JP2004269350A - Ｙ２ｏ３焼結体及びその製造方法 - Google Patents

Ｙ２ｏ３焼結体及びその製造方法 Download PDF

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Publication number
JP2004269350A
JP2004269350A JP2004036986A JP2004036986A JP2004269350A JP 2004269350 A JP2004269350 A JP 2004269350A JP 2004036986 A JP2004036986 A JP 2004036986A JP 2004036986 A JP2004036986 A JP 2004036986A JP 2004269350 A JP2004269350 A JP 2004269350A
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Japan
Prior art keywords
sintered body
raw material
firing
purity
hydrogen atmosphere
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Pending
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JP2004036986A
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English (en)
Japanese (ja)
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JP2004269350A5 (enrdf_load_stackoverflow
Inventor
Keiichiro Isomura
敬一郎 磯村
Takayuki Ikeda
隆之 池田
Masataka Murata
征隆 村田
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Coorstek KK
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Toshiba Ceramics Co Ltd
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Priority to JP2004036986A priority Critical patent/JP2004269350A/ja
Publication of JP2004269350A publication Critical patent/JP2004269350A/ja
Publication of JP2004269350A5 publication Critical patent/JP2004269350A5/ja
Pending legal-status Critical Current

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  • Compositions Of Oxide Ceramics (AREA)
JP2004036986A 2003-02-17 2004-02-13 Ｙ２ｏ３焼結体及びその製造方法 Pending JP2004269350A (ja)

Priority Applications (1)

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JP2004036986A JP2004269350A (ja) 2003-02-17 2004-02-13 Ｙ２ｏ３焼結体及びその製造方法

Applications Claiming Priority (2)

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JP2003037836 2003-02-17
JP2004036986A JP2004269350A (ja) 2003-02-17 2004-02-13 Ｙ２ｏ３焼結体及びその製造方法

Publications (2)

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JP2004269350A true JP2004269350A (ja) 2004-09-30
JP2004269350A5 JP2004269350A5 (enrdf_load_stackoverflow) 2005-11-04

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JP2004036986A Pending JP2004269350A (ja) 2003-02-17 2004-02-13 Ｙ２ｏ３焼結体及びその製造方法

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006021990A (ja) * 2004-06-07 2006-01-26 Toshiba Ceramics Co Ltd プラズマ処理装置用イットリアセラミックス部品及びその製造方法
EP1921053A1 (en) * 2006-10-30 2008-05-14 Applied Materials, Inc. Method for preparing yttria parts and plasma reactor parts comprising yttria
JP2008174801A (ja) * 2007-01-19 2008-07-31 Covalent Materials Corp プラズマプロセス装置用部材
JP2008260651A (ja) * 2007-04-11 2008-10-30 Nitsukatoo:Kk Ｙ２ｏ３質焼結体
WO2009133638A1 (ja) * 2008-04-28 2009-11-05 株式会社フェローテックセラミックス イットリア焼結体およびプラズマプロセス装置用部材
KR100998258B1 (ko) * 2009-09-29 2010-12-03 (주)에스에이치이씨 산화이트륨 소성체 및 그 제조방법
US7964818B2 (en) 2006-10-30 2011-06-21 Applied Materials, Inc. Method and apparatus for photomask etching
JP2012214319A (ja) * 2011-03-31 2012-11-08 Covalent Materials Corp 透光性セラミックス及びその製造方法
KR101338090B1 (ko) * 2012-07-27 2014-01-20 경상대학교산학협력단 용융 이트리아를 출발물질로 이용하여 상압 소결한 고밀도 이트리아 세라믹 소결체의 제조방법

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006021990A (ja) * 2004-06-07 2006-01-26 Toshiba Ceramics Co Ltd プラズマ処理装置用イットリアセラミックス部品及びその製造方法
US7964818B2 (en) 2006-10-30 2011-06-21 Applied Materials, Inc. Method and apparatus for photomask etching
KR100958757B1 (ko) * 2006-10-30 2010-05-18 어플라이드 머티어리얼스, 인코포레이티드 플라즈마 반응기 부품을 제조하기 위한 방법 및 장치
US7919722B2 (en) 2006-10-30 2011-04-05 Applied Materials, Inc. Method for fabricating plasma reactor parts
EP1921053A1 (en) * 2006-10-30 2008-05-14 Applied Materials, Inc. Method for preparing yttria parts and plasma reactor parts comprising yttria
KR101341035B1 (ko) * 2006-10-30 2013-12-12 어플라이드 머티어리얼스, 인코포레이티드 플라즈마 반응기 부품들을 제조하기 위한 방법 및 장치
JP2008174801A (ja) * 2007-01-19 2008-07-31 Covalent Materials Corp プラズマプロセス装置用部材
JP2008260651A (ja) * 2007-04-11 2008-10-30 Nitsukatoo:Kk Ｙ２ｏ３質焼結体
WO2009133638A1 (ja) * 2008-04-28 2009-11-05 株式会社フェローテックセラミックス イットリア焼結体およびプラズマプロセス装置用部材
JP2009263187A (ja) * 2008-04-28 2009-11-12 Ferrotec Ceramics Corp イットリア焼結体およびプラズマプロセス装置用部材
US8158544B2 (en) 2008-04-28 2012-04-17 Ferrotec Ceramics Corporation Yttria sintered body and component used for plasma processing apparatus
KR100998258B1 (ko) * 2009-09-29 2010-12-03 (주)에스에이치이씨 산화이트륨 소성체 및 그 제조방법
JP2012214319A (ja) * 2011-03-31 2012-11-08 Covalent Materials Corp 透光性セラミックス及びその製造方法
KR101338090B1 (ko) * 2012-07-27 2014-01-20 경상대학교산학협력단 용융 이트리아를 출발물질로 이용하여 상압 소결한 고밀도 이트리아 세라믹 소결체의 제조방법

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