JP2004340933A - 燐光体又はシンチレータシートの製造方法及び走査装置に使用するために好適なパネル - Google Patents

燐光体又はシンチレータシートの製造方法及び走査装置に使用するために好適なパネル Download PDF

Info

Publication number
JP2004340933A
JP2004340933A JP2004079890A JP2004079890A JP2004340933A JP 2004340933 A JP2004340933 A JP 2004340933A JP 2004079890 A JP2004079890 A JP 2004079890A JP 2004079890 A JP2004079890 A JP 2004079890A JP 2004340933 A JP2004340933 A JP 2004340933A
Authority
JP
Japan
Prior art keywords
phosphor
layer
support
scintillator
flexible support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004079890A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004340933A5 (ja
Inventor
Guido Verreyken
グイド・ヴェレイケン
Bluys Peter
ペテル・ブリュイス
Hendrickx Rudy
ルディ・ヘンドリックス
Peeters Lucas
ルーカス・ペーターズ
Johan Lamotte
ヨハン・ラモッテ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert NV
Original Assignee
Agfa Gevaert NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert NV filed Critical Agfa Gevaert NV
Publication of JP2004340933A publication Critical patent/JP2004340933A/ja
Publication of JP2004340933A5 publication Critical patent/JP2004340933A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
    • C09K11/7728—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing europium
    • C09K11/7732—Halogenides
    • C09K11/7733—Halogenides with alkali or alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0694—Halides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/19—Delaminating means
    • Y10T156/1928—Differential fluid pressure delaminating means
    • Y10T156/1944—Vacuum delaminating means [e.g., vacuum chamber, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Conversion Of X-Rays Into Visible Images (AREA)
  • Luminescent Compositions (AREA)
  • Measurement Of Radiation (AREA)
  • Physical Vapour Deposition (AREA)
JP2004079890A 2003-03-20 2004-03-19 燐光体又はシンチレータシートの製造方法及び走査装置に使用するために好適なパネル Pending JP2004340933A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03100723A EP1460642B1 (en) 2003-03-20 2003-03-20 Manufacturing method of phosphor or scintillator sheets and panels suitable for use in a scanning apparatus

Publications (2)

Publication Number Publication Date
JP2004340933A true JP2004340933A (ja) 2004-12-02
JP2004340933A5 JP2004340933A5 (ja) 2007-02-01

Family

ID=32799023

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2004079890A Pending JP2004340933A (ja) 2003-03-20 2004-03-19 燐光体又はシンチレータシートの製造方法及び走査装置に使用するために好適なパネル
JP2004079889A Pending JP2004340932A (ja) 2003-03-20 2004-03-19 走査装置に使用するために好適な燐光体又はシンチレータシート及びパネルの製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2004079889A Pending JP2004340932A (ja) 2003-03-20 2004-03-19 走査装置に使用するために好適な燐光体又はシンチレータシート及びパネルの製造方法

Country Status (4)

Country Link
US (1) US7141135B2 (enExample)
EP (1) EP1460642B1 (enExample)
JP (2) JP2004340933A (enExample)
DE (2) DE60326429D1 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7501155B2 (en) * 2003-03-20 2009-03-10 Agfa Healthcare Manufacturing method of phosphor or scintillator sheets and panels suitable for use in a scanning apparatus
JP2005029895A (ja) * 2003-07-04 2005-02-03 Agfa Gevaert Nv 蒸着装置
EP1646053A2 (en) 2004-10-07 2006-04-12 Agfa-Gevaert Binderless storage phosphor screen.
EP1691215B1 (de) 2005-02-15 2012-11-28 Agfa-Gevaert HealthCare GmbH Auslesevorrichtung und Verfahren zum Auslesen von in Speicherleuchtstoffschichten gespeicherten Röntgenaufnahmen
EP1691216B1 (de) 2005-02-15 2013-07-10 Agfa-Gevaert HealthCare GmbH Radiographiesystem und Verfahren zur Aufzeichnung von Röntgenaufnahmen in Speicherleuchtstoffschichten
EP1691217B1 (de) 2005-02-15 2011-11-30 Agfa-Gevaert HealthCare GmbH Auslesevorrichtung und Verfahren zum Auslesen von in Speicherleuchtstoffschichten gespeicherten Röntgenaufnahmen
US20070098881A1 (en) * 2005-10-28 2007-05-03 Jean-Pierre Tahon Method of preparing stabilized storage phosphor panels
EP1783246B1 (en) * 2005-10-28 2014-04-30 Agfa HealthCare N.V. Method of preparing stabilised storage phosphor panels.
US20070098880A1 (en) * 2005-10-28 2007-05-03 Jean-Pierre Tahon Method of vaporization of phosphor precursor raw materials
EP1889893B1 (en) * 2006-08-17 2013-03-27 Agfa HealthCare NV Method of manufacturing a radiation image storage panel
EP1890299A1 (en) * 2006-08-17 2008-02-20 Agfa HealthCare NV Method of manufacturing a radiation image storage panel
JP4983911B2 (ja) * 2007-03-08 2012-07-25 コニカミノルタエムジー株式会社 シンチレータパネルの製造方法及びシンチレータパネル用基板の厚さの下限設定方法
US20090162535A1 (en) * 2007-12-21 2009-06-25 Jean-Pierre Tahon Method of forming a phosphor or scintillator material and vapor deposition apparatus used therefor
DE102008024372B4 (de) * 2008-05-20 2013-08-22 Von Ardenne Anlagentechnik Gmbh Verfahren zum Transport von Substraten in Vakuumbeschichtungseinrichtungen
CN101684546B (zh) * 2008-09-25 2012-05-23 鸿富锦精密工业（深圳）有限公司 软性基板镀膜治具
TWI477646B (zh) * 2010-08-09 2015-03-21 Hon Hai Prec Ind Co Ltd 化學氣相沉積設備
AT512949B1 (de) * 2012-06-04 2016-06-15 Leica Microsysteme Gmbh Verfahren zur Beschichtung mit einem Verdampfungsmaterial
US9507968B2 (en) * 2013-03-15 2016-11-29 Cirque Corporation Flying sense electrodes for creating a secure cage for integrated circuits and pathways
CN107937869A (zh) * 2016-10-12 2018-04-20 上海和辉光电有限公司 一种镀膜装置及镀膜方法
CN107177820B (zh) * 2017-06-12 2019-05-24 哈尔滨光宇电源股份有限公司 高速连续卷绕式真空蒸镀锂设备及利用其实现基材蒸镀锂的方法
CN109746142B (zh) * 2017-11-06 2021-04-02 张家港康得新光电材料有限公司 镀膜装置
CN111254407A (zh) * 2018-11-30 2020-06-09 中国科学院大连化学物理研究所 使用热蒸发镀膜法在柔性衬底上制备薄膜的真空镀膜设备
CN112746322B (zh) * 2020-12-30 2022-08-26 安徽中飞科技有限公司 制备多晶硒化锌的物理气相沉积装置及方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3838273A (en) 1972-05-30 1974-09-24 Gen Electric X-ray image intensifier input
US3859527A (en) 1973-01-02 1975-01-07 Eastman Kodak Co Apparatus and method for producing images corresponding to patterns of high energy radiation
CH652754A5 (de) 1981-03-13 1985-11-29 Balzers Hochvakuum Anordnung zum beschichten von substraten in einer vakuumbeschichtungsanlage.
US5055681A (en) * 1984-09-18 1991-10-08 Konica Corporation Radiographic image storage panel and process for reading out a radiographic image
DE3578359D1 (de) 1984-12-17 1990-07-26 Konishiroku Photo Ind Schirm zum speichern eines strahlungsbildes.
KR940000259A (ko) * 1992-06-12 1994-01-03 게리 리 그리스월드 테이프 지지체상에서의 다층 필름 제조 시스템 및 방법
GB2339800B (en) * 1998-07-24 2003-04-09 Gen Vacuum Equipment Ltd A vacuum process for depositing zinc sulphide and other coatings on flexible moving web
WO2001003156A1 (en) * 1999-07-02 2001-01-11 Symyx Technologies, Inc. METHOD FOR PREPARING A CsX PHOTOSTIMULABLE PHOSPHOR AND PHOSPHORS THEREFROM
EP1113458B1 (en) * 1999-12-27 2005-02-02 Agfa-Gevaert A binderless storage phosphor screen with needle shaped crystals and methods for producing the same
US6402905B1 (en) 2001-03-16 2002-06-11 4 Wave, Inc System and method for controlling deposition thickness using a mask with a shadow that varies along a radius of a substrate
JP2003113466A (ja) 2001-07-31 2003-04-18 Fuji Photo Film Co Ltd 真空蒸着装置

Also Published As

Publication number Publication date
EP1460642B1 (en) 2009-03-04
US20040224084A1 (en) 2004-11-11
US7141135B2 (en) 2006-11-28
DE60326429D1 (de) 2009-04-16
JP2004340932A (ja) 2004-12-02
EP1460642A1 (en) 2004-09-22
DE602004018861D1 (de) 2009-02-26

Similar Documents

Publication Publication Date Title
US7070658B2 (en) Vapor deposition apparatus
JP2004340933A (ja) 燐光体又はシンチレータシートの製造方法及び走査装置に使用するために好適なパネル
US7501155B2 (en) Manufacturing method of phosphor or scintillator sheets and panels suitable for use in a scanning apparatus
US20080286461A1 (en) Vacuum evaporation method
JP3130633B2 (ja) 放射線画像変換パネルの製造方法
EP1496134B1 (en) Vapor deposition apparatus.
EP1460643B1 (en) Manufacturing method of phosphor or scintillator sheets and panels suitable for use in a scanning apparatus.
CN102565839A (zh) 辐射检测元件、辐射检测模块及辐射图像诊断设备
US20080035857A1 (en) Method of manufacturing a radiation image storage panel
JP2008014892A (ja) 放射線画像変換パネルおよび放射線画像変換パネルの製造方法
JP2008111789A (ja) 放射線検出器およびその製造方法
JP2006090851A (ja) 放射線画像変換パネルの製造装置及び放射線画像変換パネルの製造方法
US7193235B2 (en) Radiation image conversion panel and preparation method thereof
JPH0718958B2 (ja) 放射線画像変換パネル
US7081333B2 (en) Radiation image conversion panel and preparation method thereof
US7442952B2 (en) Method for erasing radiation energy remaining in radiation image storage panel
JP5493577B2 (ja) 放射線画像検出装置
JP2008046122A (ja) 放射線像貯蔵パネルの製造方法
JPH01263600A (ja) 放射線画像変換パネルの製造方法
US20070098881A1 (en) Method of preparing stabilized storage phosphor panels
JP2006177704A (ja) 放射線画像変換パネルの製造装置及び放射線画像変換パネルの製造方法
JPH06100679B2 (ja) 放射線画像変換パネルの製造方法
JP2009079977A (ja) 放射線画像変換パネル及びその製造方法
JP2007155710A (ja) 貯蔵燐光体パネルの安定化の方法
JPH01316698A (ja) 放射線画像変換パネル

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20061207

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20061207

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20070406

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20070406

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080620

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20081114