DE602004018483D1 - Fotopolymerisierbare Zusammensetzung. - Google Patents

Fotopolymerisierbare Zusammensetzung.

Info

Publication number
DE602004018483D1
DE602004018483D1 DE200460018483 DE602004018483T DE602004018483D1 DE 602004018483 D1 DE602004018483 D1 DE 602004018483D1 DE 200460018483 DE200460018483 DE 200460018483 DE 602004018483 T DE602004018483 T DE 602004018483T DE 602004018483 D1 DE602004018483 D1 DE 602004018483D1
Authority
DE
Germany
Prior art keywords
photopolymerizable composition
photopolymerizable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE200460018483
Other languages
English (en)
Inventor
Alexander Williamson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa NV
Original Assignee
Agfa Graphics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Graphics NV filed Critical Agfa Graphics NV
Publication of DE602004018483D1 publication Critical patent/DE602004018483D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
DE200460018483 2004-07-30 2004-07-30 Fotopolymerisierbare Zusammensetzung. Active DE602004018483D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP20040103670 EP1621928B1 (de) 2004-07-30 2004-07-30 Fotopolymerisierbare Zusammensetzung.

Publications (1)

Publication Number Publication Date
DE602004018483D1 true DE602004018483D1 (de) 2009-01-29

Family

ID=34929395

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200460018483 Active DE602004018483D1 (de) 2004-07-30 2004-07-30 Fotopolymerisierbare Zusammensetzung.

Country Status (3)

Country Link
EP (1) EP1621928B1 (de)
JP (1) JP4681387B2 (de)
DE (1) DE602004018483D1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8563222B2 (en) * 2007-05-25 2013-10-22 Agfa Graphics Nv Lithographic printing plate precursor
CN101681106B (zh) 2007-05-25 2013-11-20 爱克发印艺公司 平版印刷印版前体、制备前体中敏化剂混合物的方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5510633B2 (de) * 1972-05-19 1980-03-18
DE2700292C2 (de) * 1977-01-05 1981-09-24 Bayer Ag, 5090 Leverkusen Verwendung von bestimmten Bisstyryl-phenyl- oder -biphenyl- Verbindungen sowie deren Metall- oder organischen Ammoniumsalzen zur Erzeugung einer kohärenten Laseremission
JPH0970897A (ja) * 1995-07-06 1997-03-18 Japan Synthetic Rubber Co Ltd 光造形法
WO2001096959A2 (en) * 2000-06-15 2001-12-20 3M Innovative Properties Company Multidirectional photoreactive absorption method
DE60138021D1 (de) * 2000-06-15 2009-04-30 3M Innovative Properties Co
JP2003020469A (ja) * 2001-07-06 2003-01-24 Fuji Photo Film Co Ltd ２光子吸収組成物
EP1349006B1 (de) * 2002-03-28 2013-09-25 Agfa Graphics N.V. Fotopolymerisierbare Zusammensetzung, die im Wellenlängenbereich von 300 bis zu 450 nm sensibilisiert ist

Also Published As

Publication number Publication date
EP1621928A1 (de) 2006-02-01
JP4681387B2 (ja) 2011-05-11
JP2006048048A (ja) 2006-02-16
EP1621928B1 (de) 2008-12-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition