US6920238B1
(en)
*
|
1996-12-03 |
2005-07-19 |
Synchrotronics, Co. |
Precision imaging system
|
US6539156B1
(en)
*
|
1999-11-02 |
2003-03-25 |
Georgia Tech Research Corporation |
Apparatus and method of optical transfer and control in plasmon supporting metal nanostructures
|
US6285020B1
(en)
|
1999-11-05 |
2001-09-04 |
Nec Research Institute, Inc. |
Enhanced optical transmission apparatus with improved inter-surface coupling
|
US6834027B1
(en)
*
|
2000-02-28 |
2004-12-21 |
Nec Laboratories America, Inc. |
Surface plasmon-enhanced read/write heads for optical data storage media
|
WO2002010830A2
(en)
*
|
2000-07-27 |
2002-02-07 |
Zetetic Institute |
Multiple-source arrays for confocal and near-field microscopy
|
US6441298B1
(en)
*
|
2000-08-15 |
2002-08-27 |
Nec Research Institute, Inc |
Surface-plasmon enhanced photovoltaic device
|
US6818907B2
(en)
|
2000-10-17 |
2004-11-16 |
The President And Fellows Of Harvard College |
Surface plasmon enhanced illumination system
|
US7351374B2
(en)
*
|
2000-10-17 |
2008-04-01 |
President And Fellows Of Harvard College |
Surface plasmon enhanced illumination apparatus having non-periodic resonance configurations
|
JP3525142B2
(ja)
*
|
2001-01-12 |
2004-05-10 |
独立行政法人 科学技術振興機構 |
金属ナノウェルを用いた蛍光分析用素子及びその製造方法
|
WO2002086557A2
(en)
*
|
2001-04-25 |
2002-10-31 |
New Mexico State University Technology Transfer Corporation |
Plasmonic nanophotonics methods, materials, and apparatuses
|
WO2003001869A2
(en)
*
|
2001-06-29 |
2003-01-09 |
California Institute Of Technology |
Method and apparatus for use of plasmon printing in near-field lithography
|
WO2003014711A1
(fr)
*
|
2001-08-07 |
2003-02-20 |
Mitsubishi Chemical Corporation |
Puce de detection a resonance de plasmon de surface et procede et dispositif d'analyse d'echantillon utilisant cette puce
|
US20080099667A1
(en)
*
|
2001-08-14 |
2008-05-01 |
President And Fellows Of Harvard College |
Methods and apparatus for sensing a physical substance
|
US7057151B2
(en)
*
|
2001-08-31 |
2006-06-06 |
Universite Louis Pasteur |
Optical transmission apparatus with directionality and divergence control
|
WO2003042748A1
(en)
*
|
2001-11-10 |
2003-05-22 |
Max-Born-Institute Fut Nichtlineare Optik Und Kurzzeitspektroskopie |
Surface plasmon optic devices and radiating surface plasmon sources for photolithography
|
US7248297B2
(en)
*
|
2001-11-30 |
2007-07-24 |
The Board Of Trustees Of The Leland Stanford Junior University |
Integrated color pixel (ICP)
|
US6975580B2
(en)
|
2001-12-18 |
2005-12-13 |
Interntional Business Machines Corporation |
Optical aperture for data recording having transmission enhanced by waveguide mode resonance
|
US6906305B2
(en)
*
|
2002-01-08 |
2005-06-14 |
Brion Technologies, Inc. |
System and method for aerial image sensing
|
WO2003058304A2
(en)
*
|
2002-01-09 |
2003-07-17 |
Micro Managed Photons A/S |
Light localization structures for guiding electromagnetic waves
|
ES2191565B1
(es)
*
|
2002-02-20 |
2005-02-01 |
Francisco Jav. Mendez Vigo-Barasona |
Sistema colector y concentrador del paso de un haz luminoso a traves de un cuerpo metalico.
|
US6649901B2
(en)
|
2002-03-14 |
2003-11-18 |
Nec Laboratories America, Inc. |
Enhanced optical transmission apparatus with improved aperture geometry
|
US6828542B2
(en)
*
|
2002-06-07 |
2004-12-07 |
Brion Technologies, Inc. |
System and method for lithography process monitoring and control
|
JP4345268B2
(ja)
*
|
2002-07-29 |
2009-10-14 |
日本電気株式会社 |
光モジュール及び光ヘッド並びに光記憶/再生装置
|
JP4261849B2
(ja)
*
|
2002-09-06 |
2009-04-30 |
キヤノン株式会社 |
近接場光を用いた露光方法及び、近接場光を用いる露光装置
|
JP4240966B2
(ja)
*
|
2002-09-06 |
2009-03-18 |
キヤノン株式会社 |
近接場光マスク、これを用いた近接場露光装置、これを用いたドットパターン作製方法
|
JP2004111500A
(ja)
*
|
2002-09-17 |
2004-04-08 |
Canon Inc |
マスク、露光装置及び方法
|
US6807503B2
(en)
*
|
2002-11-04 |
2004-10-19 |
Brion Technologies, Inc. |
Method and apparatus for monitoring integrated circuit fabrication
|
JP2004177806A
(ja)
*
|
2002-11-28 |
2004-06-24 |
Alps Electric Co Ltd |
反射防止構造および照明装置と液晶表示装置並びに反射防止膜成型用金型
|
US7154820B2
(en)
*
|
2003-01-06 |
2006-12-26 |
Nec Corporation |
Optical element for enhanced transmission of light and suppressed increase in temperature
|
US7027689B2
(en)
*
|
2003-01-24 |
2006-04-11 |
Lucent Technologies Inc. |
Optical routers based on surface plasmons
|
US6759297B1
(en)
|
2003-02-28 |
2004-07-06 |
Union Semiconductor Technology Corporatin |
Low temperature deposition of dielectric materials in magnetoresistive random access memory devices
|
US7053355B2
(en)
|
2003-03-18 |
2006-05-30 |
Brion Technologies, Inc. |
System and method for lithography process monitoring and control
|
US20050133879A1
(en)
*
|
2003-04-07 |
2005-06-23 |
Takumi Yamaguti |
Solid-state imaging device, signal processing device, camera, and spectral device
|
JP4018591B2
(ja)
*
|
2003-05-12 |
2007-12-05 |
キヤノン株式会社 |
近接場光露光用フォトマスク、該フォトマスクを用いた近接場光強度分布の制御方法、パターン作製方法
|
CN100549819C
(zh)
*
|
2003-05-29 |
2009-10-14 |
中国科学院光电技术研究所 |
金属掩模板
|
CN100580557C
(zh)
*
|
2003-05-29 |
2010-01-13 |
中国科学院光电技术研究所 |
一般波长或长波长光接触接近纳米光刻光学装置
|
JP2005016963A
(ja)
*
|
2003-06-23 |
2005-01-20 |
Canon Inc |
化学センサ、化学センサ装置
|
JP4194516B2
(ja)
*
|
2003-06-24 |
2008-12-10 |
キヤノン株式会社 |
露光方法、露光用マスク及びデバイスの製造方法
|
TWI266305B
(en)
|
2003-06-26 |
2006-11-11 |
Ind Tech Res Inst |
An optical head which can provide a sub-wavelength-scale light beam
|
DE10328949A1
(de)
*
|
2003-06-27 |
2005-01-13 |
Arno Friedrichs |
Hüftgelenkendoprothese
|
US7420156B2
(en)
*
|
2003-08-06 |
2008-09-02 |
University Of Pittsburgh |
Metal nanowire based bandpass filter arrays in the optical frequency range
|
KR20060130543A
(ko)
*
|
2003-08-06 |
2006-12-19 |
유니버시티 오브 피츠버그 오브 더 커먼웰쓰 시스템 오브 하이어 에듀케이션 |
표면 플라즈몬-강화 나노-광 소자 및 그의 제조 방법
|
JP4217570B2
(ja)
*
|
2003-09-12 |
2009-02-04 |
キヤノン株式会社 |
近接場光源装置、該近接場光源装置を有する光ヘッド、光学装置、露光装置、顕微鏡装置
|
WO2005029164A1
(ja)
*
|
2003-09-18 |
2005-03-31 |
Nec Corporation |
光学素子
|
US20070253051A1
(en)
*
|
2003-09-29 |
2007-11-01 |
Kunihiko Ishihara |
Optical Device
|
EP1721194A4
(en)
*
|
2003-12-05 |
2010-01-13 |
Univ Pittsburgh |
NANO-OPTICAL METAL LENSES AND BEAMFORMING DEVICES
|
KR100682887B1
(ko)
*
|
2004-01-30 |
2007-02-15 |
삼성전자주식회사 |
나노구조 형성방법
|
JP5094385B2
(ja)
*
|
2004-03-22 |
2012-12-12 |
リサーチ ファウンデーション オブ ザ シティー ユニバーシティ オブ ニューヨーク |
高応答性高帯域金属−半導体−金属光電デバイス
|
KR100853067B1
(ko)
*
|
2004-04-05 |
2008-08-19 |
닛본 덴끼 가부시끼가이샤 |
포토 다이오드와 그 제조 방법
|
US7054528B2
(en)
*
|
2004-04-14 |
2006-05-30 |
Lucent Technologies Inc. |
Plasmon-enhanced tapered optical fibers
|
US7682755B2
(en)
*
|
2004-04-16 |
2010-03-23 |
Riken |
Lithography mask and optical lithography method using surface plasmon
|
JP4572406B2
(ja)
*
|
2004-04-16 |
2010-11-04 |
独立行政法人理化学研究所 |
リソグラフィーマスク
|
US7012687B2
(en)
*
|
2004-05-04 |
2006-03-14 |
Lucent Technologies Inc. |
Spectral analysis with evanescent field excitation
|
CN100498524C
(zh)
*
|
2004-05-24 |
2009-06-10 |
中国科学院光电技术研究所 |
不刻透金属掩模板及其应用
|
US7301263B2
(en)
*
|
2004-05-28 |
2007-11-27 |
Applied Materials, Inc. |
Multiple electron beam system with electron transmission gates
|
US7110154B2
(en)
*
|
2004-06-10 |
2006-09-19 |
Clemson University |
Plasmon-photon coupled optical devices
|
GB0413082D0
(en)
*
|
2004-06-11 |
2004-07-14 |
Medical Biosystems Ltd |
Method
|
JP4531466B2
(ja)
*
|
2004-07-07 |
2010-08-25 |
株式会社リコー |
光伝送装置
|
JP4399328B2
(ja)
|
2004-07-23 |
2010-01-13 |
富士ゼロックス株式会社 |
近接場光出射素子、光ヘッド、および近接場光出射素子の製造方法
|
US7426040B2
(en)
|
2004-08-19 |
2008-09-16 |
University Of Pittsburgh |
Chip-scale optical spectrum analyzers with enhanced resolution
|
US7538357B2
(en)
*
|
2004-08-20 |
2009-05-26 |
Panasonic Corporation |
Semiconductor light emitting device
|
JP4711657B2
(ja)
*
|
2004-09-29 |
2011-06-29 |
パナソニック株式会社 |
固体撮像装置
|
JP2008525838A
(ja)
*
|
2004-12-22 |
2008-07-17 |
コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ |
放射状偏向放射線を用いた、小開口を通る光の透過性を向上させる機器および方法
|
US7453645B2
(en)
*
|
2004-12-30 |
2008-11-18 |
Asml Netherlands B.V. |
Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
|
DE102005001671B4
(de)
*
|
2005-01-13 |
2010-06-10 |
Qimonda Ag |
Photolithographieanordnung
|
US7668364B2
(en)
*
|
2005-04-26 |
2010-02-23 |
Hitachi Via Mechanics, Ltd. |
Inspection method and apparatus for partially drilled microvias
|
JP2007003969A
(ja)
|
2005-06-27 |
2007-01-11 |
Japan Aviation Electronics Industry Ltd |
光学素子
|
US7149395B1
(en)
|
2005-08-09 |
2006-12-12 |
Instrument Technology Research Center |
Light-enhancing component and fabrication method thereof
|
US7586583B2
(en)
|
2005-09-15 |
2009-09-08 |
Franklin Mark Schellenberg |
Nanolithography system
|
JP4877910B2
(ja)
*
|
2005-10-17 |
2012-02-15 |
シャープ株式会社 |
近接場発生装置、及び露光装置
|
KR100778887B1
(ko)
|
2006-01-18 |
2007-11-22 |
재단법인서울대학교산학협력재단 |
형태 공진 테라파 또는 적외선 필터
|
US20070172745A1
(en)
*
|
2006-01-26 |
2007-07-26 |
Smith Bruce W |
Evanescent wave assist features for microlithography
|
JP2007225767A
(ja)
*
|
2006-02-22 |
2007-09-06 |
Nec Corp |
受光装置
|
JPWO2007105593A1
(ja)
|
2006-03-13 |
2009-07-30 |
日本電気株式会社 |
フォトダイオード、およびその製造方法、ならびに光通信デバイスおよび光インタコネクションモジュール
|
US8053853B2
(en)
|
2006-05-03 |
2011-11-08 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Color filter-embedded MSM image sensor
|
FR2902226B1
(fr)
*
|
2006-06-12 |
2010-01-29 |
Commissariat Energie Atomique |
Composant optique fonctionnant en transmission en champ proche
|
US8482197B2
(en)
*
|
2006-07-05 |
2013-07-09 |
Hamamatsu Photonics K.K. |
Photocathode, electron tube, field assist type photocathode, field assist type photocathode array, and field assist type electron tube
|
JP4805043B2
(ja)
*
|
2006-07-05 |
2011-11-02 |
浜松ホトニクス株式会社 |
光電陰極、光電陰極アレイ、および電子管
|
WO2008030666A2
(en)
*
|
2006-07-25 |
2008-03-13 |
The Board Of Trustees Of The University Of Illinois |
Multispectral plasmonic crystal sensors
|
US7605908B2
(en)
*
|
2006-10-03 |
2009-10-20 |
Canon Kabushiki Kaisha |
Near-field exposure mask, near-field exposure apparatus, and near-field exposure method
|
US20110019189A1
(en)
*
|
2008-08-06 |
2011-01-27 |
Research Foundation Of The City University Of New York |
Sub-wavelength structures, devices and methods for light control in material composites
|
EP2171506A4
(en)
*
|
2006-12-08 |
2012-01-18 |
Univ City New York Res Found |
DEVICES AND METHODS FOR LIGHT ADJUSTMENT IN COMPOSITE MATERIALS
|
US20100200941A1
(en)
|
2006-12-20 |
2010-08-12 |
Junichi Fujikata |
Photodiode, optical communication device, and optical interconnection module
|
US8274739B2
(en)
|
2006-12-29 |
2012-09-25 |
Nanolambda, Inc. |
Plasmonic fabry-perot filter
|
US20100046077A1
(en)
*
|
2006-12-29 |
2010-02-25 |
Nanolambda Inc. |
Wavelength selective metallic embossing nanostructure
|
US8462420B2
(en)
*
|
2006-12-29 |
2013-06-11 |
Nanolambda, Inc. |
Tunable plasmonic filter
|
JP2008177191A
(ja)
*
|
2007-01-16 |
2008-07-31 |
Matsushita Electric Ind Co Ltd |
固体撮像装置およびそれを用いたカメラ
|
US8054371B2
(en)
|
2007-02-19 |
2011-11-08 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Color filter for image sensor
|
JPWO2008136479A1
(ja)
|
2007-05-01 |
2010-07-29 |
日本電気株式会社 |
導波路結合型フォトダイオード
|
TWI372885B
(en)
*
|
2007-06-06 |
2012-09-21 |
Univ Nat Cheng Kung |
Electromagnetic wave propagating structure
|
JP4621270B2
(ja)
|
2007-07-13 |
2011-01-26 |
キヤノン株式会社 |
光学フィルタ
|
JP4986763B2
(ja)
*
|
2007-08-09 |
2012-07-25 |
日本航空電子工業株式会社 |
表面プラズモン素子
|
US8518633B2
(en)
*
|
2008-01-22 |
2013-08-27 |
Rolith Inc. |
Large area nanopatterning method and apparatus
|
JP4995231B2
(ja)
*
|
2008-05-30 |
2012-08-08 |
キヤノン株式会社 |
光学フィルタ
|
JP5136249B2
(ja)
*
|
2008-07-11 |
2013-02-06 |
三菱電機株式会社 |
光学フィルター
|
JP5136250B2
(ja)
*
|
2008-07-11 |
2013-02-06 |
三菱電機株式会社 |
光学フィルターの製造方法
|
US8218226B2
(en)
*
|
2008-08-15 |
2012-07-10 |
Corning Incorporated |
Surface-plasmon-based optical modulator
|
CN102132213B
(zh)
*
|
2008-08-29 |
2014-04-16 |
Asml荷兰有限公司 |
光谱纯度滤光片、包括这样的光谱纯度滤光片的光刻设备以及器件制造方法
|
EP2377165A2
(en)
*
|
2008-12-17 |
2011-10-19 |
Research Foundation Of The City University Of New York |
Semiconductor devices comprising antireflective conductive layers and methods of making and using
|
US9021611B2
(en)
*
|
2009-02-18 |
2015-04-28 |
Northwestern University |
Beam pen lithography
|
WO2010110415A1
(ja)
*
|
2009-03-27 |
2010-09-30 |
株式会社村田製作所 |
被測定物の特性を測定する方法、回折現象を伴う構造体および測定装置
|
JP5878120B2
(ja)
*
|
2009-08-14 |
2016-03-08 |
エーエスエムエル ネザーランズ ビー.ブイ. |
Euv放射システムおよびリソグラフィ装置
|
CN102014535A
(zh)
*
|
2009-09-07 |
2011-04-13 |
复旦大学 |
具有增强和定向发射发光物质发光的结构
|
US20120182537A1
(en)
*
|
2009-09-23 |
2012-07-19 |
Asml Netherlands B.V. |
Spectral purity filter, lithographic apparatus, and device manufacturing method
|
KR101338117B1
(ko)
*
|
2009-10-29 |
2013-12-06 |
엘지디스플레이 주식회사 |
액정표시장치 및 그 제조방법
|
KR101649696B1
(ko)
*
|
2009-10-29 |
2016-08-22 |
엘지디스플레이 주식회사 |
프린지 필드형 액정표시장치 및 그 제조방법
|
KR101640814B1
(ko)
*
|
2009-10-30 |
2016-07-20 |
엘지디스플레이 주식회사 |
표면 플라즈몬을 이용한 컬러필터 및 액정표시장치
|
US9372241B2
(en)
*
|
2009-11-06 |
2016-06-21 |
Headway Technologies, Inc. |
Multi-directional pin anneal of MR sensors with plasmon heating
|
US8039292B2
(en)
|
2009-11-18 |
2011-10-18 |
International Business Machines Corporation |
Holey electrode grids for photovoltaic cells with subwavelength and superwavelength feature sizes
|
KR101274591B1
(ko)
*
|
2009-12-18 |
2013-06-13 |
엘지디스플레이 주식회사 |
표면 플라즈몬을 이용한 컬러필터와 액정표시장치 및 그 제조방법
|
KR101313654B1
(ko)
*
|
2009-12-18 |
2013-10-02 |
엘지디스플레이 주식회사 |
표면 플라즈몬을 이용한 컬러필터와 액정표시장치 및 그 제조방법
|
KR101272052B1
(ko)
*
|
2009-12-18 |
2013-06-05 |
엘지디스플레이 주식회사 |
표면 플라즈몬을 이용한 컬러필터 및 액정표시장치의 제조방법
|
US8731359B2
(en)
*
|
2009-12-30 |
2014-05-20 |
Cornell University |
Extraordinary light transmission apparatus and method
|
AU2011205582A1
(en)
*
|
2010-01-12 |
2012-08-30 |
Rolith, Inc. |
Nanopatterning method and apparatus
|
US8895235B2
(en)
*
|
2010-03-02 |
2014-11-25 |
National University Corporation Hokkaido University |
Process for production of photoresist pattern
|
KR101640818B1
(ko)
*
|
2010-04-29 |
2016-07-19 |
엘지디스플레이 주식회사 |
표면 플라즈몬을 이용한 편광 컬러필터 및 이를 구비한 액정표시장치
|
US20110300473A1
(en)
*
|
2010-06-04 |
2011-12-08 |
Lightware Power, Inc. |
Method for nanopatterning using nanomasks and light exposure
|
JP5900970B2
(ja)
*
|
2011-01-26 |
2016-04-06 |
独立行政法人国立高等専門学校機構 |
表面プラズモンセンサ、及び屈折率の測定方法
|
US8779483B2
(en)
*
|
2011-02-07 |
2014-07-15 |
Aptina Imaging Corporation |
Spectrally tuned plasmonic light collectors
|
JP6145861B2
(ja)
*
|
2012-08-15 |
2017-06-14 |
富士フイルム株式会社 |
光電場増強デバイス、光測定装置および方法
|
CN102798906A
(zh)
*
|
2012-09-11 |
2012-11-28 |
南京大学 |
双宽带近红外吸收器
|
WO2014070444A1
(en)
|
2012-10-29 |
2014-05-08 |
Northwestern University |
Heat actuated and projected lithography systems and methods
|
CN102902004B
(zh)
*
|
2012-11-01 |
2015-05-20 |
沈阳仪表科学研究院 |
环形双向渐深变密度片
|
US9627434B2
(en)
|
2013-01-04 |
2017-04-18 |
California Institute Of Technology |
System and method for color imaging with integrated plasmonic color filters
|
JP5991426B2
(ja)
*
|
2013-03-25 |
2016-09-14 |
株式会社村田製作所 |
空隙配置構造体およびそれを用いた測定方法
|
US9111830B1
(en)
*
|
2013-05-22 |
2015-08-18 |
Sensors Unlimited, Inc. |
Perforated blocking layer for enhanced broad band response in a focal plane array
|
CN104518835B
(zh)
*
|
2013-10-08 |
2019-07-23 |
中兴通讯股份有限公司 |
一种可见光通信mimo系统的接收装置
|
JP6320768B2
(ja)
*
|
2014-01-30 |
2018-05-09 |
国立大学法人 東京大学 |
光学素子
|
US10050075B2
(en)
*
|
2014-11-21 |
2018-08-14 |
Lumilant, Inc. |
Multi-layer extraordinary optical transmission filter systems, devices, and methods
|
JP6967006B2
(ja)
|
2016-01-15 |
2021-11-17 |
クアンタポール, インコーポレイテッド |
低減されたバックグラウンドの光学に基づくナノポア分析
|
US9749044B1
(en)
*
|
2016-04-05 |
2017-08-29 |
Facebook, Inc. |
Luminescent detector for free-space optical communication
|
CN108345054B
(zh)
*
|
2016-04-29 |
2020-10-20 |
蚌埠翰邦知识产权服务有限公司 |
一种滤波方法
|
WO2018008029A1
(en)
*
|
2016-07-07 |
2018-01-11 |
Bar-Ilan University |
Micron-size plasmonic color sorter
|
CN106441565B
(zh)
*
|
2016-09-09 |
2019-11-12 |
扬中市恒海电子科技有限公司 |
一种集成式带通滤波器及其制造方法和光谱仪
|
CN108615737A
(zh)
*
|
2016-12-11 |
2018-10-02 |
南京理工大学 |
制作在透明基材上的可提高光传感器灵敏度的结构及应用
|
CN107179571A
(zh)
*
|
2017-05-27 |
2017-09-19 |
中国科学院上海技术物理研究所 |
一种可见到红外宽带吸收器及其制备方法
|
US11067507B2
(en)
*
|
2017-06-01 |
2021-07-20 |
Versitech Limited |
Sensors with gradient nanostructures and associated method of use
|
CN107894625A
(zh)
*
|
2017-09-29 |
2018-04-10 |
扬中市恒海电子科技有限公司 |
一种集成式红外带通滤波器及其制造方法和光谱仪
|
US10381397B2
(en)
*
|
2017-11-14 |
2019-08-13 |
Black Sesame International Holding Limited |
Nano metallic planar apex optical detector
|
JP7140327B2
(ja)
*
|
2018-07-17 |
2022-09-21 |
国立大学法人京都大学 |
波長変換装置及び光源装置
|
CN110058341A
(zh)
*
|
2019-04-23 |
2019-07-26 |
Oppo广东移动通信有限公司 |
一种彩色滤波片和cis制备方法
|
CN110112159A
(zh)
*
|
2019-05-13 |
2019-08-09 |
德淮半导体有限公司 |
图像传感器及其形成方法
|
CN112384749B
(zh)
|
2020-03-13 |
2022-08-19 |
长江存储科技有限责任公司 |
用于半导体芯片孔几何形状度量的系统和方法
|
JP7159260B2
(ja)
*
|
2020-10-30 |
2022-10-24 |
ナノフォーム フィンランド オサケユイチアユルキネン |
表面構造及び表面下構造の特性を決定する装置及び方法
|
CN112630878B
(zh)
*
|
2021-01-12 |
2022-03-22 |
西安电子科技大学 |
基于纳米孔阵列结构的滤光片
|
CN114265215A
(zh)
*
|
2021-12-29 |
2022-04-01 |
杭州电子科技大学 |
一种基于光学异常透射的伪相位共轭逆向调制器
|
US20240085597A1
(en)
*
|
2022-09-12 |
2024-03-14 |
SunDensity, Inc. |
System and method for plasmonic spectral conversion using nano-holes and nano-disks
|