に示す平面図であり、図3(b)は、図3(a)のA−Aにおける断面を模式的に示す断面図である。図4は、強誘電体キャパシタを模式的に示す斜視図である。
図5(a)は、第2の実施形態に係るクロスポイント型強誘電体メモリの層間絶縁層を模式的に示す平図面であり、図5(b)は、図5(a)のA−Aにおける断面を模式的に示す断面図である。
Claims (8)
- 複数のメモリセルアレイが、層間絶縁層を介して積層され、
前記メモリセルアレイは、
ストライプ状に形成された下部電極と、
前記下部電極と交叉する方向にストライプ状に形成された上部電極と、
前記下部電極と、前記上部電極との、少なくとも交叉部分に配置される強誘電体部とを含む強誘電体キャパシタと、
前記強誘電体キャパシタの相互間に形成された埋め込み絶縁層と、を含み、
前記層間絶縁層は、第1絶縁層と、第2絶縁層との間に導電層を有するクロスポイント型強誘電体メモリ。 - 請求項1において、
前記層間絶縁層は、前記第1絶縁層と、前記導電層と、前記第2絶縁層とが、互いに概略同一の外形状を有し、上層に隣接する前記メモリセルアレイの形成領域と概略一致して形成させたクロスポイント型強誘電体メモリ。 - 請求項1および2において、
前記第1絶縁層と、前記第2絶縁層とは、前記層間絶縁層の形成領域の一部で、互いに接触部分を有するクロスポイント型強誘電体メモリ。 - 請求項1〜3において、
前記導電層は、酸化物導電材料からなるクロスポイント型強誘電体メモリ。 - 請求項1〜3において、
前記導電層は、光を透過する導電材料からなるクロスポイント型強誘電体メモリ。 - 請求項1〜5において、
前記導電層は、所定電位に設定されたクロスポイント型強誘電体メモリ。 - 請求項1〜6において、
前記電位は、周辺回路のグランドレベルであるクロスポイント型強誘電体メモリ。 - 請求項5において、
前記強誘電体キャパシタは、前記層間絶縁層を形成した後、光を照射して、結晶化させることを含むクロスポイント型強誘電体メモリ。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003369074A JP2005136071A (ja) | 2003-10-29 | 2003-10-29 | クロスポイント型強誘電体メモリ |
US10/976,241 US7184293B2 (en) | 2003-10-29 | 2004-10-27 | Crosspoint-type ferroelectric memory |
CN200410089671.6A CN1612349A (zh) | 2003-10-29 | 2004-10-29 | 交差点型强电介质存储器 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003369074A JP2005136071A (ja) | 2003-10-29 | 2003-10-29 | クロスポイント型強誘電体メモリ |
Publications (1)
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JP2005136071A true JP2005136071A (ja) | 2005-05-26 |
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JP2003369074A Pending JP2005136071A (ja) | 2003-10-29 | 2003-10-29 | クロスポイント型強誘電体メモリ |
Country Status (3)
Country | Link |
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US (1) | US7184293B2 (ja) |
JP (1) | JP2005136071A (ja) |
CN (1) | CN1612349A (ja) |
Cited By (6)
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KR100802248B1 (ko) | 2005-12-30 | 2008-02-11 | 주식회사 하이닉스반도체 | 비휘발성 반도체 메모리 장치 |
KR100827448B1 (ko) | 2007-02-16 | 2008-05-07 | 삼성전자주식회사 | 저항체를 이용한 비휘발성 메모리 장치 |
JP2010161137A (ja) * | 2009-01-07 | 2010-07-22 | Hitachi Ltd | 半導体記憶装置の製造方法 |
US8477554B2 (en) | 2010-06-10 | 2013-07-02 | Samsung Electronics Co., Ltd. | Semiconductor memory device |
KR101286718B1 (ko) * | 2006-11-22 | 2013-07-16 | 서울시립대학교 산학협력단 | 메모리 장치 |
JP2017028327A (ja) * | 2011-09-21 | 2017-02-02 | 株式会社半導体エネルギー研究所 | 半導体装置 |
Families Citing this family (3)
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TW200802369A (en) * | 2005-12-30 | 2008-01-01 | Hynix Semiconductor Inc | Nonvolatile semiconductor memory device |
US20100135061A1 (en) * | 2008-12-02 | 2010-06-03 | Shaoping Li | Non-Volatile Memory Cell with Ferroelectric Layer Configurations |
FR3050739B1 (fr) | 2016-05-02 | 2018-06-01 | Stmicroelectronics (Rousset) Sas | Procede de fabrication de cellules-memoires resistives |
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JP2003046067A (ja) * | 2001-05-22 | 2003-02-14 | Sony Corp | 半導体メモリ及びその製造方法 |
JP2003298021A (ja) * | 2002-03-29 | 2003-10-17 | Seiko Epson Corp | 強誘電体薄膜の形成方法、強誘電体メモリならびに強誘電体メモリの製造方法、および半導体装置ならびに半導体装置の製造方法 |
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-
2004
- 2004-10-27 US US10/976,241 patent/US7184293B2/en not_active Expired - Fee Related
- 2004-10-29 CN CN200410089671.6A patent/CN1612349A/zh active Pending
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Cited By (12)
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KR100802248B1 (ko) | 2005-12-30 | 2008-02-11 | 주식회사 하이닉스반도체 | 비휘발성 반도체 메모리 장치 |
KR101286718B1 (ko) * | 2006-11-22 | 2013-07-16 | 서울시립대학교 산학협력단 | 메모리 장치 |
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JP2017028327A (ja) * | 2011-09-21 | 2017-02-02 | 株式会社半導体エネルギー研究所 | 半導体装置 |
JP2018125551A (ja) * | 2011-09-21 | 2018-08-09 | 株式会社半導体エネルギー研究所 | 半導体装置 |
US10170486B2 (en) | 2011-09-21 | 2019-01-01 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor storage device comprising peripheral circuit, shielding layer, and memory cell array |
KR20190096885A (ko) * | 2011-09-21 | 2019-08-20 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 기억 장치 |
JP2020010055A (ja) * | 2011-09-21 | 2020-01-16 | 株式会社半導体エネルギー研究所 | 半導体装置 |
KR102124299B1 (ko) * | 2011-09-21 | 2020-06-18 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 기억 장치 |
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Publication number | Publication date |
---|---|
US20050117431A1 (en) | 2005-06-02 |
US7184293B2 (en) | 2007-02-27 |
CN1612349A (zh) | 2005-05-04 |
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