TW574234B - Thermally cured underlayer for lithographic application - Google Patents

Thermally cured underlayer for lithographic application Download PDF

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Publication number
TW574234B
TW574234B TW91104609A TW91104609A TW574234B TW 574234 B TW574234 B TW 574234B TW 91104609 A TW91104609 A TW 91104609A TW 91104609 A TW91104609 A TW 91104609A TW 574234 B TW574234 B TW 574234B
Authority
TW
Taiwan
Prior art keywords
group
subscript
unit
acrylate
polymer
Prior art date
Application number
TW91104609A
Other languages
English (en)
Chinese (zh)
Inventor
Binod B De
Sanjay Malik
Gregory Spaziano
John Joseph Biafore
Patrick Foster
Original Assignee
Arch Spec Chem Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arch Spec Chem Inc filed Critical Arch Spec Chem Inc
Application granted granted Critical
Publication of TW574234B publication Critical patent/TW574234B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
TW91104609A 2001-03-13 2002-03-12 Thermally cured underlayer for lithographic application TW574234B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US27552801P 2001-03-13 2001-03-13

Publications (1)

Publication Number Publication Date
TW574234B true TW574234B (en) 2004-02-01

Family

ID=23052692

Family Applications (1)

Application Number Title Priority Date Filing Date
TW91104609A TW574234B (en) 2001-03-13 2002-03-12 Thermally cured underlayer for lithographic application

Country Status (5)

Country Link
EP (1) EP1373331A4 (de)
JP (1) JP2004534107A (de)
KR (1) KR100709330B1 (de)
TW (1) TW574234B (de)
WO (1) WO2002073307A2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4798938B2 (ja) * 2003-04-11 2011-10-19 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． フォトレジストシステム
US7416821B2 (en) * 2004-03-12 2008-08-26 Fujifilm Electronic Materials, U.S.A., Inc. Thermally cured undercoat for lithographic application
EP2196851A1 (de) 2008-12-12 2010-06-16 Eastman Kodak Company Negativkopier-Lithographiedruckplattenvorläufer, die ein reaktives Bindemittel umfassen, das aliphatische bi- oder polycyclische Teile enthält
KR101922280B1 (ko) * 2011-10-12 2018-11-26 제이에스알 가부시끼가이샤 패턴 형성 방법 및 레지스트 하층막 형성용 조성물
DE102015119939A1 (de) 2015-11-18 2017-05-18 ALTANA Aktiengesellschaft Vernetzbare polymere Materialien für dielektrische Schichten in elektronischen Bauteilen

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3885151T3 (de) * 1987-05-19 1998-01-15 Hitachi Chemical Co Ltd Methode zur Herstellung von Methacrylatestern.
JP2520686B2 (ja) * 1988-03-18 1996-07-31 富士写真フイルム株式会社 湿し水不要感光性平版印刷板
JPH0539399A (ja) * 1991-08-02 1993-02-19 Nok Corp 透明性アクリルゴム組成物
JPH0593022A (ja) * 1991-09-30 1993-04-16 Nok Corp 透明性アクリルゴム組成物
US5886102A (en) * 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions
JP4053631B2 (ja) * 1997-10-08 2008-02-27 Ａｚエレクトロニックマテリアルズ株式会社 反射防止膜又は光吸収膜用組成物及びこれに用いる重合体
US6410209B1 (en) * 1998-09-15 2002-06-25 Shipley Company, L.L.C. Methods utilizing antireflective coating compositions with exposure under 200 nm
US6323287B1 (en) * 1999-03-12 2001-11-27 Arch Specialty Chemicals, Inc. Hydroxy-amino thermally cured undercoat for 193 NM lithography
ATE313574T1 (de) * 1999-09-03 2006-01-15 Nippon Soda Co Alkenylphenolcopolymer und verfahren zu dessen herstellung

Also Published As

Publication number Publication date
KR100709330B1 (ko) 2007-04-20
EP1373331A2 (de) 2004-01-02
JP2004534107A (ja) 2004-11-11
EP1373331A4 (de) 2007-01-17
KR20040024853A (ko) 2004-03-22
WO2002073307A3 (en) 2002-11-21
WO2002073307A2 (en) 2002-09-19

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GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees