WO2001096962A3 - Multiphoton absorption method using patterned light - Google Patents

Multiphoton absorption method using patterned light Download PDF

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Publication number
WO2001096962A3
WO2001096962A3 PCT/US2001/019126 US0119126W WO0196962A3 WO 2001096962 A3 WO2001096962 A3 WO 2001096962A3 US 0119126 W US0119126 W US 0119126W WO 0196962 A3 WO0196962 A3 WO 0196962A3
Authority
WO
WIPO (PCT)
Prior art keywords
photoreactive composition
light
providing
multiphoton absorption
dimensional pattern
Prior art date
Application number
PCT/US2001/019126
Other languages
French (fr)
Other versions
WO2001096962A2 (en
Inventor
Patrick R Fleming
Robert J Devoe
Nicholas A Stacey
Catherine A Leatherdale
Robert D Demaster
Todd A Ballen
Jeffrey M Florczak
Original Assignee
3M Innovative Properties Co
Patrick R Fleming
Robert J Devoe
Nicholas A Stacey
Catherine A Leatherdale
Robert D Demaster
Todd A Ballen
Jeffrey M Florczak
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co, Patrick R Fleming, Robert J Devoe, Nicholas A Stacey, Catherine A Leatherdale, Robert D Demaster, Todd A Ballen, Jeffrey M Florczak filed Critical 3M Innovative Properties Co
Priority to JP2002511027A priority Critical patent/JP2004503832A/en
Priority to EP01944515A priority patent/EP1292863A2/en
Priority to US10/297,963 priority patent/US20040012872A1/en
Priority to AU2001266920A priority patent/AU2001266920A1/en
Publication of WO2001096962A2 publication Critical patent/WO2001096962A2/en
Publication of WO2001096962A3 publication Critical patent/WO2001096962A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/048—Parallel printer, i.e. a fringe pattern is reproduced
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/0484—Arranged to produce three-dimensional fringe pattern

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Micromachines (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Microscoopes, Condenser (AREA)
  • Holo Graphy (AREA)

Abstract

Methods for producing a region of at least partially reacted material in a photoreactive composition and apparatus. The methods include: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons by the photoreactive composition; providing an exposure system capable of inducing image-wise multiphoton absorption; generating a non-random three-dimensional pattern of light by means of the exposure system; and exposing the photoreactive composition to the three-dimensional pattern of light generated by the exposure system to at least partially react a portion of the material in correspondence with the non-random three-dimensional pattern of light incident thereon.
PCT/US2001/019126 2000-06-15 2001-06-14 Multiphoton absorption method using patterned light WO2001096962A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2002511027A JP2004503832A (en) 2000-06-15 2001-06-14 Multiphoton absorption method using patterned light
EP01944515A EP1292863A2 (en) 2000-06-15 2001-06-14 Multiphoton absorption method using patterned light
US10/297,963 US20040012872A1 (en) 2001-06-14 2001-06-14 Multiphoton absorption method using patterned light
AU2001266920A AU2001266920A1 (en) 2000-06-15 2001-06-14 Multiphoton absorption method using patterned light

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US21167500P 2000-06-15 2000-06-15
US60/211,675 2000-06-15

Publications (2)

Publication Number Publication Date
WO2001096962A2 WO2001096962A2 (en) 2001-12-20
WO2001096962A3 true WO2001096962A3 (en) 2002-04-18

Family

ID=22787897

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/019126 WO2001096962A2 (en) 2000-06-15 2001-06-14 Multiphoton absorption method using patterned light

Country Status (5)

Country Link
EP (1) EP1292863A2 (en)
JP (1) JP2004503832A (en)
KR (1) KR100795762B1 (en)
AU (1) AU2001266920A1 (en)
WO (1) WO2001096962A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9329326B2 (en) 2006-05-18 2016-05-03 3M Innovative Properties Company Process for making light guides with extraction structures and light guides produced thereby

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7265161B2 (en) 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
US7381516B2 (en) 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7005229B2 (en) 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
US7006747B2 (en) * 2003-01-17 2006-02-28 3M Innovative Properties Company Optical devices incorporating photo reactive polymers
US20050124712A1 (en) * 2003-12-05 2005-06-09 3M Innovative Properties Company Process for producing photonic crystals
US7583444B1 (en) 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
US8586285B2 (en) * 2007-11-27 2013-11-19 3M Innovative Properties Company Methods for forming sheeting with a composite image that floats and a master tooling
WO2010036972A1 (en) 2008-09-25 2010-04-01 The Trustees Of Columbia University In The City Of New York Devices, apparatus and method for providing photostimulation and imaging of structures
JP2014517856A (en) * 2011-04-22 2014-07-24 スリーエム イノベイティブ プロパティズ カンパニー Improved multiphoton imaging resolution method
TWI612331B (en) * 2016-12-09 2018-01-21 國立交通大學 Device for modulating light intensity
US12092850B2 (en) 2018-04-17 2024-09-17 Meta Platforms Technologies, Llc Patterned anisotropic films and optical elements therewith
US11561507B2 (en) * 2018-04-17 2023-01-24 Meta Platforms Technologies, Llc Methods for three-dimensional arrangement of anisotropic molecules, patterned anisotropic films, and optical elements therewith

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3758186A (en) * 1966-11-30 1973-09-11 Battelle Development Corp Method of copying holograms
US5225918A (en) * 1990-07-18 1993-07-06 Sony Magnescale, Inc. Hologram scale, apparatus for making hologram scale, moving member having hologram scale assembled hologram scale and apparatus for making assembled hologram scale
US5422753A (en) * 1993-12-23 1995-06-06 Xerox Corporation Binary diffraction optical element for controlling scanning beam intensity in a raster output scanning (ROS) optical system
US5847812A (en) * 1996-06-14 1998-12-08 Nikon Corporation Projection exposure system and method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6297791A (en) * 1985-10-25 1987-05-07 Nec Corp Laser marking device
JP3096775B2 (en) * 1990-07-18 2000-10-10 ソニー・プレシジョン・テクノロジー株式会社 Joint hologram scale and its manufacturing apparatus
JPH104059A (en) * 1996-06-14 1998-01-06 Nikon Corp Exposure apparatus and method
JPH104060A (en) * 1996-06-14 1998-01-06 Nikon Corp Exposure apparatus and method
FR2751785A1 (en) * 1996-07-29 1998-01-30 Commissariat Energie Atomique METHOD AND DEVICE FOR FORMING PATTERNS IN A PHOTOSENSITIVE RESIN LAYER BY CONTINUOUS LASER INSOLATION, APPLICATION TO THE MANUFACTURE OF EMISSIVE MICROPOINT CATHODE ELECTRON SOURCES AND FLAT SCREENS
JP2917936B2 (en) * 1996-11-08 1999-07-12 日本電気株式会社 Pattern forming method using reflection hologram
DE19653413C2 (en) * 1996-12-22 2002-02-07 Stefan Hell Scanning microscope, in which a sample is simultaneously optically excited in several sample points

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3758186A (en) * 1966-11-30 1973-09-11 Battelle Development Corp Method of copying holograms
US5225918A (en) * 1990-07-18 1993-07-06 Sony Magnescale, Inc. Hologram scale, apparatus for making hologram scale, moving member having hologram scale assembled hologram scale and apparatus for making assembled hologram scale
US5422753A (en) * 1993-12-23 1995-06-06 Xerox Corporation Binary diffraction optical element for controlling scanning beam intensity in a raster output scanning (ROS) optical system
US5847812A (en) * 1996-06-14 1998-12-08 Nikon Corporation Projection exposure system and method

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
CUMPSTON B H ET AL: "NEW PHOTOPOLYMERS BASED ON TWO-PHOTON ABSORBING CHROMOPHORES AND APPLICATION TO THREE-DIMENSIONAL MICROFABRICATION AND OPTICAL STORAGE", MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS, MATERIALS RESEARCH SOCIETY, PITTSBURG, PA, US, vol. 488, 1998, pages 217 - 225, XP008000191, ISSN: 0272-9172 *
DIAMOND C ET AL: "TWO-PHOTON HOLOGRAPHY IN 3-D PHOTOPOLYMER HOST-GUEST MATRIX", OPTICS EXPRESS, OPTICAL SOCIETY OF AMERICA, WASHINGTON, DC,, US, vol. 6, no. 3, 31 January 2000 (2000-01-31), pages 64 - 68, XP001051871, ISSN: 1094-4087 *
See also references of EP1292863A2 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9329326B2 (en) 2006-05-18 2016-05-03 3M Innovative Properties Company Process for making light guides with extraction structures and light guides produced thereby

Also Published As

Publication number Publication date
JP2004503832A (en) 2004-02-05
EP1292863A2 (en) 2003-03-19
KR100795762B1 (en) 2008-01-21
WO2001096962A2 (en) 2001-12-20
AU2001266920A1 (en) 2001-12-24
KR20030076237A (en) 2003-09-26

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