JPS52100235A - Stripping solution of photosolubilizable light sensitive resin - Google Patents

Stripping solution of photosolubilizable light sensitive resin

Info

Publication number
JPS52100235A
JPS52100235A JP1738976A JP1738976A JPS52100235A JP S52100235 A JPS52100235 A JP S52100235A JP 1738976 A JP1738976 A JP 1738976A JP 1738976 A JP1738976 A JP 1738976A JP S52100235 A JPS52100235 A JP S52100235A
Authority
JP
Japan
Prior art keywords
photosolubilizable
light sensitive
sensitive resin
stripping solution
dimethylformamide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1738976A
Other languages
Japanese (ja)
Other versions
JPS576101B2 (en
Inventor
Hiroshi Yamanoi
Akira Kamihira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP1738976A priority Critical patent/JPS52100235A/en
Publication of JPS52100235A publication Critical patent/JPS52100235A/en
Publication of JPS576101B2 publication Critical patent/JPS576101B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To perfectly remove a positive type photoresist for use in forming electrodes of surface wave filter elements and the like, even if its surface becomes a passive state, by mixing acetone and dimethylformamide at a specified ratio.
JP1738976A 1976-02-19 1976-02-19 Stripping solution of photosolubilizable light sensitive resin Granted JPS52100235A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1738976A JPS52100235A (en) 1976-02-19 1976-02-19 Stripping solution of photosolubilizable light sensitive resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1738976A JPS52100235A (en) 1976-02-19 1976-02-19 Stripping solution of photosolubilizable light sensitive resin

Publications (2)

Publication Number Publication Date
JPS52100235A true JPS52100235A (en) 1977-08-23
JPS576101B2 JPS576101B2 (en) 1982-02-03

Family

ID=11942631

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1738976A Granted JPS52100235A (en) 1976-02-19 1976-02-19 Stripping solution of photosolubilizable light sensitive resin

Country Status (1)

Country Link
JP (1) JPS52100235A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005055886A (en) * 2003-08-01 2005-03-03 Dongjin Semichem Co Ltd Cleaning agent composition for removing photosensitive resin composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005055886A (en) * 2003-08-01 2005-03-03 Dongjin Semichem Co Ltd Cleaning agent composition for removing photosensitive resin composition
JP4494897B2 (en) * 2003-08-01 2010-06-30 東進セミケム株式会社 Cleaning composition for removing photosensitive resin composition

Also Published As

Publication number Publication date
JPS576101B2 (en) 1982-02-03

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