JP2004340932A - 走査装置に使用するために好適な燐光体又はシンチレータシート及びパネルの製造方法 - Google Patents
走査装置に使用するために好適な燐光体又はシンチレータシート及びパネルの製造方法 Download PDFInfo
- Publication number
- JP2004340932A JP2004340932A JP2004079889A JP2004079889A JP2004340932A JP 2004340932 A JP2004340932 A JP 2004340932A JP 2004079889 A JP2004079889 A JP 2004079889A JP 2004079889 A JP2004079889 A JP 2004079889A JP 2004340932 A JP2004340932 A JP 2004340932A
- Authority
- JP
- Japan
- Prior art keywords
- support
- phosphor
- layer
- scintillator
- flexible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
- C09K11/7728—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing europium
- C09K11/7732—Halogenides
- C09K11/7733—Halogenides with alkali or alkaline earth metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0694—Halides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1928—Differential fluid pressure delaminating means
- Y10T156/1944—Vacuum delaminating means [e.g., vacuum chamber, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Conversion Of X-Rays Into Visible Images (AREA)
- Luminescent Compositions (AREA)
- Physical Vapour Deposition (AREA)
- Measurement Of Radiation (AREA)
Abstract
【解決手段】 真空チャンバー1内にて、蒸着原材料4の蒸気流16は、冷却された支持ローラ6で支持されて矢印方向に連続的に又は不連続的に移動する可撓性シート5上に蒸着される。赤外線ヒータ9と反射ケージ10によって可撓性シート5は加熱される。耐熱性コイルばね8は支持ローラ6と可撓性シート5を熱的に絶縁し、また可撓性シート5の両端を接続している。金属ラスタ14は蒸着層の不均一部分の形成を回避し、冷却されたバッフル17は移動して蒸気流16の暴露範囲を調節する。蒸着層支持体は蒸着工程前、中又は後に可逆的に変形可能なものを選択するので、可撓性シート5をウェブ形態にして、長尺の蛍光スクリーンを得る。
【選択図】 図1
Description
以下の図面は被覆されるべき支持体及び被覆工程が行われる装置と関連した構成の様々な例の図を表す。本発明による被覆方法の好ましい例を示すこれらの図面は決してそれらに限定されないことは明らかである。
比較例1
この例は光刺激性CsBr:Eu像形成プレートを得るために実施される従来法を記載する。
可撓性の陽極酸化アルミニウム上のCsBr:Eu光刺激性燐光体スクリーンは原材料としてCsBr及びEuOBrの混合物から出発して速度の瞬間的な大きさがその全表面にわたって一定であるような方法で移動させて可撓性の陽極酸化アルミニウム支持体上の熱蒸着によって真空チャンバー内で製造された。
CsBr:Eu光刺激性燐光体スクリーンは真空チャンバー内で熱蒸着によって連続的な方式で供給される可撓性陽極酸化アルミニウム上に作られた。
2 オーブン
3 るつぼ、トレー又はボート
4 原材料の混合物
5 シート
6 ローラ
7 熱絶縁層
8 円柱形ばね
9 赤外線ヒータ
10 反射ケージ
11 高温計
12 バッフル
13 バッフル
14 金属ラスタ
15 分離プレート
16 蒸気流
17 バッフル
18 蒸発部
19 加熱部
20 運搬ローラ
21 走行路
22 ウェブ
23 巻き出しローラ(供給ローラ)
24 巻き上げローラ(収集ローラ)
25 巻き取り部
26 原材料供給の源
27 ガイド機構(原材料供給用)
28 室内雰囲気
Claims (13)
- 蒸着の工程によって、真空条件下で維持された封止された領域内で、可撓性支持体上に燐光体又はシンチレータ層を被覆するための方法であって、前記燐光体又はシンチレータ層が前記支持体上に蒸着される方法において、前記支持体が少なくとも前記蒸着の工程の前、中又は後に変形されることを特徴とする方法。
- 前記燐光体又はシンチレータ層は、使用準備された燐光体又はシンチレータスクリーン、パネル又はプレートの面積を少なくとも50%超えて、前記可撓性支持体の領域上に蒸着される請求項1に記載の方法。
- 前記支持体は少なくとも部分的に、一以上のローラ及び/又はガイドフレーム上を移動する請求項1又は2に記載の方法。
- 前記支持体が少なくとも一つの巻き出し又は供給ローラ及び/又は少なくとも一つの巻き上げ又は巻き取りローラ上を移動し、前記封止された領域の外側に前記ローラの一方又は両方が存在するか又は前記ローラがいずれも存在しない請求項1〜3のいずれか一項に記載の方法。
- 前記可撓性支持体が少なくとも一回、前方向に連続又は不連続移動によって前記被覆領域を通過する請求項1〜4のいずれか一項に記載の方法。
- 前記可撓性支持体が前方向及び後方向の移動の連続工程において移動し、前記連続工程間で中断される又は中断されない請求項1〜4のいずれか一項に記載の方法。
- 前記支持体が自己支持シート、プレート、ウェブ又はパネルである請求項1〜6のいずれか一項に記載の方法。
- 前記支持体がガラス、ポリマー材料又は金属からなる群から選択される請求項1〜7のいずれか一項に記載の方法。
- 前記蒸着の工程が一以上の容器からの原材料の蒸気流によって開始され、前記蒸気流が熱、電気又は電磁エネルギー又はそれらの組合せによってエネルギーを前記原材料及び前記容器に加えることによって生成される請求項1〜8のいずれか一項に記載の方法。
- 前記燐光体が光刺激性CsBr:Eu燐光体である請求項1〜9のいずれか一項に記載の方法。
- 前記燐光体又はシンチレータ層上に保護被覆を適用する工程をさらに特徴とし、前記保護層が真空条件下で維持された前記封止された領域内で前記燐光体又はシンチレータ層上に被覆又は積層される請求項1〜10のいずれか一項に記載の方法。
- キャリア層上に燐光体又はシンチレータ層を担持する前記支持体を積層する工程をさらに特徴とし、前記工程が真空条件下で維持された前記封止された領域内で実施され、前記キャリア層が可撓性又は硬質ポリマー層、又は可撓性又は硬質金属シートである請求項1〜10のいずれか一項に記載の方法。
- 前記蒸着された燐光体又はシンチレータ層を担持する前記支持体を切断する工程をさらに含み、切断が所望のフォーマットを有するスクリーン、プレート又はパネルにオンラインで行われる請求項1〜12のいずれか一項に記載の方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03100723A EP1460642B1 (en) | 2003-03-20 | 2003-03-20 | Manufacturing method of phosphor or scintillator sheets and panels suitable for use in a scanning apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004340932A true JP2004340932A (ja) | 2004-12-02 |
JP2004340932A5 JP2004340932A5 (ja) | 2007-02-01 |
Family
ID=32799023
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004079890A Pending JP2004340933A (ja) | 2003-03-20 | 2004-03-19 | 燐光体又はシンチレータシートの製造方法及び走査装置に使用するために好適なパネル |
JP2004079889A Pending JP2004340932A (ja) | 2003-03-20 | 2004-03-19 | 走査装置に使用するために好適な燐光体又はシンチレータシート及びパネルの製造方法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004079890A Pending JP2004340933A (ja) | 2003-03-20 | 2004-03-19 | 燐光体又はシンチレータシートの製造方法及び走査装置に使用するために好適なパネル |
Country Status (4)
Country | Link |
---|---|
US (1) | US7141135B2 (ja) |
EP (1) | EP1460642B1 (ja) |
JP (2) | JP2004340933A (ja) |
DE (2) | DE60326429D1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008108428A1 (ja) * | 2007-03-08 | 2008-09-12 | Konica Minolta Medical & Graphic, Inc. | シンチレータパネルおよびシンチレータパネルの製造方法 |
JP2013249538A (ja) * | 2012-06-04 | 2013-12-12 | Leica Mikrosysteme Gmbh | 蒸発材料を用いてコーティングするための装置及び方法 |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7501155B2 (en) * | 2003-03-20 | 2009-03-10 | Agfa Healthcare | Manufacturing method of phosphor or scintillator sheets and panels suitable for use in a scanning apparatus |
JP2005029895A (ja) * | 2003-07-04 | 2005-02-03 | Agfa Gevaert Nv | 蒸着装置 |
EP1646053A2 (en) | 2004-10-07 | 2006-04-12 | Agfa-Gevaert | Binderless storage phosphor screen. |
EP1691216B1 (de) | 2005-02-15 | 2013-07-10 | Agfa-Gevaert HealthCare GmbH | Radiographiesystem und Verfahren zur Aufzeichnung von Röntgenaufnahmen in Speicherleuchtstoffschichten |
EP1691217B1 (de) | 2005-02-15 | 2011-11-30 | Agfa-Gevaert HealthCare GmbH | Auslesevorrichtung und Verfahren zum Auslesen von in Speicherleuchtstoffschichten gespeicherten Röntgenaufnahmen |
EP1691215B1 (de) | 2005-02-15 | 2012-11-28 | Agfa-Gevaert HealthCare GmbH | Auslesevorrichtung und Verfahren zum Auslesen von in Speicherleuchtstoffschichten gespeicherten Röntgenaufnahmen |
EP1783246B1 (en) * | 2005-10-28 | 2014-04-30 | Agfa HealthCare N.V. | Method of preparing stabilised storage phosphor panels. |
US20070098881A1 (en) * | 2005-10-28 | 2007-05-03 | Jean-Pierre Tahon | Method of preparing stabilized storage phosphor panels |
US20070098880A1 (en) * | 2005-10-28 | 2007-05-03 | Jean-Pierre Tahon | Method of vaporization of phosphor precursor raw materials |
EP1889893B1 (en) * | 2006-08-17 | 2013-03-27 | Agfa HealthCare NV | Method of manufacturing a radiation image storage panel |
EP1890299A1 (en) * | 2006-08-17 | 2008-02-20 | Agfa HealthCare NV | Method of manufacturing a radiation image storage panel |
US20090162535A1 (en) * | 2007-12-21 | 2009-06-25 | Jean-Pierre Tahon | Method of forming a phosphor or scintillator material and vapor deposition apparatus used therefor |
DE102008024372B4 (de) * | 2008-05-20 | 2013-08-22 | Von Ardenne Anlagentechnik Gmbh | Verfahren zum Transport von Substraten in Vakuumbeschichtungseinrichtungen |
CN101684546B (zh) * | 2008-09-25 | 2012-05-23 | 鸿富锦精密工业(深圳)有限公司 | 软性基板镀膜治具 |
TWI477646B (zh) * | 2010-08-09 | 2015-03-21 | Hon Hai Prec Ind Co Ltd | 化學氣相沉積設備 |
US9507968B2 (en) * | 2013-03-15 | 2016-11-29 | Cirque Corporation | Flying sense electrodes for creating a secure cage for integrated circuits and pathways |
CN107937869A (zh) * | 2016-10-12 | 2018-04-20 | 上海和辉光电有限公司 | 一种镀膜装置及镀膜方法 |
CN107177820B (zh) * | 2017-06-12 | 2019-05-24 | 哈尔滨光宇电源股份有限公司 | 高速连续卷绕式真空蒸镀锂设备及利用其实现基材蒸镀锂的方法 |
CN109746142B (zh) * | 2017-11-06 | 2021-04-02 | 张家港康得新光电材料有限公司 | 镀膜装置 |
CN111254407A (zh) * | 2018-11-30 | 2020-06-09 | 中国科学院大连化学物理研究所 | 使用热蒸发镀膜法在柔性衬底上制备薄膜的真空镀膜设备 |
CN112746322B (zh) * | 2020-12-30 | 2022-08-26 | 安徽中飞科技有限公司 | 制备多晶硒化锌的物理气相沉积装置及方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3838273A (en) | 1972-05-30 | 1974-09-24 | Gen Electric | X-ray image intensifier input |
US3859527A (en) | 1973-01-02 | 1975-01-07 | Eastman Kodak Co | Apparatus and method for producing images corresponding to patterns of high energy radiation |
CH652754A5 (de) | 1981-03-13 | 1985-11-29 | Balzers Hochvakuum | Anordnung zum beschichten von substraten in einer vakuumbeschichtungsanlage. |
US5055681A (en) * | 1984-09-18 | 1991-10-08 | Konica Corporation | Radiographic image storage panel and process for reading out a radiographic image |
DE3578359D1 (de) | 1984-12-17 | 1990-07-26 | Konishiroku Photo Ind | Schirm zum speichern eines strahlungsbildes. |
KR940000259A (ko) * | 1992-06-12 | 1994-01-03 | 게리 리 그리스월드 | 테이프 지지체상에서의 다층 필름 제조 시스템 및 방법 |
GB2339800B (en) * | 1998-07-24 | 2003-04-09 | Gen Vacuum Equipment Ltd | A vacuum process for depositing zinc sulphide and other coatings on flexible moving web |
AU5750800A (en) * | 1999-07-02 | 2001-01-22 | Agfa-Gevaert Naamloze Vennootschap | Method for preparing a csx photostimulable phosphor and phosphors therefrom |
EP1113458B1 (en) * | 1999-12-27 | 2005-02-02 | Agfa-Gevaert | A binderless storage phosphor screen with needle shaped crystals and methods for producing the same |
US6402905B1 (en) | 2001-03-16 | 2002-06-11 | 4 Wave, Inc | System and method for controlling deposition thickness using a mask with a shadow that varies along a radius of a substrate |
JP2003113466A (ja) | 2001-07-31 | 2003-04-18 | Fuji Photo Film Co Ltd | 真空蒸着装置 |
-
2003
- 2003-03-20 EP EP03100723A patent/EP1460642B1/en not_active Expired - Lifetime
- 2003-03-20 DE DE60326429T patent/DE60326429D1/de not_active Expired - Lifetime
-
2004
- 2004-03-19 JP JP2004079890A patent/JP2004340933A/ja active Pending
- 2004-03-19 DE DE602004018861T patent/DE602004018861D1/de not_active Expired - Lifetime
- 2004-03-19 JP JP2004079889A patent/JP2004340932A/ja active Pending
- 2004-03-19 US US10/804,539 patent/US7141135B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008108428A1 (ja) * | 2007-03-08 | 2008-09-12 | Konica Minolta Medical & Graphic, Inc. | シンチレータパネルおよびシンチレータパネルの製造方法 |
JPWO2008108428A1 (ja) * | 2007-03-08 | 2010-06-17 | コニカミノルタエムジー株式会社 | シンチレータパネルおよびシンチレータパネルの製造方法 |
JP2012163571A (ja) * | 2007-03-08 | 2012-08-30 | Konica Minolta Medical & Graphic Inc | シンチレータパネルの製造方法 |
JP2013249538A (ja) * | 2012-06-04 | 2013-12-12 | Leica Mikrosysteme Gmbh | 蒸発材料を用いてコーティングするための装置及び方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1460642A1 (en) | 2004-09-22 |
JP2004340933A (ja) | 2004-12-02 |
US20040224084A1 (en) | 2004-11-11 |
US7141135B2 (en) | 2006-11-28 |
DE60326429D1 (de) | 2009-04-16 |
DE602004018861D1 (de) | 2009-02-26 |
EP1460642B1 (en) | 2009-03-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7070658B2 (en) | Vapor deposition apparatus | |
JP2004340932A (ja) | 走査装置に使用するために好適な燐光体又はシンチレータシート及びパネルの製造方法 | |
US7501155B2 (en) | Manufacturing method of phosphor or scintillator sheets and panels suitable for use in a scanning apparatus | |
US20060060792A1 (en) | Radiographic image conversion panel and method of manufacturing the same | |
JP2008111789A (ja) | 放射線検出器およびその製造方法 | |
JP3130633B2 (ja) | 放射線画像変換パネルの製造方法 | |
EP1496134B1 (en) | Vapor deposition apparatus. | |
EP1460643B1 (en) | Manufacturing method of phosphor or scintillator sheets and panels suitable for use in a scanning apparatus. | |
JP2012098175A (ja) | 放射線検出素子およびその製造方法、放射線検出モジュール並びに放射線画像診断装置 | |
US7704651B2 (en) | Radiographic image conversion panel and production method thereof | |
JPH0727079B2 (ja) | 放射線画像情報読取装置 | |
US7638785B2 (en) | Reading system for radiation image conversion panel and radiation image conversion panel | |
JP2006090851A (ja) | 放射線画像変換パネルの製造装置及び放射線画像変換パネルの製造方法 | |
US20070098881A1 (en) | Method of preparing stabilized storage phosphor panels | |
JPH0718958B2 (ja) | 放射線画像変換パネル | |
US7081333B2 (en) | Radiation image conversion panel and preparation method thereof | |
US20080035857A1 (en) | Method of manufacturing a radiation image storage panel | |
US20070122544A1 (en) | Method of stabilizing storage phosphor panels | |
EP1783246B1 (en) | Method of preparing stabilised storage phosphor panels. | |
US7253421B2 (en) | Radiation image conversion panel and manufacturing method thereof | |
JP2007155710A (ja) | 貯蔵燐光体パネルの安定化の方法 | |
JP2008046122A (ja) | 放射線像貯蔵パネルの製造方法 | |
JP2005164493A (ja) | 放射線像変換パネル及び放射線像変換パネルの製造方法 | |
JPH01263600A (ja) | 放射線画像変換パネルの製造方法 | |
JPH0713680B2 (ja) | 放射線画像変換パネル |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20061207 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20061207 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20070406 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20070406 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080620 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20081114 |