JP2009537062A - 電子衝突x線源のデブリ低減 - Google Patents
電子衝突x線源のデブリ低減 Download PDFInfo
- Publication number
- JP2009537062A JP2009537062A JP2009509487A JP2009509487A JP2009537062A JP 2009537062 A JP2009537062 A JP 2009537062A JP 2009509487 A JP2009509487 A JP 2009509487A JP 2009509487 A JP2009509487 A JP 2009509487A JP 2009537062 A JP2009537062 A JP 2009537062A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- target jet
- jet
- target
- ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000009467 reduction Effects 0.000 title description 3
- 238000010894 electron beam technology Methods 0.000 claims abstract description 52
- 230000005855 radiation Effects 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 21
- 230000003993 interaction Effects 0.000 claims abstract description 8
- 239000011344 liquid material Substances 0.000 claims abstract description 7
- 230000001902 propagating effect Effects 0.000 claims abstract 2
- 239000007788 liquid Substances 0.000 claims description 11
- 238000003384 imaging method Methods 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 238000002050 diffraction method Methods 0.000 claims description 3
- 238000001459 lithography Methods 0.000 claims description 3
- 238000002844 melting Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 238000001420 photoelectron spectroscopy Methods 0.000 claims description 2
- 238000004876 x-ray fluorescence Methods 0.000 claims description 2
- 238000003963 x-ray microscopy Methods 0.000 claims description 2
- 239000004020 conductor Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 description 9
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 7
- 229910001338 liquidmetal Inorganic materials 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 238000009607 mammography Methods 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000002583 angiography Methods 0.000 description 2
- 238000002591 computed tomography Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000002784 hot electron Substances 0.000 description 2
- 230000005461 Bremsstrahlung Effects 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 231100000987 absorbed dose Toxicity 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000010420 art technique Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005338 heat storage Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/112—Non-rotating anodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
- G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/08—Targets (anodes) and X-ray converters
- H01J2235/081—Target material
- H01J2235/082—Fluids, e.g. liquids, gases
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- X-Ray Techniques (AREA)
Abstract
Description
Claims (16)
- 出口開口まで圧力下で液体物質を推進させることによって、相互作用領域を通って伝搬するターゲット噴流を形成するステップと、
少なくとも1つの電子ビームを、前記電子ビームが前記ターゲット噴流と相互作用してX線放射を発生するように、前記相互作用領域内のターゲット噴流上に向けるステップと
を含む、X線放射を発生させる方法であって、
前記ターゲット噴流の横方向における前記電子ビームの半値全幅が前記ターゲット噴流の横寸法の約50%以下である、方法。 - 前記電子ビームが前記ターゲット噴流上に線焦点の形で向けられる、請求項1に記載の方法。
- 前記相互作用領域での前記ターゲット噴流の伝搬速度が約20〜60m/秒である、請求項1または2に記載の方法。
- 前記発生したX線放射を前記電子ビームに対してある角度の方向から集めるステップをさらに含む、いずれかの前記請求項に記載の方法。
- 前記発生した放射線が、前記電子ビームに対して直角の方向から集められる、請求項4に記載の方法。
- 前記ターゲット噴流を形成する前記液体物質が導電物質である、いずれかの前記請求項に記載の方法。
- 前記ターゲット噴流を形成する前記液体物質が金属、合金、または低融点合金である、請求項6に記載の方法。
- 前記ターゲット噴流を形成する前記液体物質が、室温および大気圧では液体である極低温ガスまたは物質である、請求項1から5のいずれか一項に記載の方法。
- 前記ターゲット噴流が前記電子ビームのアノードを形成する、前記請求項のいずれか一項に記載の方法。
- 前記発生したX線放射を画像化に用いるステップをさらに含む、前記請求項のいずれか一項に記載の方法。
- 前記発生したX線放射をX線顕微鏡検査に用いるステップをさらに含む、請求項1から9のいずれか一項に記載の方法。
- 前記発生したX線放射を近接リソグラフィまたは投影リソグラフィに用いるステップをさらに含む、請求項1から9のいずれか一項に記載の方法。
- 前記発生したX線放射を光電子分光法に用いるステップをさらに含む、請求項1から9のいずれか一項に記載の方法。
- 前記発生したX線放射をX線蛍光発光に用いるステップをさらに含む、請求項1から9のいずれか一項に記載の方法。
- 前記発生したX線放射を結晶学に用いるステップをさらに含む、請求項1から9のいずれか一項に記載の方法。
- 出口開口まで圧力下で液体物質を推進させることによってターゲット噴流を、相互作用領域を通って前記ターゲット噴流が伝搬するように形成する手段と、
少なくとも1つの電子ビームを、前記電子ビームが前記ターゲット噴流と相互作用してX線放射を発生するように、前記相互作用領域内のターゲット噴流上に向ける手段とを含む、X線放射を発生させるシステムであって、
前記ターゲット噴流を形成する前記手段と、少なくとも1つの電子ビームを前記ターゲット噴流上に向ける前記手段とが、前記ターゲット噴流の横方向における前記電子ビームの半値全幅が前記ターゲット噴流の横寸法の約50%以下になるように構成される、システム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0601048A SE530094C2 (sv) | 2006-05-11 | 2006-05-11 | Metod för alstring av röntgenstrålning genom elektronbestrålning av en flytande substans |
SE0601048-2 | 2006-05-11 | ||
PCT/SE2007/000448 WO2007133144A1 (en) | 2006-05-11 | 2007-05-08 | Debris reduction in electron-impact x-ray sources |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009537062A true JP2009537062A (ja) | 2009-10-22 |
JP5220728B2 JP5220728B2 (ja) | 2013-06-26 |
Family
ID=38694151
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009509487A Active JP5220728B2 (ja) | 2006-05-11 | 2007-05-08 | 電子衝突x線源のデブリ低減 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8170179B2 (ja) |
EP (1) | EP2016608B1 (ja) |
JP (1) | JP5220728B2 (ja) |
KR (1) | KR101380847B1 (ja) |
CN (1) | CN101490790B (ja) |
SE (1) | SE530094C2 (ja) |
WO (1) | WO2007133144A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014503960A (ja) * | 2010-12-22 | 2014-02-13 | エクシルム・エービー | X線源での電子ビームの整列および合焦 |
JP2014115286A (ja) * | 2012-12-06 | 2014-06-26 | Bruker Axs Gmbh | 偏向可能な電子ビームを用いるx線装置 |
JP2016511924A (ja) * | 2013-02-13 | 2016-04-21 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | 多重x線ビーム管 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102293061B (zh) | 2009-01-26 | 2014-05-07 | 伊克斯拉姆公司 | X-射线窗口 |
CN104022004B (zh) * | 2009-01-26 | 2016-09-21 | 伊克斯拉姆公司 | X-射线窗口 |
JP2015025759A (ja) * | 2013-07-26 | 2015-02-05 | Hoya株式会社 | 基板検査方法、基板製造方法および基板検査装置 |
JP5889968B2 (ja) * | 2014-07-11 | 2016-03-22 | エクシルム・エービーExcillum AB | X線窓 |
EP3170194B1 (en) | 2014-07-17 | 2019-05-22 | Siemens Healthcare GmbH | Fluid injector for x-ray tubes and method to provide a liquid anode by liquid metal injection |
CN106455285A (zh) * | 2016-11-14 | 2017-02-22 | 上海联影医疗科技有限公司 | 一种靶组件以及具有该靶组件的加速器 |
RU2706713C1 (ru) * | 2019-04-26 | 2019-11-20 | Общество С Ограниченной Ответственностью "Эуф Лабс" | Источник коротковолнового излучения высокой яркости |
EP3525556A1 (en) * | 2018-02-09 | 2019-08-14 | Excillum AB | A method for protecting an x-ray source, and an x-ray source |
US10910188B2 (en) | 2018-07-25 | 2021-02-02 | Varian Medical Systems, Inc. | Radiation anode target systems and methods |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000171600A (ja) * | 1998-12-02 | 2000-06-23 | Mitsubishi Electric Corp | 電磁波発生装置 |
JP2004505421A (ja) * | 2000-07-28 | 2004-02-19 | ジェテック、アクチボラグ | X線またはeuv放射線発生方法および装置 |
JP2004213993A (ja) * | 2002-12-27 | 2004-07-29 | Toyota Macs Inc | 軟x線光源装置 |
JP2004247293A (ja) * | 2003-02-13 | 2004-09-02 | Xtreme Technologies Gmbh | プラズマによる強力短波放射線の発生装置 |
WO2004110112A1 (de) * | 2003-06-11 | 2004-12-16 | Max-Planck-Gesellschaft Zur Förderung De Wissenschaften E.V. | Plasma-basierte erzeugung von röntgenstrahlung mit einem schichtförmigen targetmaterial |
JP2005525687A (ja) * | 2002-05-13 | 2005-08-25 | ジェテック・アクチエボラーグ | 放射線を生じさせる方法および装置 |
JP2005251735A (ja) * | 2004-01-30 | 2005-09-15 | Xtreme Technologies Gmbh | プラズマに基づき軟x線放射線を発生するための方法および装置 |
JP2005534147A (ja) * | 2002-07-23 | 2005-11-10 | ジェテック・アクチエボラーグ | 毛細管チュービング |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL171866B (nl) * | 1951-08-18 | Unilever Nv | Werkwijze ter bereiding van een gedeeltelijk gesulfideerde metallische, op een drager aangebrachte katalysator. | |
US4953191A (en) * | 1989-07-24 | 1990-08-28 | The United States Of America As Represented By The United States Department Of Energy | High intensity x-ray source using liquid gallium target |
US5052034A (en) * | 1989-10-30 | 1991-09-24 | Siemens Aktiengesellschaft | X-ray generator |
DE19905802A1 (de) * | 1999-02-12 | 2000-08-17 | Philips Corp Intellectual Pty | Röntgenröhre |
EP1155419B1 (en) * | 1999-12-20 | 2007-02-14 | Koninklijke Philips Electronics N.V. | "x-ray microscope having an x-ray source for soft x-rays |
US6711233B2 (en) * | 2000-07-28 | 2004-03-23 | Jettec Ab | Method and apparatus for generating X-ray or EUV radiation |
US6760406B2 (en) * | 2000-10-13 | 2004-07-06 | Jettec Ab | Method and apparatus for generating X-ray or EUV radiation |
DE10050811A1 (de) * | 2000-10-13 | 2002-04-18 | Philips Corp Intellectual Pty | Elektronenstrahltransparentes Fenster |
DE10062928A1 (de) * | 2000-12-16 | 2002-06-20 | Philips Corp Intellectual Pty | Röntgenstrahler mit Flüssigmetall-Target |
JP2005520289A (ja) * | 2002-03-08 | 2005-07-07 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 液体金属アノードを有するx線発生装置 |
DE102004015590B4 (de) * | 2004-03-30 | 2008-10-09 | GE Homeland Protection, Inc., Newark | Anodenmodul für eine Flüssigmetallanoden-Röntgenquelle sowie Röntgenstrahler mit einem Anodenmodul |
-
2006
- 2006-05-11 SE SE0601048A patent/SE530094C2/sv not_active IP Right Cessation
-
2007
- 2007-05-08 WO PCT/SE2007/000448 patent/WO2007133144A1/en active Application Filing
- 2007-05-08 JP JP2009509487A patent/JP5220728B2/ja active Active
- 2007-05-08 KR KR1020087030022A patent/KR101380847B1/ko active IP Right Grant
- 2007-05-08 CN CN2007800263170A patent/CN101490790B/zh active Active
- 2007-05-08 US US12/227,230 patent/US8170179B2/en active Active
- 2007-05-08 EP EP07748112.5A patent/EP2016608B1/en active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000171600A (ja) * | 1998-12-02 | 2000-06-23 | Mitsubishi Electric Corp | 電磁波発生装置 |
JP2004505421A (ja) * | 2000-07-28 | 2004-02-19 | ジェテック、アクチボラグ | X線またはeuv放射線発生方法および装置 |
JP2005525687A (ja) * | 2002-05-13 | 2005-08-25 | ジェテック・アクチエボラーグ | 放射線を生じさせる方法および装置 |
JP2005534147A (ja) * | 2002-07-23 | 2005-11-10 | ジェテック・アクチエボラーグ | 毛細管チュービング |
JP2004213993A (ja) * | 2002-12-27 | 2004-07-29 | Toyota Macs Inc | 軟x線光源装置 |
JP2004247293A (ja) * | 2003-02-13 | 2004-09-02 | Xtreme Technologies Gmbh | プラズマによる強力短波放射線の発生装置 |
WO2004110112A1 (de) * | 2003-06-11 | 2004-12-16 | Max-Planck-Gesellschaft Zur Förderung De Wissenschaften E.V. | Plasma-basierte erzeugung von röntgenstrahlung mit einem schichtförmigen targetmaterial |
JP2005251735A (ja) * | 2004-01-30 | 2005-09-15 | Xtreme Technologies Gmbh | プラズマに基づき軟x線放射線を発生するための方法および装置 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014503960A (ja) * | 2010-12-22 | 2014-02-13 | エクシルム・エービー | X線源での電子ビームの整列および合焦 |
US9380690B2 (en) | 2010-12-22 | 2016-06-28 | Excillum Ab | Aligning and focusing an electron beam in an X-ray source |
US9947502B2 (en) | 2010-12-22 | 2018-04-17 | Excillum Ab | Aligning and focusing an electron beam in an X-ray source |
JP2014115286A (ja) * | 2012-12-06 | 2014-06-26 | Bruker Axs Gmbh | 偏向可能な電子ビームを用いるx線装置 |
US10049850B2 (en) | 2012-12-06 | 2018-08-14 | Bruker Axs Gmbh | X-ray apparatus with deflectable electron beam |
JP2016511924A (ja) * | 2013-02-13 | 2016-04-21 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | 多重x線ビーム管 |
Also Published As
Publication number | Publication date |
---|---|
CN101490790A (zh) | 2009-07-22 |
EP2016608A1 (en) | 2009-01-21 |
WO2007133144A1 (en) | 2007-11-22 |
EP2016608A4 (en) | 2014-06-18 |
KR20090024143A (ko) | 2009-03-06 |
SE0601048L (sv) | 2007-11-12 |
US8170179B2 (en) | 2012-05-01 |
CN101490790B (zh) | 2012-05-09 |
EP2016608B1 (en) | 2016-08-17 |
KR101380847B1 (ko) | 2014-04-04 |
SE530094C2 (sv) | 2008-02-26 |
US20090141864A1 (en) | 2009-06-04 |
JP5220728B2 (ja) | 2013-06-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5220728B2 (ja) | 電子衝突x線源のデブリ低減 | |
TWI481315B (zh) | 用於具有熱壁及冷收集器鏡之雷射生成電漿極紫外線腔室的系統、方法與裝置 | |
Hemberg et al. | Liquid-metal-jet anode electron-impact x-ray source | |
JP5149514B2 (ja) | 極端紫外光源装置 | |
JP2011505668A (ja) | レーザ加熱放電プラズマeuv光源 | |
US9852875B2 (en) | X-ray tube | |
US20140369476A1 (en) | Device for generating x-rays having a liquid metal anode | |
JPH10221499A (ja) | レーザプラズマx線源およびそれを用いた半導体露光装置並びに半導体露光方法 | |
US7436931B2 (en) | X-ray source for generating monochromatic x-rays | |
Shields et al. | Xenon target performance characteristics for laser-produced plasma EUV sources | |
US9585236B2 (en) | Sn vapor EUV LLP source system for EUV lithography | |
Vinokhodov et al. | Droplet-based, high-brightness extreme ultraviolet laser plasma source for metrology | |
US9905390B2 (en) | Cooling mechanism for high-brightness X-ray tube using phase change heat exchange | |
Zuo et al. | Results from a new flowing liquid Li limiter with TZM substrate during high confinement plasmas in the EAST device | |
JP4618013B2 (ja) | 極端紫外光光源装置 | |
JP3910468B2 (ja) | 回転陽極型x線管 | |
Ishino et al. | Very low electron temperature in warm dense matter formed by focused picosecond soft x-ray laser pulses | |
Amano | Laser plasma cryogenic target on translating substrate for generation of continuously repetitive EUV and soft X-ray pulses | |
US11330697B2 (en) | Modular laser-produced plasma X-ray system | |
Otendal et al. | Stability and debris in high-brightness liquid-metal-jet-anode microfocus x-ray sources | |
JPWO2018055795A1 (ja) | X線管 | |
Higashiguchi et al. | Development of a liquid tin microjet target for an efficient laser-produced plasma extreme ultraviolet source | |
US6359968B1 (en) | X-ray tube capable of generating and focusing beam on a target | |
JP2008042008A (ja) | 極端紫外光光源装置 | |
Hemberg et al. | Liquid-metal-jet anode x-ray source |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100423 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120330 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120621 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130205 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130306 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20160315 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5220728 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
R360 | Written notification for declining of transfer of rights |
Free format text: JAPANESE INTERMEDIATE CODE: R360 |
|
R360 | Written notification for declining of transfer of rights |
Free format text: JAPANESE INTERMEDIATE CODE: R360 |
|
R371 | Transfer withdrawn |
Free format text: JAPANESE INTERMEDIATE CODE: R371 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |