JP2004520704A5 - - Google Patents
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- Publication number
- JP2004520704A5 JP2004520704A5 JP2002507035A JP2002507035A JP2004520704A5 JP 2004520704 A5 JP2004520704 A5 JP 2004520704A5 JP 2002507035 A JP2002507035 A JP 2002507035A JP 2002507035 A JP2002507035 A JP 2002507035A JP 2004520704 A5 JP2004520704 A5 JP 2004520704A5
- Authority
- JP
- Japan
- Prior art keywords
- peripheral
- chambers
- chamber
- workpiece
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002093 peripheral effect Effects 0.000 claims 6
- 238000003672 processing method Methods 0.000 claims 2
- 230000005284 excitation Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/607,326 US6531029B1 (en) | 2000-06-30 | 2000-06-30 | Vacuum plasma processor apparatus and method |
| US09/607,326 | 2000-06-30 | ||
| PCT/US2001/020263 WO2002003763A2 (en) | 2000-06-30 | 2001-06-26 | Vacuum plasma processor apparatus and method |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011227690A Division JP5538340B2 (ja) | 2000-06-30 | 2011-10-17 | ワークピース処理方法および真空プラズマプロセッサ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004520704A JP2004520704A (ja) | 2004-07-08 |
| JP2004520704A5 true JP2004520704A5 (enExample) | 2005-04-07 |
| JP5116203B2 JP5116203B2 (ja) | 2013-01-09 |
Family
ID=24431792
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002507035A Expired - Fee Related JP5116203B2 (ja) | 2000-06-30 | 2001-06-26 | 真空プラズマプロセッサ及びコイル |
| JP2011227690A Expired - Fee Related JP5538340B2 (ja) | 2000-06-30 | 2011-10-17 | ワークピース処理方法および真空プラズマプロセッサ |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011227690A Expired - Fee Related JP5538340B2 (ja) | 2000-06-30 | 2011-10-17 | ワークピース処理方法および真空プラズマプロセッサ |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US6531029B1 (enExample) |
| EP (1) | EP1300057B1 (enExample) |
| JP (2) | JP5116203B2 (enExample) |
| KR (2) | KR100881882B1 (enExample) |
| AU (1) | AU2001270163A1 (enExample) |
| DE (1) | DE60128229T2 (enExample) |
| TW (1) | TW515005B (enExample) |
| WO (1) | WO2002003763A2 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7571697B2 (en) * | 2001-09-14 | 2009-08-11 | Lam Research Corporation | Plasma processor coil |
| US6876155B2 (en) * | 2002-12-31 | 2005-04-05 | Lam Research Corporation | Plasma processor apparatus and method, and antenna |
| KR100964398B1 (ko) * | 2003-01-03 | 2010-06-17 | 삼성전자주식회사 | 유도결합형 안테나 및 이를 채용한 플라즈마 처리장치 |
| US20040261718A1 (en) * | 2003-06-26 | 2004-12-30 | Kim Nam Hun | Plasma source coil for generating plasma and plasma chamber using the same |
| US7713432B2 (en) * | 2004-10-04 | 2010-05-11 | David Johnson | Method and apparatus to improve plasma etch uniformity |
| US20080003377A1 (en) * | 2006-06-30 | 2008-01-03 | The Board Of Regents Of The Nevada System Of Higher Ed. On Behalf Of The Unlv | Transparent vacuum system |
| DE102008024014A1 (de) * | 2008-05-16 | 2010-04-15 | Ofa Bamberg Gmbh | Elektronischer Lebensdauerindikator |
| US20120103524A1 (en) * | 2010-10-28 | 2012-05-03 | Applied Materials, Inc. | Plasma processing apparatus with reduced effects of process chamber asymmetry |
| US20120152900A1 (en) * | 2010-12-20 | 2012-06-21 | Applied Materials, Inc. | Methods and apparatus for gas delivery into plasma processing chambers |
| US10777387B2 (en) * | 2012-09-28 | 2020-09-15 | Semes Co., Ltd. | Apparatus for treating substrate |
| CN109036817B (zh) * | 2017-06-08 | 2021-09-17 | 北京北方华创微电子装备有限公司 | 电感耦合线圈和工艺腔室 |
| JP6909824B2 (ja) * | 2019-05-17 | 2021-07-28 | 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ | 基板処理装置、半導体装置の製造方法及びプログラム |
| KR20220107521A (ko) * | 2021-01-25 | 2022-08-02 | (주) 엔피홀딩스 | 반응기, 이를 포함하는 공정 처리 장치 및 반응기 제조 방법 |
| US20250132127A1 (en) * | 2021-08-06 | 2025-04-24 | Lam Research Corporation | Transformer coupled plasma source design for thin dielectric film deposition |
| US12074390B2 (en) | 2022-11-11 | 2024-08-27 | Tokyo Electron Limited | Parallel resonance antenna for radial plasma control |
| CN116864255A (zh) * | 2023-08-14 | 2023-10-10 | 北京北方华创微电子装备有限公司 | 线圈、线圈组件、线圈装置及半导体工艺设备 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4948458A (en) | 1989-08-14 | 1990-08-14 | Lam Research Corporation | Method and apparatus for producing magnetically-coupled planar plasma |
| US6077384A (en) | 1994-08-11 | 2000-06-20 | Applied Materials, Inc. | Plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
| US5401350A (en) | 1993-03-08 | 1995-03-28 | Lsi Logic Corporation | Coil configurations for improved uniformity in inductively coupled plasma systems |
| US5919382A (en) * | 1994-10-31 | 1999-07-06 | Applied Materials, Inc. | Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor |
| US5838111A (en) | 1996-02-27 | 1998-11-17 | Matsushita Electric Industrial Co., Ltd. | Plasma generator with antennas attached to top electrodes |
| US6268700B1 (en) * | 1996-06-10 | 2001-07-31 | Lam Research Corporation | Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil |
| US5759280A (en) | 1996-06-10 | 1998-06-02 | Lam Research Corporation | Inductively coupled source for deriving substantially uniform plasma flux |
| US5800619A (en) * | 1996-06-10 | 1998-09-01 | Lam Research Corporation | Vacuum plasma processor having coil with minimum magnetic field in its center |
| CA2207154A1 (en) | 1996-06-10 | 1997-12-10 | Lam Research Corporation | Inductively coupled source for deriving substantially uniform plasma flux |
| JP3658922B2 (ja) | 1997-05-22 | 2005-06-15 | 松下電器産業株式会社 | プラズマ処理方法及び装置 |
| EP1327498B1 (en) | 1997-04-08 | 2013-06-12 | Ebara Corporation | Polishing apparatus |
| US6028285A (en) | 1997-11-19 | 2000-02-22 | Board Of Regents, The University Of Texas System | High density plasma source for semiconductor processing |
| JP2972707B1 (ja) * | 1998-02-26 | 1999-11-08 | 松下電子工業株式会社 | プラズマエッチング装置及びプラズマエッチング方法 |
| US6146508A (en) * | 1998-04-22 | 2000-11-14 | Applied Materials, Inc. | Sputtering method and apparatus with small diameter RF coil |
| US6164241A (en) * | 1998-06-30 | 2000-12-26 | Lam Research Corporation | Multiple coil antenna for inductively-coupled plasma generation systems |
| KR100291898B1 (ko) * | 1999-04-09 | 2001-06-01 | 윤종용 | 스파터 오염원을 감소시키고 플라즈마에 유도 결합을 향상시키기위한 차폐판의 제조방법 및 플라즈마 식각장치 |
| US6319355B1 (en) * | 1999-06-30 | 2001-11-20 | Lam Research Corporation | Plasma processor with coil responsive to variable amplitude rf envelope |
| US6143144A (en) * | 1999-07-30 | 2000-11-07 | Tokyo Electronlimited | Method for etch rate enhancement by background oxygen control in a soft etch system |
-
2000
- 2000-06-30 US US09/607,326 patent/US6531029B1/en not_active Expired - Lifetime
-
2001
- 2001-06-26 AU AU2001270163A patent/AU2001270163A1/en not_active Abandoned
- 2001-06-26 EP EP01948718A patent/EP1300057B1/en not_active Expired - Lifetime
- 2001-06-26 JP JP2002507035A patent/JP5116203B2/ja not_active Expired - Fee Related
- 2001-06-26 WO PCT/US2001/020263 patent/WO2002003763A2/en not_active Ceased
- 2001-06-26 KR KR1020027017794A patent/KR100881882B1/ko not_active Expired - Fee Related
- 2001-06-26 KR KR1020077014974A patent/KR100807143B1/ko not_active Expired - Fee Related
- 2001-06-26 DE DE60128229T patent/DE60128229T2/de not_active Expired - Lifetime
- 2001-07-11 TW TW090116008A patent/TW515005B/zh not_active IP Right Cessation
-
2003
- 2003-01-21 US US10/347,363 patent/US6897156B2/en not_active Expired - Fee Related
-
2011
- 2011-10-17 JP JP2011227690A patent/JP5538340B2/ja not_active Expired - Fee Related
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