JP2004503616A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2004503616A5 JP2004503616A5 JP2002510544A JP2002510544A JP2004503616A5 JP 2004503616 A5 JP2004503616 A5 JP 2004503616A5 JP 2002510544 A JP2002510544 A JP 2002510544A JP 2002510544 A JP2002510544 A JP 2002510544A JP 2004503616 A5 JP2004503616 A5 JP 2004503616A5
- Authority
- JP
- Japan
- Prior art keywords
- multiphoton
- photosensitizer
- composition
- embedded image
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003504 photosensitizing agent Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 150000003254 radicals Chemical class 0.000 description 7
- 239000002253 acid Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 4
- 230000005281 excited state Effects 0.000 description 4
- 206010070834 Sensitisation Diseases 0.000 description 2
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical group [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 2
- 229940043267 rhodamine b Drugs 0.000 description 2
- 230000008313 sensitization Effects 0.000 description 2
- -1 alkylaryl borate salt Chemical class 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229920013730 reactive polymer Polymers 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US21170300P | 2000-06-15 | 2000-06-15 | |
| US60/211,703 | 2000-06-15 | ||
| PCT/US2001/019164 WO2001096409A2 (en) | 2000-06-15 | 2001-06-14 | Multiphoton photosensitization system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004503616A JP2004503616A (ja) | 2004-02-05 |
| JP2004503616A5 true JP2004503616A5 (enExample) | 2008-08-28 |
| JP5059273B2 JP5059273B2 (ja) | 2012-10-24 |
Family
ID=22788007
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002510544A Expired - Fee Related JP5059273B2 (ja) | 2000-06-15 | 2001-06-14 | 多光子感光化方法 |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP1297021B1 (enExample) |
| JP (1) | JP5059273B2 (enExample) |
| KR (2) | KR100813320B1 (enExample) |
| AT (1) | ATE425993T1 (enExample) |
| AU (1) | AU2001268443A1 (enExample) |
| DE (1) | DE60138021D1 (enExample) |
| WO (1) | WO2001096409A2 (enExample) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7118845B2 (en) | 2000-06-15 | 2006-10-10 | 3M Innovative Properties Company | Multiphoton photochemical process and articles preparable thereby |
| US7381516B2 (en) * | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| US7265161B2 (en) * | 2002-10-02 | 2007-09-04 | 3M Innovative Properties Company | Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
| EP1295180B1 (en) * | 2000-06-15 | 2013-05-22 | 3M Innovative Properties Company | Process for producing microfluidic articles |
| US7005229B2 (en) * | 2002-10-02 | 2006-02-28 | 3M Innovative Properties Company | Multiphoton photosensitization method |
| US6716995B2 (en) | 2000-08-17 | 2004-04-06 | Lumera Corporation | Design and synthesis of advanced NLO materials for electro-optic applications |
| US6750266B2 (en) | 2001-12-28 | 2004-06-15 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| US7232650B2 (en) | 2002-10-02 | 2007-06-19 | 3M Innovative Properties Company | Planar inorganic device |
| JP4001118B2 (ja) | 2003-03-24 | 2007-10-31 | ソニー株式会社 | 有機電界発光素子及びアミノモノスチリルナフタレン化合物 |
| US20050046915A1 (en) * | 2003-08-22 | 2005-03-03 | Fuji Photo Film Co., Ltd. | Hologram recording material composition, hologram recording material and hologram recording method |
| EP1510862A3 (en) | 2003-08-25 | 2006-08-09 | Fuji Photo Film Co., Ltd. | Hologram recording method and hologram recording material |
| JP4556531B2 (ja) * | 2003-09-09 | 2010-10-06 | 三菱化学株式会社 | 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法 |
| JP2008181143A (ja) * | 2003-09-09 | 2008-08-07 | Mitsubishi Chemicals Corp | 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法 |
| US7655376B2 (en) | 2003-12-05 | 2010-02-02 | 3M Innovative Properties Company | Process for producing photonic crystals and controlled defects therein |
| DE602004018483D1 (de) * | 2004-07-30 | 2009-01-29 | Agfa Graphics Nv | Fotopolymerisierbare Zusammensetzung. |
| DE102004055733B3 (de) * | 2004-11-18 | 2006-05-04 | Kodak Polychrome Graphics Gmbh | Lithographie-Druckplattenvorläufer mit oligomeren oder polymeren Sensibilisatoren |
| US7297374B1 (en) | 2004-12-29 | 2007-11-20 | 3M Innovative Properties Company | Single- and multi-photon polymerizable pre-ceramic polymeric compositions |
| WO2006071907A1 (en) | 2004-12-29 | 2006-07-06 | 3M Innovative Properties Company | Multi-photon polymerizable pre-ceramic polymeric compositions |
| JP2006289613A (ja) * | 2005-04-05 | 2006-10-26 | Fuji Photo Film Co Ltd | ２光子吸収光記録材料、２光子吸収光記録媒体及びその記録再生方法、並びに２光子吸収光記録再生装置 |
| JP2007078894A (ja) * | 2005-09-12 | 2007-03-29 | Fujifilm Corp | 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法 |
| WO2007112309A2 (en) * | 2006-03-24 | 2007-10-04 | 3M Innovative Properties Company | Process for making microneedles, microneedle arrays, masters, and replication tools |
| JP5229521B2 (ja) * | 2006-09-15 | 2013-07-03 | 株式会社リコー | π共役系化合物とその用途、およびそれらを用いた素子、装置 |
| JP5162511B2 (ja) * | 2009-03-25 | 2013-03-13 | 富士フイルム株式会社 | 非共鳴２光子吸収重合用組成物及びそれを用いた３次元光記録媒体 |
| PH12013501817A1 (en) * | 2011-03-07 | 2013-10-14 | Sanyo Chemical Ind Ltd | Photosensitive composition, cured article, and method for producing actinically cured article |
| EP2699965A2 (en) * | 2011-04-22 | 2014-02-26 | 3M Innovative Properties Company | Enhanced multi-photon imaging resolution method |
| CN102768466A (zh) * | 2011-05-05 | 2012-11-07 | 中国科学院理化技术研究所 | 化学增幅型正性光刻胶、制备方法及其在双光子精细加工中的应用 |
| TWI475321B (zh) * | 2013-03-06 | 2015-03-01 | Chi Mei Corp | 感光性樹脂組成物及其應用 |
| CN105917275B (zh) * | 2013-12-06 | 2018-01-16 | 3M创新有限公司 | 液体光反应性组合物以及制造结构的方法 |
| CN107223121B (zh) * | 2014-12-19 | 2020-10-27 | 科思创德国股份有限公司 | 湿稳定的全息介质 |
| KR20170002937U (ko) | 2016-02-12 | 2017-08-22 | 주식회사 오엠티 | 수납장용 레일 조립체 |
| CN110240615A (zh) * | 2018-03-09 | 2019-09-17 | 首都师范大学 | 新型有机小分子材料的合成方法、微晶的制备方法及其应用 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0675374A (ja) * | 1992-07-02 | 1994-03-18 | Showa Denko Kk | 光硬化性材料及び硬化方法 |
| US5747550A (en) * | 1995-06-05 | 1998-05-05 | Kimberly-Clark Worldwide, Inc. | Method of generating a reactive species and polymerizing an unsaturated polymerizable material |
| JPH09160238A (ja) * | 1995-12-05 | 1997-06-20 | Toyobo Co Ltd | 光重合性組成物、それを用いた感光性原版およびその露光方法 |
| WO1998021521A1 (en) * | 1996-11-12 | 1998-05-22 | California Institute Of Technology | Two-photon or higher-order absorbing optical materials and methods of use |
| JPH11116611A (ja) * | 1997-10-13 | 1999-04-27 | Tokuyama Sekiyu Kagaku Kk | 光重合性組成物 |
| JP3674336B2 (ja) * | 1998-10-02 | 2005-07-20 | 凸版印刷株式会社 | 可視光重合性組成物 |
-
2001
- 2001-06-14 AT AT01946384T patent/ATE425993T1/de not_active IP Right Cessation
- 2001-06-14 AU AU2001268443A patent/AU2001268443A1/en not_active Abandoned
- 2001-06-14 WO PCT/US2001/019164 patent/WO2001096409A2/en not_active Ceased
- 2001-06-14 KR KR1020027017095A patent/KR100813320B1/ko not_active Expired - Fee Related
- 2001-06-14 EP EP01946384A patent/EP1297021B1/en not_active Expired - Lifetime
- 2001-06-14 KR KR1020077025222A patent/KR20070118164A/ko not_active Ceased
- 2001-06-14 JP JP2002510544A patent/JP5059273B2/ja not_active Expired - Fee Related
- 2001-06-14 DE DE60138021T patent/DE60138021D1/de not_active Expired - Lifetime
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2004503616A5 (enExample) | ||
| JP2744789B2 (ja) | 三元光開始剤系を含む付加重合性組成物 | |
| Wu et al. | Near‐infrared‐sensitive materials based on upconverting nanoparticles | |
| CN1241065C (zh) | 带有光产酸剂的含光自由基产生剂的光致抗蚀剂组合物 | |
| JP3900633B2 (ja) | レーザーによるレリーフの製造方法 | |
| JPH10319595A5 (enExample) | ||
| EP0339841A2 (en) | Photosensitive compositions and materials | |
| TW201820031A (zh) | 光阻組合物 | |
| JP2002534218A5 (enExample) | ||
| JP2003315995A5 (enExample) | ||
| JP2004302198A5 (enExample) | ||
| DE59712866D1 (de) | Verfahren zum Herstellen einer Druckform | |
| EP0369645A1 (en) | Triazine photoinitiators in a ternary system for addition polymerization | |
| JP2010511914A5 (enExample) | ||
| JP2003292547A5 (enExample) | ||
| JP2000505886A (ja) | 二重エネルギー記録のために好適な光刺激性燐光体スクリーン | |
| CN1278383C (zh) | 图案形成方法 | |
| CN1255653A (zh) | 用于光致抗蚀剂的交联剂及含该交联剂的光致抗蚀剂组合物 | |
| Schmitz et al. | NIR light for initiation of Photopolymerization | |
| ATE101636T1 (de) | Verfahren zum kleben oder vergiessen von substraten und vorrichtung zu seiner durchfuehrung. | |
| JP2002278053A5 (enExample) | ||
| JP2000035672A5 (enExample) | ||
| EP1793275A3 (en) | Method for preparation of lithographic printing plate and lithographic printing plate precursor | |
| JP2000347410A5 (enExample) | ||
| JP2000019737A5 (enExample) |