JP2004504495A5 - - Google Patents

Download PDF

Info

Publication number
JP2004504495A5
JP2004504495A5 JP2002513962A JP2002513962A JP2004504495A5 JP 2004504495 A5 JP2004504495 A5 JP 2004504495A5 JP 2002513962 A JP2002513962 A JP 2002513962A JP 2002513962 A JP2002513962 A JP 2002513962A JP 2004504495 A5 JP2004504495 A5 JP 2004504495A5
Authority
JP
Japan
Prior art keywords
vacuum chamber
valve
pressure
closed
crt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002513962A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004504495A (ja
JP4766821B2 (ja
Filing date
Publication date
Priority claimed from EA200000807A external-priority patent/EA003148B1/ru
Application filed filed Critical
Publication of JP2004504495A publication Critical patent/JP2004504495A/ja
Publication of JP2004504495A5 publication Critical patent/JP2004504495A5/ja
Application granted granted Critical
Publication of JP4766821B2 publication Critical patent/JP4766821B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2002513962A 2000-07-05 2001-05-22 基板にコーティングを施すための真空モジュール（及びその変形）とモジュールシステム Expired - Fee Related JP4766821B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EA200000807 2000-07-05
EA200000807A EA003148B1 (ru) 2000-07-05 2000-07-05 Вакуумный модуль (его варианты) и система модулей для нанесения покрытий на подложку
PCT/EA2001/000002 WO2002008484A2 (en) 2000-07-05 2001-05-22 Vacuum module for applying coatings

Publications (3)

Publication Number Publication Date
JP2004504495A JP2004504495A (ja) 2004-02-12
JP2004504495A5 true JP2004504495A5 (enrdf_load_stackoverflow) 2006-11-09
JP4766821B2 JP4766821B2 (ja) 2011-09-07

Family

ID=8161557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002513962A Expired - Fee Related JP4766821B2 (ja) 2000-07-05 2001-05-22 基板にコーティングを施すための真空モジュール（及びその変形）とモジュールシステム

Country Status (7)

Country Link
JP (1) JP4766821B2 (enrdf_load_stackoverflow)
KR (1) KR100737035B1 (enrdf_load_stackoverflow)
CN (1) CN100348773C (enrdf_load_stackoverflow)
AU (1) AU6896001A (enrdf_load_stackoverflow)
EA (1) EA003148B1 (enrdf_load_stackoverflow)
MY (1) MY137307A (enrdf_load_stackoverflow)
WO (1) WO2002008484A2 (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004102055A1 (en) 2003-05-13 2004-11-25 Applied Materials, Inc. Methods and apparatus for sealing an opening of a processing chamber
EA007701B1 (ru) * 2005-07-18 2006-12-29 Владимир Яковлевич ШИРИПОВ Вакуумный кластер для нанесения покрытий на подложку (варианты)
EA009303B1 (ru) * 2006-05-15 2007-12-28 Владимир Яковлевич ШИРИПОВ Способ нанесения пленок нитрида кремния в вакууме (варианты)
EA034967B1 (ru) 2018-05-04 2020-04-13 Общество С Ограниченной Ответственностью "Изовак Технологии" Технологическая линия для формирования тонкопленочных покрытий в вакууме (варианты)
CN110592550A (zh) * 2019-10-28 2019-12-20 上海映晓电子科技有限公司 一种磁控溅射和电子束蒸镀双腔镀膜装置及其使用方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2008156B (en) * 1977-11-19 1982-06-23 Hunt C J L Vacuum metallising of hollow articles
US5489369A (en) * 1993-10-25 1996-02-06 Viratec Thin Films, Inc. Method and apparatus for thin film coating an article
US6325901B1 (en) * 1996-04-18 2001-12-04 Kabushiki Kaisha Toshiba Method of producing a cathode-ray tube and apparatus therefor

Similar Documents

Publication Publication Date Title
US6692600B2 (en) VIG evacuation with plasma excitation
KR100321607B1 (ko) 고압방전램프및그제조방법
JP2832510B2 (ja) 表示装置の製造方法
JPS6421858A (en) Electrodeless low voltage discharge lamp
EP0840353A3 (en) Low-pressure mercury vapour-filled discharge lamp, luminaire and display device
US3460745A (en) Magnetically confined electrical discharge getter ion vacuum pump having a cathode projection extending into the anode cell
JP2004504495A5 (enrdf_load_stackoverflow)
US4018490A (en) Gas discharge display panel fabrication
JP2002025500A (ja) 高圧放電灯およびその製造方法
JP2984014B2 (ja) プラズマディスプレイパネルの製造方法
JP2001243886A (ja) プラズマディスプレイ用部材およびプラズマディスプレイならびにその製造方法
JP3895919B2 (ja) クリーニング装置
US3178864A (en) Preparation of glass cells containing helium of high purity
JP4555301B2 (ja) 冷陰極ランプのための一体化されたゲッターと低仕事関数を有する陰極及びその製造方法
JP2004066225A (ja) ゲッタの組成物及び該ゲッタの組成物を利用した電界放出表示装置
JPH04133253A (ja) 電子線装置におけるイオンポンプを用いた排気システム
JPH03230448A (ja) プラズマディスプレイパネルの製造方法
JPH0633231A (ja) イオンスパッタリング装置
JP2003500792A (ja) 還元ガスを使用した電界放出デバイスおよびその製造方法
JP3419414B2 (ja) スパッタリング装置の排気機構
KR970071952A (ko) 전계방출형 디스플레이용 초고진공 실장방법 및 장치
CN1122297C (zh) 高压钠蒸汽灯
JPH04159466A (ja) 真空装置
Tuck The use of a non-evaporable getter pump in the processing of a 2 kW electrostatically focused klystron amplifier
JPS52122284A (en) Sputtering device having bias electrode