JP2004527642A5 - - Google Patents

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Publication number
JP2004527642A5
JP2004527642A5 JP2003502078A JP2003502078A JP2004527642A5 JP 2004527642 A5 JP2004527642 A5 JP 2004527642A5 JP 2003502078 A JP2003502078 A JP 2003502078A JP 2003502078 A JP2003502078 A JP 2003502078A JP 2004527642 A5 JP2004527642 A5 JP 2004527642A5
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JP
Japan
Prior art keywords
substrate
coating layer
plasma
coating
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003502078A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004527642A (ja
Filing date
Publication date
Priority claimed from GBGB0113751.2A external-priority patent/GB0113751D0/en
Application filed filed Critical
Publication of JP2004527642A publication Critical patent/JP2004527642A/ja
Publication of JP2004527642A5 publication Critical patent/JP2004527642A5/ja
Pending legal-status Critical Current

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JP2003502078A 2001-06-06 2002-06-05 表面処理 Pending JP2004527642A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0113751.2A GB0113751D0 (en) 2001-06-06 2001-06-06 Surface treatment
PCT/GB2002/002543 WO2002098962A1 (en) 2001-06-06 2002-06-05 Surface treatment

Publications (2)

Publication Number Publication Date
JP2004527642A JP2004527642A (ja) 2004-09-09
JP2004527642A5 true JP2004527642A5 (enExample) 2006-01-12

Family

ID=9916016

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003502078A Pending JP2004527642A (ja) 2001-06-06 2002-06-05 表面処理

Country Status (5)

Country Link
US (1) US20040146660A1 (enExample)
EP (1) EP1401929A1 (enExample)
JP (1) JP2004527642A (enExample)
GB (1) GB0113751D0 (enExample)
WO (1) WO2002098962A1 (enExample)

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TWI535561B (zh) 2010-09-21 2016-06-01 琳得科股份有限公司 A molded body, a manufacturing method thereof, an electronic device element, and an electronic device
TWI457235B (zh) 2010-09-21 2014-10-21 Lintec Corp A gas barrier film, a manufacturing method thereof, an electronic device element, and an electronic device
KR20140037097A (ko) 2011-04-27 2014-03-26 다우 코닝 프랑스 기판의 플라즈마 처리
US20140248444A1 (en) 2011-11-09 2014-09-04 Centre National De La Recherche Scientifique Plasma Treatment Of Substrates
JP5749353B2 (ja) * 2011-12-13 2015-07-15 エンパイア テクノロジー ディベロップメント エルエルシー エラストマーの接着
US9564309B2 (en) 2013-03-14 2017-02-07 Asm Ip Holding B.V. Si precursors for deposition of SiN at low temperatures
US9824881B2 (en) 2013-03-14 2017-11-21 Asm Ip Holding B.V. Si precursors for deposition of SiN at low temperatures
US9576792B2 (en) 2014-09-17 2017-02-21 Asm Ip Holding B.V. Deposition of SiN
US10410857B2 (en) 2015-08-24 2019-09-10 Asm Ip Holding B.V. Formation of SiN thin films
US10580645B2 (en) * 2018-04-30 2020-03-03 Asm Ip Holding B.V. Plasma enhanced atomic layer deposition (PEALD) of SiN using silicon-hydrohalide precursors
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