DE602005010445D1 - Positive lichtempfindliche zusammensetzung - Google Patents
Positive lichtempfindliche zusammensetzungInfo
- Publication number
- DE602005010445D1 DE602005010445D1 DE602005010445T DE602005010445T DE602005010445D1 DE 602005010445 D1 DE602005010445 D1 DE 602005010445D1 DE 602005010445 T DE602005010445 T DE 602005010445T DE 602005010445 T DE602005010445 T DE 602005010445T DE 602005010445 D1 DE602005010445 D1 DE 602005010445D1
- Authority
- DE
- Germany
- Prior art keywords
- sensitive composition
- positive light
- positive
- light
- sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
- B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004248590A JP4242815B2 (ja) | 2004-08-27 | 2004-08-27 | ポジ型感光性組成物 |
PCT/JP2005/012826 WO2006022086A1 (ja) | 2004-08-27 | 2005-07-12 | ポジ型感光性組成物 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602005010445D1 true DE602005010445D1 (de) | 2008-11-27 |
Family
ID=35967306
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602005010445T Active DE602005010445D1 (de) | 2004-08-27 | 2005-07-12 | Positive lichtempfindliche zusammensetzung |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1783549B1 (de) |
JP (1) | JP4242815B2 (de) |
KR (1) | KR100813012B1 (de) |
CN (1) | CN1910521A (de) |
DE (1) | DE602005010445D1 (de) |
WO (1) | WO2006022086A1 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4771473B2 (ja) * | 2006-04-03 | 2011-09-14 | 株式会社シンク・ラボラトリー | ポジ型感光性組成物 |
US7169518B1 (en) * | 2006-04-17 | 2007-01-30 | Eastman Kodak Company | Multilayer imageable element with improved chemical resistance |
JP5038434B2 (ja) * | 2006-11-28 | 2012-10-03 | イーストマン コダック カンパニー | 良好な耐溶剤性を有する多層画像形成性要素 |
JP5307361B2 (ja) * | 2007-06-19 | 2013-10-02 | サカタインクス株式会社 | 処理有機顔料及びその用途 |
KR100991312B1 (ko) | 2007-08-30 | 2010-11-01 | 샌트랄 글래스 컴퍼니 리미티드 | 포지티브형 레지스트 조성물 |
JP5789623B2 (ja) * | 2012-03-29 | 2015-10-07 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、並びにそれを用いた感活性光線性又は感放射線性膜及びパターン形成方法 |
JP6079277B2 (ja) * | 2013-02-04 | 2017-02-15 | 日本ゼオン株式会社 | 感放射線樹脂組成物及び電子部品 |
TWI724029B (zh) * | 2016-09-28 | 2021-04-11 | 奇美實業股份有限公司 | 化學增幅型正型感光性樹脂組成物、附有鑄模的基板的製造方法以及電鍍成形體的製造方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0962006A (ja) * | 1995-08-25 | 1997-03-07 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト組成物 |
JPH0980751A (ja) * | 1995-09-12 | 1997-03-28 | Mitsubishi Chem Corp | 光重合性組成物 |
JP3514900B2 (ja) * | 1996-03-12 | 2004-03-31 | コダックポリクロームグラフィックス株式会社 | 平版印刷版 |
ES2114521T3 (es) * | 1996-04-23 | 2000-01-16 | Kodak Polychrome Graphics Co | Precursor de la forma para impresion litografica y su utilizacion en la formacion de imagenes por calor. |
JP2002090984A (ja) * | 2000-09-13 | 2002-03-27 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP2002189294A (ja) * | 2000-12-21 | 2002-07-05 | Mitsubishi Chemicals Corp | ポジ型画像形成材料 |
JP2002303983A (ja) * | 2001-04-09 | 2002-10-18 | Fuji Photo Film Co Ltd | ポジ型画像形成材料 |
JP4685265B2 (ja) * | 2001-05-10 | 2011-05-18 | コダック株式会社 | 感光性組成物、感光性平版印刷版および平版印刷版の作成方法 |
JP2003337408A (ja) * | 2002-05-17 | 2003-11-28 | Mitsubishi Chemicals Corp | ポジ型感光性組成物、ポジ型感光性画像形成材及びそれを用いたポジ画像形成方法 |
JP2003345017A (ja) * | 2002-05-23 | 2003-12-03 | Fuji Photo Film Co Ltd | 樹脂組成物 |
JP4171254B2 (ja) * | 2002-07-12 | 2008-10-22 | 富士フイルム株式会社 | 樹脂組成物 |
JP2004133025A (ja) * | 2002-10-08 | 2004-04-30 | Think Laboratory Co Ltd | ポジ型感光性組成物 |
JP2004138758A (ja) * | 2002-10-17 | 2004-05-13 | Mitsubishi Chemicals Corp | 感光性樹脂組成物及び画像形成材 |
-
2004
- 2004-08-27 JP JP2004248590A patent/JP4242815B2/ja active Active
-
2005
- 2005-07-12 EP EP05765716A patent/EP1783549B1/de not_active Not-in-force
- 2005-07-12 DE DE602005010445T patent/DE602005010445D1/de active Active
- 2005-07-12 CN CN 200580002009 patent/CN1910521A/zh active Pending
- 2005-07-12 KR KR20067008974A patent/KR100813012B1/ko active IP Right Grant
- 2005-07-12 WO PCT/JP2005/012826 patent/WO2006022086A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
KR100813012B1 (ko) | 2008-03-13 |
KR20060090256A (ko) | 2006-08-10 |
JP2006065071A (ja) | 2006-03-09 |
JP4242815B2 (ja) | 2009-03-25 |
EP1783549A4 (de) | 2007-09-19 |
CN1910521A (zh) | 2007-02-07 |
EP1783549B1 (de) | 2008-10-15 |
EP1783549A1 (de) | 2007-05-09 |
WO2006022086A1 (ja) | 2006-03-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |