JP2004269350A5 - - Google Patents

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Publication number
JP2004269350A5
JP2004269350A5 JP2004036986A JP2004036986A JP2004269350A5 JP 2004269350 A5 JP2004269350 A5 JP 2004269350A5 JP 2004036986 A JP2004036986 A JP 2004036986A JP 2004036986 A JP2004036986 A JP 2004036986A JP 2004269350 A5 JP2004269350 A5 JP 2004269350A5
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JP
Japan
Prior art keywords
sintered body
raw material
average crystal
fired
crystals
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004036986A
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English (en)
Japanese (ja)
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JP2004269350A (ja
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Publication date
Application filed filed Critical
Priority to JP2004036986A priority Critical patent/JP2004269350A/ja
Priority claimed from JP2004036986A external-priority patent/JP2004269350A/ja
Publication of JP2004269350A publication Critical patent/JP2004269350A/ja
Publication of JP2004269350A5 publication Critical patent/JP2004269350A5/ja
Pending legal-status Critical Current

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JP2004036986A 2003-02-17 2004-02-13 Ｙ２ｏ３焼結体及びその製造方法 Pending JP2004269350A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004036986A JP2004269350A (ja) 2003-02-17 2004-02-13 Ｙ２ｏ３焼結体及びその製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003037836 2003-02-17
JP2004036986A JP2004269350A (ja) 2003-02-17 2004-02-13 Ｙ２ｏ３焼結体及びその製造方法

Publications (2)

Publication Number Publication Date
JP2004269350A JP2004269350A (ja) 2004-09-30
JP2004269350A5 true JP2004269350A5 (enrdf_load_stackoverflow) 2005-11-04

Family

ID=33134018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004036986A Pending JP2004269350A (ja) 2003-02-17 2004-02-13 Ｙ２ｏ３焼結体及びその製造方法

Country Status (1)

Country Link
JP (1) JP2004269350A (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4798693B2 (ja) * 2004-06-07 2011-10-19 コバレントマテリアル株式会社 プラズマ処理装置用イットリアセラミックス部品及びその製造方法
US7964818B2 (en) 2006-10-30 2011-06-21 Applied Materials, Inc. Method and apparatus for photomask etching
US7919722B2 (en) * 2006-10-30 2011-04-05 Applied Materials, Inc. Method for fabricating plasma reactor parts
JP4811946B2 (ja) * 2007-01-19 2011-11-09 コバレントマテリアル株式会社 プラズマプロセス装置用部材
JP5134280B2 (ja) * 2007-04-11 2013-01-30 株式会社ニッカトー Ｙ２ｏ３質焼結体
JP5466831B2 (ja) * 2008-04-28 2014-04-09 株式会社フェローテックセラミックス イットリア焼結体およびプラズマプロセス装置用部材
KR100998258B1 (ko) * 2009-09-29 2010-12-03 (주)에스에이치이씨 산화이트륨 소성체 및 그 제조방법
JP5458053B2 (ja) * 2011-03-31 2014-04-02 コバレントマテリアル株式会社 透光性セラミックス及びその製造方法
KR101338090B1 (ko) * 2012-07-27 2014-01-20 경상대학교산학협력단 용융 이트리아를 출발물질로 이용하여 상압 소결한 고밀도 이트리아 세라믹 소결체의 제조방법

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