JP2004534107A - リトグラフィーに応用するための熱硬化された下部層 - Google Patents

リトグラフィーに応用するための熱硬化された下部層 Download PDF

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Publication number
JP2004534107A
JP2004534107A JP2002572501A JP2002572501A JP2004534107A JP 2004534107 A JP2004534107 A JP 2004534107A JP 2002572501 A JP2002572501 A JP 2002572501A JP 2002572501 A JP2002572501 A JP 2002572501A JP 2004534107 A JP2004534107 A JP 2004534107A
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JP
Japan
Prior art keywords
units
methacrylate
acrylate
polymer
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002572501A
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English (en)
Japanese (ja)
Inventor
ビー・デ・ビノード
サンジェイ・マーリク
グレゴリー・ドミニク・スパーツィアーノ
ジョン・ジョウゼフ・ビアフォーア
パトリック・フォスター
シドニー・ジョージ・スレイター
トマス・スタインハウスラー
アンドルー・ジョウゼフ・ブレイクニー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olin Microelectronic Chemicals Inc
Original Assignee
Olin Microelectronic Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olin Microelectronic Chemicals Inc filed Critical Olin Microelectronic Chemicals Inc
Publication of JP2004534107A publication Critical patent/JP2004534107A/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
JP2002572501A 2001-03-13 2002-03-07 リトグラフィーに応用するための熱硬化された下部層 Pending JP2004534107A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27552801P 2001-03-13 2001-03-13
PCT/US2002/007136 WO2002073307A2 (en) 2001-03-13 2002-03-07 Thermally cured underlayer for lithographic application

Publications (1)

Publication Number Publication Date
JP2004534107A true JP2004534107A (ja) 2004-11-11

Family

ID=23052692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002572501A Pending JP2004534107A (ja) 2001-03-13 2002-03-07 リトグラフィーに応用するための熱硬化された下部層

Country Status (5)

Country Link
EP (1) EP1373331A4 (de)
JP (1) JP2004534107A (de)
KR (1) KR100709330B1 (de)
TW (1) TW574234B (de)
WO (1) WO2002073307A2 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005106837A (ja) * 2003-04-11 2005-04-21 Rohm & Haas Electronic Materials Llc フォトレジストシステム
WO2013054702A1 (ja) * 2011-10-12 2013-04-18 Jsr株式会社 レジスト下層膜形成用組成物、その製造方法、パターン形成方法及びレジスト下層膜
US11043643B2 (en) 2015-11-18 2021-06-22 Altana Ag Crosslinkable polymeric materials for dielectric layers in electronic devices

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1743363A4 (de) * 2004-03-12 2010-08-11 Fujifilm Electronic Materials Wärmeausgehärtete grundbeschichtung für lithographische anwendung
EP2196851A1 (de) 2008-12-12 2010-06-16 Eastman Kodak Company Negativkopier-Lithographiedruckplattenvorläufer, die ein reaktives Bindemittel umfassen, das aliphatische bi- oder polycyclische Teile enthält

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3885151T3 (de) * 1987-05-19 1998-01-15 Hitachi Chemical Co Ltd Methode zur Herstellung von Methacrylatestern.
JP2520686B2 (ja) * 1988-03-18 1996-07-31 富士写真フイルム株式会社 湿し水不要感光性平版印刷板
JPH0539399A (ja) * 1991-08-02 1993-02-19 Nok Corp 透明性アクリルゴム組成物
JPH0593022A (ja) * 1991-09-30 1993-04-16 Nok Corp 透明性アクリルゴム組成物
US5886102A (en) * 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions
JP4053631B2 (ja) * 1997-10-08 2008-02-27 Ａｚエレクトロニックマテリアルズ株式会社 反射防止膜又は光吸収膜用組成物及びこれに用いる重合体
US6410209B1 (en) * 1998-09-15 2002-06-25 Shipley Company, L.L.C. Methods utilizing antireflective coating compositions with exposure under 200 nm
US6323287B1 (en) * 1999-03-12 2001-11-27 Arch Specialty Chemicals, Inc. Hydroxy-amino thermally cured undercoat for 193 NM lithography
DE60025005T2 (de) * 1999-09-03 2006-06-22 Nippon Soda Co. Ltd. Alkenylphenolcopolymer und verfahren zu dessen herstellung

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005106837A (ja) * 2003-04-11 2005-04-21 Rohm & Haas Electronic Materials Llc フォトレジストシステム
WO2013054702A1 (ja) * 2011-10-12 2013-04-18 Jsr株式会社 レジスト下層膜形成用組成物、その製造方法、パターン形成方法及びレジスト下層膜
US9607849B2 (en) 2011-10-12 2017-03-28 Jsr Corporation Pattern-forming method and resist underlayer film-forming composition
US11043643B2 (en) 2015-11-18 2021-06-22 Altana Ag Crosslinkable polymeric materials for dielectric layers in electronic devices

Also Published As

Publication number Publication date
KR20040024853A (ko) 2004-03-22
EP1373331A4 (de) 2007-01-17
WO2002073307A2 (en) 2002-09-19
WO2002073307A3 (en) 2002-11-21
TW574234B (en) 2004-02-01
KR100709330B1 (ko) 2007-04-20
EP1373331A2 (de) 2004-01-02

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