JP2004247293A - プラズマによる強力短波放射線の発生装置 - Google Patents

プラズマによる強力短波放射線の発生装置 Download PDF

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Publication number
JP2004247293A
JP2004247293A JP2004012104A JP2004012104A JP2004247293A JP 2004247293 A JP2004247293 A JP 2004247293A JP 2004012104 A JP2004012104 A JP 2004012104A JP 2004012104 A JP2004012104 A JP 2004012104A JP 2004247293 A JP2004247293 A JP 2004247293A
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Japan
Prior art keywords
target
radiation
orifices
nozzle
jet
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JP2004012104A
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Japanese (ja)
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JP2004247293A5 (enExample
Inventor
Christian Ziener
ツィーナー クリスチアン
Kai Gaebel
ゲーベル カイ
Guido Hergenhan
ヘルゲンハン グイード
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Xtreme Technologies GmbH
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Xtreme Technologies GmbH
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Publication of JP2004247293A publication Critical patent/JP2004247293A/ja
Publication of JP2004247293A5 publication Critical patent/JP2004247293A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0023—Constructional details of the ejection system

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Plasma Technology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004012104A 2003-02-13 2004-01-20 プラズマによる強力短波放射線の発生装置 Pending JP2004247293A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10306668A DE10306668B4 (de) 2003-02-13 2003-02-13 Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Plasmas

Publications (2)

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JP2004247293A true JP2004247293A (ja) 2004-09-02
JP2004247293A5 JP2004247293A5 (enExample) 2005-08-04

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ID=32747961

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JP2004012104A Pending JP2004247293A (ja) 2003-02-13 2004-01-20 プラズマによる強力短波放射線の発生装置

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US (1) US6995382B2 (enExample)
JP (1) JP2004247293A (enExample)
DE (1) DE10306668B4 (enExample)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008532293A (ja) * 2005-02-25 2008-08-14 サイマー インコーポレイテッド プレパルスによるレーザ生成プラズマｅｕｖ光源
JP2009537062A (ja) * 2006-05-11 2009-10-22 ジェテック、アクチボラグ 電子衝突ｘ線源のデブリ低減
JP2011515810A (ja) * 2008-03-21 2011-05-19 エーエスエムエル ネザーランズ ビー．ブイ． ターゲット材料、放射源、ｅｕｖリソグラフィ装置およびこれらを用いたデバイス製造方法
JP2012134433A (ja) * 2010-02-19 2012-07-12 Komatsu Ltd 極端紫外光源装置及び極端紫外光の発生方法
US9113540B2 (en) 2010-02-19 2015-08-18 Gigaphoton Inc. System and method for generating extreme ultraviolet light
JP2015536538A (ja) * 2012-10-31 2015-12-21 エーエスエムエル ネザーランズ ビー．ブイ． 放射を発生させるための方法及び装置
US9265136B2 (en) 2010-02-19 2016-02-16 Gigaphoton Inc. System and method for generating extreme ultraviolet light
JP2016511924A (ja) * 2013-02-13 2016-04-21 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． 多重ｘ線ビーム管

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US7928416B2 (en) 2006-12-22 2011-04-19 Cymer, Inc. Laser produced plasma EUV light source
JP2004047517A (ja) * 2002-07-08 2004-02-12 Canon Inc 放射線生成装置、放射線生成方法、露光装置並びに露光方法
DE102004028943B4 (de) * 2004-06-11 2006-10-12 Xtreme Technologies Gmbh Vorrichtung zur zeitlich stabilen Erzeugung von EUV-Strahlung mittels eines laserinduzierten Plasmas
DE102004036441B4 (de) 2004-07-23 2007-07-12 Xtreme Technologies Gmbh Vorrichtung und Verfahren zum Dosieren von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung
CN101002305A (zh) * 2005-01-12 2007-07-18 株式会社尼康 激光等离子euv光源、靶材构件、胶带构件、靶材构件的制造方法、靶材的提供方法以及euv曝光装置
DE102005014433B3 (de) * 2005-03-24 2006-10-05 Xtreme Technologies Gmbh Verfahren und Anordnung zur effizienten Erzeugung von kurzwelliger Strahlung auf Basis eines lasererzeugten Plasmas
US7696492B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
US20090095924A1 (en) * 2007-10-12 2009-04-16 International Business Machines Corporation Electrode design for euv discharge plasma source
DE102010044875A1 (de) * 2010-09-09 2012-03-15 Limo Patentverwaltung Gmbh & Co. Kg Beleuchtungsvorrichtung zur Erzeugung einer linienförmigen Intensitätsverteilung in einer Arbeitsebene
CN105511231B (zh) * 2014-10-16 2019-03-29 中芯国际集成电路制造(上海)有限公司 Euv光源和曝光装置
CN105573060B (zh) * 2014-10-16 2017-12-01 中芯国际集成电路制造(上海)有限公司 Euv光源和曝光装置、校准装置和校准方法
CN105573061B (zh) * 2014-10-16 2018-03-06 中芯国际集成电路制造(上海)有限公司 Euv光源和曝光装置
CN105573062B (zh) * 2014-10-17 2018-03-09 中芯国际集成电路制造(上海)有限公司 Euv光源和曝光装置
CN106324997B (zh) * 2015-06-26 2018-03-30 中芯国际集成电路制造(上海)有限公司 Euv光源、曝光装置和一体式旋转结构制作方法
US10338475B2 (en) 2017-11-20 2019-07-02 Taiwan Semiconductor Manufacturing Co., Ltd. Light source for lithography exposure process
US10473599B2 (en) 2017-12-01 2019-11-12 Bruker Axs Gmbh X-ray source using electron impact excitation of high velocity liquid metal beam
US11237483B2 (en) * 2020-06-15 2022-02-01 Taiwan Semiconductor Manufacturing Co., Ltd. Method and apparatus for controlling droplet in extreme ultraviolet light source
CN119781000B (zh) * 2025-03-12 2025-05-23 中国工程物理研究院激光聚变研究中心 一种入射icf靶丸x射线辐射流的原位测量方法及装置

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EP0186491B1 (en) 1984-12-26 1992-06-17 Kabushiki Kaisha Toshiba Apparatus for producing soft x-rays using a high energy beam
US4826084A (en) * 1986-09-26 1989-05-02 Wallace Norman R Sheathed jet fluid dispersing apparatus
US5577092A (en) * 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
SE510133C2 (sv) 1996-04-25 1999-04-19 Jettec Ab Laser-plasma röntgenkälla utnyttjande vätskor som strålmål
US6133577A (en) * 1997-02-04 2000-10-17 Advanced Energy Systems, Inc. Method and apparatus for producing extreme ultra-violet light for use in photolithography
FR2799667B1 (fr) * 1999-10-18 2002-03-08 Commissariat Energie Atomique Procede et dispositif de generation d'un brouillard dense de gouttelettes micrometriques et submicrometriques, application a la generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie
US6469310B1 (en) * 1999-12-17 2002-10-22 Asml Netherlands B.V. Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus
US6661018B1 (en) * 2000-04-25 2003-12-09 Northrop Grumman Corporation Shroud nozzle for gas jet control in an extreme ultraviolet light source
US6711233B2 (en) * 2000-07-28 2004-03-23 Jettec Ab Method and apparatus for generating X-ray or EUV radiation
US6324256B1 (en) * 2000-08-23 2001-11-27 Trw Inc. Liquid sprays as the target for a laser-plasma extreme ultraviolet light source
US6760406B2 (en) * 2000-10-13 2004-07-06 Jettec Ab Method and apparatus for generating X-ray or EUV radiation
US6657213B2 (en) * 2001-05-03 2003-12-02 Northrop Grumman Corporation High temperature EUV source nozzle
US6744851B2 (en) * 2002-05-31 2004-06-01 Northrop Grumman Corporation Linear filament array sheet for EUV production

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008532293A (ja) * 2005-02-25 2008-08-14 サイマー インコーポレイテッド プレパルスによるレーザ生成プラズマｅｕｖ光源
JP2009537062A (ja) * 2006-05-11 2009-10-22 ジェテック、アクチボラグ 電子衝突ｘ線源のデブリ低減
JP2011515810A (ja) * 2008-03-21 2011-05-19 エーエスエムエル ネザーランズ ビー．ブイ． ターゲット材料、放射源、ｅｕｖリソグラフィ装置およびこれらを用いたデバイス製造方法
US9497842B2 (en) 2010-02-19 2016-11-15 Gigaphoton Inc. System and method for generating extreme ultraviolet light
US9113540B2 (en) 2010-02-19 2015-08-18 Gigaphoton Inc. System and method for generating extreme ultraviolet light
US9167678B2 (en) 2010-02-19 2015-10-20 Gigaphoton Inc. System and method for generating extreme ultraviolet light
US9265136B2 (en) 2010-02-19 2016-02-16 Gigaphoton Inc. System and method for generating extreme ultraviolet light
JP2012134433A (ja) * 2010-02-19 2012-07-12 Komatsu Ltd 極端紫外光源装置及び極端紫外光の発生方法
KR101753163B1 (ko) * 2010-02-19 2017-07-03 기가포톤 가부시키가이샤 극단 자외 광원 장치 및 극단 자외 광의 발생 방법
US9877378B2 (en) 2010-02-19 2018-01-23 Gigaphoton Inc. System and method for generating extreme ultraviolet light
US10117317B2 (en) 2010-02-19 2018-10-30 Gigaphoton Inc. System and method for generating extreme ultraviolet light
US10251255B2 (en) 2010-02-19 2019-04-02 Gigaphoton Inc. System and method for generating extreme ultraviolet light
US10306743B1 (en) 2010-02-19 2019-05-28 Gigaphoton Inc. System and method for generating extreme ultraviolet light
JP2015536538A (ja) * 2012-10-31 2015-12-21 エーエスエムエル ネザーランズ ビー．ブイ． 放射を発生させるための方法及び装置
JP2016511924A (ja) * 2013-02-13 2016-04-21 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． 多重ｘ線ビーム管

Also Published As

Publication number Publication date
US20040159802A1 (en) 2004-08-19
DE10306668A1 (de) 2004-08-26
DE10306668B4 (de) 2009-12-10
US6995382B2 (en) 2006-02-07

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