JP2005055886A - 感光性樹脂組成物除去用洗浄剤組成物 - Google Patents
感光性樹脂組成物除去用洗浄剤組成物 Download PDFInfo
- Publication number
- JP2005055886A JP2005055886A JP2004213791A JP2004213791A JP2005055886A JP 2005055886 A JP2005055886 A JP 2005055886A JP 2004213791 A JP2004213791 A JP 2004213791A JP 2004213791 A JP2004213791 A JP 2004213791A JP 2005055886 A JP2005055886 A JP 2005055886A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- ketone
- composition
- cleaning composition
- cleaning agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/044—Hydroxides or bases
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Detergent Compositions (AREA)
- Materials For Photolithography (AREA)
Abstract
【解決手段】本発明は、半導体素子及び液晶ディスプレイ素子の製造工程で使用される感光性樹脂組成物除去用洗浄剤組成物に関し、より詳しくは、a)アルキルアミド;及びb)ケトン;を含む洗浄剤組成物に関する。本発明の洗浄剤組成物は、c)ペルフルオロアルキルアミンオキシドをさらに含むことができる。
【選択図】なし
Description
下記表1のような組成及び含量の洗浄剤組成物を各々製造した。(単位:重量部)
5インチの酸化シリコン基板に各々の感光膜組成物を塗布した後、前記実施例1乃至4の洗浄剤組成物及び比較例1乃至5の洗浄剤組成物でエッジ部の不必要な感光膜を除去する実験(Edge Bead Removing実験:以下、EBR実験と言う)を行った。EBR実験も、やはり、基板に感光膜を塗布する時に使用したのと同一な回転被覆機を使用した。
Claims (7)
- a)アルキルアミド;及び
b)ケトン;
を含むことを特徴とする、感光性樹脂組成物除去用洗浄剤組成物。 - a)アルキルアミド10乃至90重量部;及び
b)ケトン10乃至90重量部;
を含むことを特徴とする、請求項1に記載の感光性樹脂組成物除去用洗浄剤組成物。 - 前記洗浄剤組成物は、c)ペルフルオロアルキルアミンオキシドをさらに含むことを特徴とする、請求項1に記載の感光性樹脂組成物除去用洗浄剤組成物。
- a)アルキルアミド10乃至90重量部;
b)ケトン10乃至90重量部;及び
c)ペルフルオロアルキルアミンオキシド0.001乃至1重量部;
を含むことを特徴とする、請求項3に記載の感光性樹脂組成物除去用洗浄剤組成物。 - 前記アルキルアミドは、N-メチルアセトアミド、ジメチルホルムアミド、及びジメチルアセトアミドからなる群より1種以上選択されることを特徴とする、請求項1乃至4のうちのいずれか一項に記載の感光性樹脂組成物除去用洗浄剤組成物。
- 前記ケトンは、アセトン、メチルイソプロピルケトン、メチルノーマルプロピルケトン、メチルエチルケトン、メチルイソブチルケトン、ジイソブチルケトン、シクロペンタノン、シクロヘキサノン、及びシクロヘプタノンからなる群より1種以上選択されることを特徴とする、請求項1乃至4のうちのいずれか一項に記載の感光性樹脂組成物除去用洗浄剤組成物。
- 前記ペルフルオロアルキルアミンオキシドのアルキル基は、炭素数が5乃至30であることを特徴とする、請求項3または4に記載の感光性樹脂組成物除去用洗浄剤組成物。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030053380A KR101016724B1 (ko) | 2003-08-01 | 2003-08-01 | 감광성 수지 조성물을 제거하기 위한 씬너 조성물 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005055886A true JP2005055886A (ja) | 2005-03-03 |
JP4494897B2 JP4494897B2 (ja) | 2010-06-30 |
Family
ID=34374110
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004213791A Active JP4494897B2 (ja) | 2003-08-01 | 2004-07-22 | 感光性樹脂組成物除去用洗浄剤組成物 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4494897B2 (ja) |
KR (1) | KR101016724B1 (ja) |
CN (1) | CN100595680C (ja) |
TW (1) | TWI306184B (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007012997A (ja) * | 2005-07-01 | 2007-01-18 | Dainippon Screen Mfg Co Ltd | 基板乾燥装置およびそれを備えた基板処理システム |
US7766565B2 (en) | 2005-07-01 | 2010-08-03 | Sokudo Co., Ltd. | Substrate drying apparatus, substrate cleaning apparatus and substrate processing system |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101328097B1 (ko) * | 2006-01-11 | 2013-11-13 | 주식회사 동진쎄미켐 | 티에프티 엘시디용 칼라 레지스트 박리액 조성물 |
WO2023092278A1 (zh) * | 2021-11-23 | 2023-06-01 | 才将科技股份有限公司 | 一种清洗粘结层的组合物及其应用 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52100235A (en) * | 1976-02-19 | 1977-08-23 | Sony Corp | Stripping solution of photosolubilizable light sensitive resin |
JPS61172147A (ja) * | 1985-01-25 | 1986-08-02 | Konishiroku Photo Ind Co Ltd | 平版印刷版の修正剤 |
JPH02981A (ja) * | 1988-02-25 | 1990-01-05 | Hoya Corp | 感光性樹脂用剥離液及びこれを用いる感光性樹脂の剥離方法 |
JPH07219241A (ja) * | 1993-10-07 | 1995-08-18 | J T Baker Inc | 金属腐食を減少させるための還元剤を含有しているフォトレジストストリッパー |
JPH08165495A (ja) * | 1994-12-15 | 1996-06-25 | Tokuyama Sekiyu Kagaku Kk | ポリイミド洗浄用溶剤 |
JPH10183191A (ja) * | 1996-02-16 | 1998-07-14 | Nitto Chem Ind Co Ltd | 工業装置に付着した残存物の洗浄方法 |
JPH1144960A (ja) * | 1997-06-24 | 1999-02-16 | Kurarianto Japan Kk | リソグラフィー用洗浄剤 |
JPH11218933A (ja) * | 1998-01-30 | 1999-08-10 | Fuji Film Olin Kk | レジスト洗浄除去用溶剤および電子部品製造用基材の製造方法 |
JP2001244258A (ja) * | 2000-02-29 | 2001-09-07 | Sumitomo Bakelite Co Ltd | 半導体用有機絶縁膜形成方法 |
JP2003507772A (ja) * | 1999-08-19 | 2003-02-25 | 東進セミケム株式会社 | フォトレジスト除去用組成物 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05181289A (ja) * | 1992-01-06 | 1993-07-23 | Fuji Xerox Co Ltd | 有機感光体の有機被膜除去方法および有機感光体用再生基体 |
JPH08286394A (ja) * | 1995-04-11 | 1996-11-01 | Toray Eng Co Ltd | 感光塗膜の除去方法 |
KR100378552B1 (ko) | 2000-01-14 | 2003-03-29 | 주식회사 동진쎄미켐 | 레지스트 리무버 조성물 |
-
2003
- 2003-08-01 KR KR1020030053380A patent/KR101016724B1/ko active IP Right Grant
-
2004
- 2004-06-29 TW TW093119118A patent/TWI306184B/zh not_active IP Right Cessation
- 2004-07-22 JP JP2004213791A patent/JP4494897B2/ja active Active
- 2004-07-30 CN CN200410070223A patent/CN100595680C/zh not_active Expired - Fee Related
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52100235A (en) * | 1976-02-19 | 1977-08-23 | Sony Corp | Stripping solution of photosolubilizable light sensitive resin |
JPS61172147A (ja) * | 1985-01-25 | 1986-08-02 | Konishiroku Photo Ind Co Ltd | 平版印刷版の修正剤 |
JPH02981A (ja) * | 1988-02-25 | 1990-01-05 | Hoya Corp | 感光性樹脂用剥離液及びこれを用いる感光性樹脂の剥離方法 |
JPH07219241A (ja) * | 1993-10-07 | 1995-08-18 | J T Baker Inc | 金属腐食を減少させるための還元剤を含有しているフォトレジストストリッパー |
JPH08165495A (ja) * | 1994-12-15 | 1996-06-25 | Tokuyama Sekiyu Kagaku Kk | ポリイミド洗浄用溶剤 |
JPH10183191A (ja) * | 1996-02-16 | 1998-07-14 | Nitto Chem Ind Co Ltd | 工業装置に付着した残存物の洗浄方法 |
JPH1144960A (ja) * | 1997-06-24 | 1999-02-16 | Kurarianto Japan Kk | リソグラフィー用洗浄剤 |
JPH11218933A (ja) * | 1998-01-30 | 1999-08-10 | Fuji Film Olin Kk | レジスト洗浄除去用溶剤および電子部品製造用基材の製造方法 |
JP2003507772A (ja) * | 1999-08-19 | 2003-02-25 | 東進セミケム株式会社 | フォトレジスト除去用組成物 |
JP2001244258A (ja) * | 2000-02-29 | 2001-09-07 | Sumitomo Bakelite Co Ltd | 半導体用有機絶縁膜形成方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007012997A (ja) * | 2005-07-01 | 2007-01-18 | Dainippon Screen Mfg Co Ltd | 基板乾燥装置およびそれを備えた基板処理システム |
US7766565B2 (en) | 2005-07-01 | 2010-08-03 | Sokudo Co., Ltd. | Substrate drying apparatus, substrate cleaning apparatus and substrate processing system |
Also Published As
Publication number | Publication date |
---|---|
KR101016724B1 (ko) | 2011-02-25 |
CN1580959A (zh) | 2005-02-16 |
JP4494897B2 (ja) | 2010-06-30 |
KR20050014955A (ko) | 2005-02-21 |
CN100595680C (zh) | 2010-03-24 |
TW200506551A (en) | 2005-02-16 |
TWI306184B (en) | 2009-02-11 |
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