DE60326429D1 - Herstellungsverfahren für Phosphor- oder Szintillatorfolien und Platten geeignet für eine Abtastvorrichtung - Google Patents

Herstellungsverfahren für Phosphor- oder Szintillatorfolien und Platten geeignet für eine Abtastvorrichtung

Info

Publication number
DE60326429D1
DE60326429D1 DE60326429T DE60326429T DE60326429D1 DE 60326429 D1 DE60326429 D1 DE 60326429D1 DE 60326429 T DE60326429 T DE 60326429T DE 60326429 T DE60326429 T DE 60326429T DE 60326429 D1 DE60326429 D1 DE 60326429D1
Authority
DE
Germany
Prior art keywords
phosphor
production process
scanning device
plates suitable
scintillator films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60326429T
Other languages
German (de)
English (en)
Inventor
Johan Lamotte
Guido Verreyken
Paul Leblans
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa HealthCare NV
Original Assignee
Agfa HealthCare NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa HealthCare NV filed Critical Agfa HealthCare NV
Application granted granted Critical
Publication of DE60326429D1 publication Critical patent/DE60326429D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/08—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials
    • C09K11/77—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing rare earth metals
    • C09K11/7728—Luminescent materials, e.g. electroluminescent or chemiluminescent containing inorganic luminescent materials containing rare earth metals containing europium
    • C09K11/7732—Halogenides
    • C09K11/7733—Halogenides with alkali or alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0694—Halides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/19—Delaminating means
    • Y10T156/1928—Differential fluid pressure delaminating means
    • Y10T156/1944—Vacuum delaminating means [e.g., vacuum chamber, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Conversion Of X-Rays Into Visible Images (AREA)
  • Luminescent Compositions (AREA)
  • Physical Vapour Deposition (AREA)
  • Measurement Of Radiation (AREA)
DE60326429T 2003-03-20 2003-03-20 Herstellungsverfahren für Phosphor- oder Szintillatorfolien und Platten geeignet für eine Abtastvorrichtung Expired - Lifetime DE60326429D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03100723A EP1460642B1 (en) 2003-03-20 2003-03-20 Manufacturing method of phosphor or scintillator sheets and panels suitable for use in a scanning apparatus

Publications (1)

Publication Number Publication Date
DE60326429D1 true DE60326429D1 (de) 2009-04-16

Family

ID=32799023

Family Applications (2)

Application Number Title Priority Date Filing Date
DE60326429T Expired - Lifetime DE60326429D1 (de) 2003-03-20 2003-03-20 Herstellungsverfahren für Phosphor- oder Szintillatorfolien und Platten geeignet für eine Abtastvorrichtung
DE602004018861T Expired - Lifetime DE602004018861D1 (de) 2003-03-20 2004-03-19 Herststellungsverfahren für Phosphor- oder Szintillatorfolien und Platten geeignet für eine Abtastvorrichtung

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE602004018861T Expired - Lifetime DE602004018861D1 (de) 2003-03-20 2004-03-19 Herststellungsverfahren für Phosphor- oder Szintillatorfolien und Platten geeignet für eine Abtastvorrichtung

Country Status (4)

Country Link
US (1) US7141135B2 (enExample)
EP (1) EP1460642B1 (enExample)
JP (2) JP2004340932A (enExample)
DE (2) DE60326429D1 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7501155B2 (en) * 2003-03-20 2009-03-10 Agfa Healthcare Manufacturing method of phosphor or scintillator sheets and panels suitable for use in a scanning apparatus
JP2005029895A (ja) * 2003-07-04 2005-02-03 Agfa Gevaert Nv 蒸着装置
EP1646053A2 (en) 2004-10-07 2006-04-12 Agfa-Gevaert Binderless storage phosphor screen.
ATE535824T1 (de) 2005-02-15 2011-12-15 Agfa Gevaert Healthcare Gmbh Auslesevorrichtung und verfahren zum auslesen von in speicherleuchtstoffschichten gespeicherten röntgenaufnahmen
EP1691215B1 (de) 2005-02-15 2012-11-28 Agfa-Gevaert HealthCare GmbH Auslesevorrichtung und Verfahren zum Auslesen von in Speicherleuchtstoffschichten gespeicherten Röntgenaufnahmen
EP1691216B1 (de) 2005-02-15 2013-07-10 Agfa-Gevaert HealthCare GmbH Radiographiesystem und Verfahren zur Aufzeichnung von Röntgenaufnahmen in Speicherleuchtstoffschichten
US20070098881A1 (en) * 2005-10-28 2007-05-03 Jean-Pierre Tahon Method of preparing stabilized storage phosphor panels
US20070098880A1 (en) * 2005-10-28 2007-05-03 Jean-Pierre Tahon Method of vaporization of phosphor precursor raw materials
EP1783246B1 (en) * 2005-10-28 2014-04-30 Agfa HealthCare N.V. Method of preparing stabilised storage phosphor panels.
EP1890299A1 (en) * 2006-08-17 2008-02-20 Agfa HealthCare NV Method of manufacturing a radiation image storage panel
EP1889893B1 (en) * 2006-08-17 2013-03-27 Agfa HealthCare NV Method of manufacturing a radiation image storage panel
WO2008108428A1 (ja) * 2007-03-08 2008-09-12 Konica Minolta Medical & Graphic, Inc. シンチレータパネルおよびシンチレータパネルの製造方法
US20090162535A1 (en) * 2007-12-21 2009-06-25 Jean-Pierre Tahon Method of forming a phosphor or scintillator material and vapor deposition apparatus used therefor
DE102008024372B4 (de) * 2008-05-20 2013-08-22 Von Ardenne Anlagentechnik Gmbh Verfahren zum Transport von Substraten in Vakuumbeschichtungseinrichtungen
CN101684546B (zh) * 2008-09-25 2012-05-23 鸿富锦精密工业（深圳）有限公司 软性基板镀膜治具
TWI477646B (zh) * 2010-08-09 2015-03-21 Hon Hai Prec Ind Co Ltd 化學氣相沉積設備
AT512949B1 (de) * 2012-06-04 2016-06-15 Leica Microsysteme Gmbh Verfahren zur Beschichtung mit einem Verdampfungsmaterial
WO2014145770A2 (en) * 2013-03-15 2014-09-18 Cirque Corporation Flying sense electrodes for creating a secure cage for integrated circuits and pathways
CN107937869A (zh) * 2016-10-12 2018-04-20 上海和辉光电有限公司 一种镀膜装置及镀膜方法
CN107177820B (zh) * 2017-06-12 2019-05-24 哈尔滨光宇电源股份有限公司 高速连续卷绕式真空蒸镀锂设备及利用其实现基材蒸镀锂的方法
CN109746142B (zh) * 2017-11-06 2021-04-02 张家港康得新光电材料有限公司 镀膜装置
CN111254407A (zh) * 2018-11-30 2020-06-09 中国科学院大连化学物理研究所 使用热蒸发镀膜法在柔性衬底上制备薄膜的真空镀膜设备
CN112746322B (zh) * 2020-12-30 2022-08-26 安徽中飞科技有限公司 制备多晶硒化锌的物理气相沉积装置及方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3838273A (en) 1972-05-30 1974-09-24 Gen Electric X-ray image intensifier input
US3859527A (en) 1973-01-02 1975-01-07 Eastman Kodak Co Apparatus and method for producing images corresponding to patterns of high energy radiation
CH652754A5 (de) 1981-03-13 1985-11-29 Balzers Hochvakuum Anordnung zum beschichten von substraten in einer vakuumbeschichtungsanlage.
US5055681A (en) * 1984-09-18 1991-10-08 Konica Corporation Radiographic image storage panel and process for reading out a radiographic image
DE3578359D1 (de) 1984-12-17 1990-07-26 Konishiroku Photo Ind Schirm zum speichern eines strahlungsbildes.
KR940000259A (ko) * 1992-06-12 1994-01-03 게리 리 그리스월드 테이프 지지체상에서의 다층 필름 제조 시스템 및 방법
GB2339800B (en) * 1998-07-24 2003-04-09 Gen Vacuum Equipment Ltd A vacuum process for depositing zinc sulphide and other coatings on flexible moving web
JP4521144B2 (ja) * 1999-07-02 2010-08-11 シミクス・テクノロジーズ・インコーポレーテツド ＣｓＸ光刺激可能な蛍リン光体の製造法及びそれからの蛍リン光体
EP1113458B1 (en) * 1999-12-27 2005-02-02 Agfa-Gevaert A binderless storage phosphor screen with needle shaped crystals and methods for producing the same
US6402905B1 (en) 2001-03-16 2002-06-11 4 Wave, Inc System and method for controlling deposition thickness using a mask with a shadow that varies along a radius of a substrate
JP2003113466A (ja) 2001-07-31 2003-04-18 Fuji Photo Film Co Ltd 真空蒸着装置

Also Published As

Publication number Publication date
EP1460642B1 (en) 2009-03-04
JP2004340932A (ja) 2004-12-02
US7141135B2 (en) 2006-11-28
EP1460642A1 (en) 2004-09-22
JP2004340933A (ja) 2004-12-02
DE602004018861D1 (de) 2009-02-26
US20040224084A1 (en) 2004-11-11

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