ATE425993T1 - Multiphoton photosensibilisierungssystem - Google Patents

Multiphoton photosensibilisierungssystem

Info

Publication number
ATE425993T1
ATE425993T1 AT01946384T AT01946384T ATE425993T1 AT E425993 T1 ATE425993 T1 AT E425993T1 AT 01946384 T AT01946384 T AT 01946384T AT 01946384 T AT01946384 T AT 01946384T AT E425993 T1 ATE425993 T1 AT E425993T1
Authority
AT
Austria
Prior art keywords
multiphoton
composition
composition comprises
light
photosensitization system
Prior art date
Application number
AT01946384T
Other languages
German (de)
English (en)
Inventor
Robert J Devoe
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Application granted granted Critical
Publication of ATE425993T1 publication Critical patent/ATE425993T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Polymerisation Methods In General (AREA)
  • Glass Compositions (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
AT01946384T 2000-06-15 2001-06-14 Multiphoton photosensibilisierungssystem ATE425993T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21170300P 2000-06-15 2000-06-15

Publications (1)

Publication Number Publication Date
ATE425993T1 true ATE425993T1 (de) 2009-04-15

Family

ID=22788007

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01946384T ATE425993T1 (de) 2000-06-15 2001-06-14 Multiphoton photosensibilisierungssystem

Country Status (7)

Country Link
EP (1) EP1297021B1 (enExample)
JP (1) JP5059273B2 (enExample)
KR (2) KR100813320B1 (enExample)
AT (1) ATE425993T1 (enExample)
AU (1) AU2001268443A1 (enExample)
DE (1) DE60138021D1 (enExample)
WO (1) WO2001096409A2 (enExample)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
EP1295180B1 (en) * 2000-06-15 2013-05-22 3M Innovative Properties Company Process for producing microfluidic articles
US7005229B2 (en) * 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
US6716995B2 (en) 2000-08-17 2004-04-06 Lumera Corporation Design and synthesis of advanced NLO materials for electro-optic applications
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
JP4001118B2 (ja) 2003-03-24 2007-10-31 ソニー株式会社 有機電界発光素子及びアミノモノスチリルナフタレン化合物
US20050046915A1 (en) * 2003-08-22 2005-03-03 Fuji Photo Film Co., Ltd. Hologram recording material composition, hologram recording material and hologram recording method
EP1510862A3 (en) 2003-08-25 2006-08-09 Fuji Photo Film Co., Ltd. Hologram recording method and hologram recording material
JP4556531B2 (ja) * 2003-09-09 2010-10-06 三菱化学株式会社 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
JP2008181143A (ja) * 2003-09-09 2008-08-07 Mitsubishi Chemicals Corp 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
US7655376B2 (en) 2003-12-05 2010-02-02 3M Innovative Properties Company Process for producing photonic crystals and controlled defects therein
DE602004018483D1 (de) * 2004-07-30 2009-01-29 Agfa Graphics Nv Fotopolymerisierbare Zusammensetzung.
DE102004055733B3 (de) * 2004-11-18 2006-05-04 Kodak Polychrome Graphics Gmbh Lithographie-Druckplattenvorläufer mit oligomeren oder polymeren Sensibilisatoren
US7297374B1 (en) 2004-12-29 2007-11-20 3M Innovative Properties Company Single- and multi-photon polymerizable pre-ceramic polymeric compositions
WO2006071907A1 (en) 2004-12-29 2006-07-06 3M Innovative Properties Company Multi-photon polymerizable pre-ceramic polymeric compositions
JP2006289613A (ja) * 2005-04-05 2006-10-26 Fuji Photo Film Co Ltd ２光子吸収光記録材料、２光子吸収光記録媒体及びその記録再生方法、並びに２光子吸収光記録再生装置
JP2007078894A (ja) * 2005-09-12 2007-03-29 Fujifilm Corp 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法
WO2007112309A2 (en) * 2006-03-24 2007-10-04 3M Innovative Properties Company Process for making microneedles, microneedle arrays, masters, and replication tools
JP5229521B2 (ja) * 2006-09-15 2013-07-03 株式会社リコー π共役系化合物とその用途、およびそれらを用いた素子、装置
JP5162511B2 (ja) * 2009-03-25 2013-03-13 富士フイルム株式会社 非共鳴２光子吸収重合用組成物及びそれを用いた３次元光記録媒体
PH12013501817A1 (en) * 2011-03-07 2013-10-14 Sanyo Chemical Ind Ltd Photosensitive composition, cured article, and method for producing actinically cured article
EP2699965A2 (en) * 2011-04-22 2014-02-26 3M Innovative Properties Company Enhanced multi-photon imaging resolution method
CN102768466A (zh) * 2011-05-05 2012-11-07 中国科学院理化技术研究所 化学增幅型正性光刻胶、制备方法及其在双光子精细加工中的应用
TWI475321B (zh) * 2013-03-06 2015-03-01 Chi Mei Corp 感光性樹脂組成物及其應用
CN105917275B (zh) * 2013-12-06 2018-01-16 3M创新有限公司 液体光反应性组合物以及制造结构的方法
CN107223121B (zh) * 2014-12-19 2020-10-27 科思创德国股份有限公司 湿稳定的全息介质
KR20170002937U (ko) 2016-02-12 2017-08-22 주식회사 오엠티 수납장용 레일 조립체
CN110240615A (zh) * 2018-03-09 2019-09-17 首都师范大学 新型有机小分子材料的合成方法、微晶的制备方法及其应用

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0675374A (ja) * 1992-07-02 1994-03-18 Showa Denko Kk 光硬化性材料及び硬化方法
US5747550A (en) * 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
JPH09160238A (ja) * 1995-12-05 1997-06-20 Toyobo Co Ltd 光重合性組成物、それを用いた感光性原版およびその露光方法
WO1998021521A1 (en) * 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
JPH11116611A (ja) * 1997-10-13 1999-04-27 Tokuyama Sekiyu Kagaku Kk 光重合性組成物
JP3674336B2 (ja) * 1998-10-02 2005-07-20 凸版印刷株式会社 可視光重合性組成物

Also Published As

Publication number Publication date
WO2001096409A2 (en) 2001-12-20
KR20030011354A (ko) 2003-02-07
JP2004503616A (ja) 2004-02-05
EP1297021B1 (en) 2009-03-18
KR20070118164A (ko) 2007-12-13
WO2001096409A3 (en) 2002-04-04
AU2001268443A1 (en) 2001-12-24
DE60138021D1 (enExample) 2009-04-30
KR100813320B1 (ko) 2008-03-12
EP1297021A2 (en) 2003-04-02
JP5059273B2 (ja) 2012-10-24

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