JP2004059421A5 - - Google Patents
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- JP2004059421A5 JP2004059421A5 JP2003156476A JP2003156476A JP2004059421A5 JP 2004059421 A5 JP2004059421 A5 JP 2004059421A5 JP 2003156476 A JP2003156476 A JP 2003156476A JP 2003156476 A JP2003156476 A JP 2003156476A JP 2004059421 A5 JP2004059421 A5 JP 2004059421A5
- Authority
- JP
- Japan
- Prior art keywords
- silica
- zinc oxide
- coated zinc
- containing powder
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 220
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 202
- 239000000377 silicon dioxide Substances 0.000 description 110
- 239000011787 zinc oxide Substances 0.000 description 101
- 239000000843 powder Substances 0.000 description 62
- 239000010419 fine particle Substances 0.000 description 30
- 238000000034 method Methods 0.000 description 30
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 20
- 239000003795 chemical substances by application Substances 0.000 description 17
- 239000000203 mixture Substances 0.000 description 16
- 239000002245 particle Substances 0.000 description 16
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 16
- -1 alkoxysilanes Substances 0.000 description 14
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 13
- 235000012239 silicon dioxide Nutrition 0.000 description 12
- 239000011164 primary particle Substances 0.000 description 11
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 11
- 230000009102 absorption Effects 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 10
- 229920000620 organic polymer Polymers 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 239000002994 raw material Substances 0.000 description 9
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- 238000005259 measurement Methods 0.000 description 6
- 229920005992 thermoplastic resin Polymers 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000006087 Silane Coupling Agent Substances 0.000 description 4
- 238000000862 absorption spectrum Methods 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 238000005562 fading Methods 0.000 description 4
- 239000000194 fatty acid Substances 0.000 description 4
- 229930195729 fatty acid Natural products 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- 229920002545 silicone oil Polymers 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 238000002835 absorbance Methods 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 238000006701 autoxidation reaction Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000004587 chromatography analysis Methods 0.000 description 3
- 239000011362 coarse particle Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 230000001699 photocatalysis Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 239000012773 agricultural material Substances 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000004566 building material Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000002537 cosmetic Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000010985 leather Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- 239000002759 woven fabric Substances 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- 239000004594 Masterbatch (MB) Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- GAURFLBIDLSLQU-UHFFFAOYSA-N diethoxy(methyl)silicon Chemical compound CCO[Si](C)OCC GAURFLBIDLSLQU-UHFFFAOYSA-N 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- XVSBWQYHSLNOCU-UHFFFAOYSA-N ethenyl(dimethyl)silicon Chemical compound C[Si](C)C=C XVSBWQYHSLNOCU-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- JEWCZPTVOYXPGG-UHFFFAOYSA-N ethenyl-ethoxy-dimethylsilane Chemical compound CCO[Si](C)(C)C=C JEWCZPTVOYXPGG-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- DRUOQOFQRYFQGB-UHFFFAOYSA-N ethoxy(dimethyl)silicon Chemical compound CCO[Si](C)C DRUOQOFQRYFQGB-UHFFFAOYSA-N 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Chemical group 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 238000010902 jet-milling Methods 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 150000004812 organic fluorine compounds Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- ZMYXZXUHYAGGKG-UHFFFAOYSA-N propoxysilane Chemical compound CCCO[SiH3] ZMYXZXUHYAGGKG-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003156476A JP4582439B2 (ja) | 2002-06-05 | 2003-06-02 | シリカ被覆酸化亜鉛含有粉末、それを含有する有機重合体組成物およびその成形品 |
| TW92115283A TW200401012A (en) | 2002-06-05 | 2003-06-05 | Powder comprising silica-coated zinc oxide, organic polymer composition containing the same and shaped article thereof |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002164865 | 2002-06-05 | ||
| JP2003156476A JP4582439B2 (ja) | 2002-06-05 | 2003-06-02 | シリカ被覆酸化亜鉛含有粉末、それを含有する有機重合体組成物およびその成形品 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004059421A JP2004059421A (ja) | 2004-02-26 |
| JP2004059421A5 true JP2004059421A5 (https=) | 2006-07-20 |
| JP4582439B2 JP4582439B2 (ja) | 2010-11-17 |
Family
ID=31949361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003156476A Expired - Fee Related JP4582439B2 (ja) | 2002-06-05 | 2003-06-02 | シリカ被覆酸化亜鉛含有粉末、それを含有する有機重合体組成物およびその成形品 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP4582439B2 (https=) |
| TW (1) | TW200401012A (https=) |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006077075A (ja) * | 2004-09-08 | 2006-03-23 | Sumitomo Metal Mining Co Ltd | 樹脂組成物と紫外線遮蔽用透明樹脂成形体および紫外線遮蔽用透明樹脂積層体 |
| JP5166689B2 (ja) * | 2005-10-17 | 2013-03-21 | 昭和電工株式会社 | シリカ被覆炭素繊維の製造方法 |
| JP4752525B2 (ja) * | 2006-02-07 | 2011-08-17 | 東洋インキＳｃホールディングス株式会社 | 樹脂組成物 |
| JP5076435B2 (ja) * | 2006-04-05 | 2012-11-21 | 堺化学工業株式会社 | 超微粒子酸化亜鉛及びその製造方法 |
| JP4865388B2 (ja) * | 2006-04-07 | 2012-02-01 | 株式会社 資生堂 | 表面処理酸化亜鉛粉体及びこれを含有する化粧料 |
| JP5200343B2 (ja) * | 2006-07-18 | 2013-06-05 | 東レ株式会社 | 液晶バックライト用白色ポリエステル反射フィルム |
| EP2057235B1 (de) * | 2006-08-25 | 2018-05-02 | Sachtleben Chemie GmbH | Anorganisch oberflächenmodifizierte ultrafeine partikel |
| JP2008056873A (ja) * | 2006-09-04 | 2008-03-13 | Kri Inc | ナノコンポジットおよびその製造方法 |
| CA2664989C (en) * | 2006-10-06 | 2014-01-28 | Sakai Chemical Industry Co., Ltd. | Ultra-fine zinc oxide particle and method for production thereof |
| WO2008099458A1 (ja) * | 2007-02-13 | 2008-08-21 | Konica Minolta Opto, Inc. | 熱可塑性樹脂組成物及び光学素子 |
| JPWO2008099459A1 (ja) * | 2007-02-13 | 2010-05-27 | コニカミノルタオプト株式会社 | 光学用樹脂材料、光学素子及び光学用樹脂材料の製造方法 |
| JP5150826B2 (ja) * | 2007-05-11 | 2013-02-27 | 国立大学法人宇都宮大学 | シリカ被覆酸化亜鉛微粒子の製造方法と、その方法で得られたシリカ被覆酸化亜鉛微粒子 |
| JP5398134B2 (ja) * | 2007-11-15 | 2014-01-29 | 住友金属鉱山株式会社 | 表面処理酸化亜鉛微粒子の製造方法、表面処理酸化亜鉛微粒子、その分散液体および分散固体、並びに酸化亜鉛微粒子被覆基材 |
| JP4655105B2 (ja) | 2008-04-30 | 2011-03-23 | 住友金属鉱山株式会社 | 紫外線遮蔽透明樹脂成形体およびその製造方法 |
| JP2010202731A (ja) | 2009-03-02 | 2010-09-16 | Shin-Etsu Chemical Co Ltd | 紫外線遮蔽性シリコーンコーティング組成物及び被覆物品 |
| JP2010261012A (ja) * | 2009-04-09 | 2010-11-18 | Shin-Etsu Chemical Co Ltd | 紫外線遮蔽性コーティング組成物及び被覆物品 |
| JP5374286B2 (ja) | 2009-09-14 | 2013-12-25 | 富士フイルム株式会社 | 保護フィルムおよび太陽電池用フロントシート |
| JP5267488B2 (ja) * | 2010-03-11 | 2013-08-21 | 信越化学工業株式会社 | ポリカーボネート樹脂積層体 |
| US20120162332A1 (en) * | 2010-12-22 | 2012-06-28 | Hong Kong Applied Science and Technology Research Institute Company Limited | Sublimation inks for thermal inkjet printers using thermally stable dye particles |
| JP5810906B2 (ja) * | 2011-12-28 | 2015-11-11 | 住友大阪セメント株式会社 | 耐候性粒子と耐候性粒子含有分散液及び耐候性粒子含有樹脂組成物並びにそれを用いた耐候性膜及び耐候性基材 |
| JP6196779B2 (ja) * | 2013-01-31 | 2017-09-13 | 石原産業株式会社 | 絶縁性放熱フィラー及びその製造方法 |
| JP6349877B2 (ja) * | 2013-04-19 | 2018-07-04 | 住友大阪セメント株式会社 | 酸化ケイ素被覆酸化亜鉛とその製造方法及び酸化ケイ素被覆酸化亜鉛含有組成物並びに化粧料 |
| EP2995590B1 (en) * | 2013-04-19 | 2019-11-13 | Sumitomo Osaka Cement Co., Ltd. | Silicon-oxide-coated zinc oxide and method for manufacturing same, silicon-oxide-coated-zinc-oxide-containing composition, and cosmetic |
| JP6349873B2 (ja) * | 2013-04-19 | 2018-07-04 | 住友大阪セメント株式会社 | 酸化ケイ素被覆酸化亜鉛とその製造方法及び酸化ケイ素被覆酸化亜鉛含有組成物並びに化粧料 |
| JP2015066865A (ja) * | 2013-09-30 | 2015-04-13 | マツダ株式会社 | 積層塗膜及び塗装物 |
| JP6458737B2 (ja) * | 2013-11-13 | 2019-01-30 | 住友大阪セメント株式会社 | 酸化ケイ素被覆酸化亜鉛とその製造方法及び酸化ケイ素被覆酸化亜鉛含有組成物並びに化粧料 |
| JP6349875B2 (ja) * | 2014-03-31 | 2018-07-04 | 住友大阪セメント株式会社 | 酸化ケイ素被覆酸化亜鉛とその製造方法及び酸化ケイ素被覆酸化亜鉛含有組成物並びに化粧料 |
| JP6349876B2 (ja) * | 2014-03-31 | 2018-07-04 | 住友大阪セメント株式会社 | 酸化ケイ素被覆酸化亜鉛とその製造方法及び酸化ケイ素被覆酸化亜鉛含有組成物並びに化粧料 |
| WO2015152138A1 (ja) * | 2014-03-31 | 2015-10-08 | 住友大阪セメント株式会社 | 酸化ケイ素被覆酸化亜鉛とその製造方法及び酸化ケイ素被覆酸化亜鉛含有組成物並びに化粧料 |
| EP2987834A1 (de) * | 2014-08-18 | 2016-02-24 | Kronos International, Inc. | Verfahren zur Oberflächenbeschichtung von anorganischen Partikeln mit Siliciumdioxid und mindestens einer weiteren anorganischen Verbindung |
| JP6035500B1 (ja) * | 2015-10-05 | 2016-11-30 | エム・テクニック株式会社 | 塗料用ケイ素酸化物被覆酸化鉄組成物 |
| JP6269896B1 (ja) | 2016-06-02 | 2018-01-31 | エム・テクニック株式会社 | 透明材用紫外線及び／又は近赤外線遮断剤組成物 |
| EP3385337A1 (en) * | 2017-04-05 | 2018-10-10 | Huntsman P&A Uerdingen GmbH | Pigment treated with at least one non-reactive polysiloxane for use in thermoplastics |
| WO2020218206A1 (ja) * | 2019-04-24 | 2020-10-29 | 東亞合成株式会社 | 繊維用無機粒子及びその製造方法 |
| JP7267159B2 (ja) * | 2019-09-12 | 2023-05-01 | 三井金属鉱業株式会社 | 表面処理酸化亜鉛粒子及び塗布用組成物 |
| KR102856549B1 (ko) * | 2020-03-31 | 2025-09-05 | 스미토모 오사카 세멘토 가부시키가이샤 | 표면 처리 금속 산화물 입자, 분산액, 화장료 및 표면 처리 금속 산화물 입자의 제조 방법 |
| CN112812361B (zh) * | 2020-12-31 | 2024-01-09 | 浙江三时纪新材科技有限公司 | 一种二氧化硅粉体填料的制备方法、由此得到的粉体填料及其应用 |
| CN114983884A (zh) * | 2022-05-18 | 2022-09-02 | 青岛周氏塑料包装有限公司 | 一种抑菌保湿生物降解保鲜膜贴及其制备方法 |
| CN119660749B (zh) * | 2024-11-25 | 2025-09-30 | 中南大学 | 一种石英细粉制备光伏坩埚用高纯石英砂的方法 |
| CN120623994B (zh) * | 2025-06-11 | 2025-12-05 | 辽宁祺瑞石油科技有限公司 | 一种高形变暂堵剂及其制备方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05295141A (ja) * | 1992-04-21 | 1993-11-09 | Toyo Alum Kk | 紫外線吸収性透明フィルム |
| JPH11193354A (ja) * | 1997-12-26 | 1999-07-21 | Fuji Shikiso Kk | シリカ被覆酸化亜鉛粒子、その製法及びその粒子を含有する 組成物 |
| EP1167462B1 (en) * | 1999-01-11 | 2010-12-22 | Showa Denko K.K. | Cosmetic preparation, surface-hydrophobized silica-coated metal oxide particles, sol of surface-hydrophobized silica-coated metal oxide, and processes for producing these |
| JP3503814B2 (ja) * | 1999-04-30 | 2004-03-08 | 冨士色素株式会社 | 変性シリカ被覆金属酸化物、その製法およびそれを含有する組成物 |
| JP4326689B2 (ja) * | 1999-12-24 | 2009-09-09 | 株式会社資生堂 | プラスミノーゲンアクチベーター阻害剤およびそれを配合した皮膚外用剤 |
| AU6269101A (en) * | 2000-06-05 | 2001-12-17 | Showa Denko Kk | Cosmetic preparation |
| US6500415B2 (en) * | 2000-06-05 | 2002-12-31 | Showa Denko K.K. | Cosmetic composition |
| JP2002154915A (ja) * | 2000-09-11 | 2002-05-28 | Showa Denko Kk | 化粧料 |
| JP2002087817A (ja) * | 2000-09-12 | 2002-03-27 | Sumitomo Osaka Cement Co Ltd | 複合酸化亜鉛分散体 |
-
2003
- 2003-06-02 JP JP2003156476A patent/JP4582439B2/ja not_active Expired - Fee Related
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