JP2004002971A5 - - Google Patents

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Publication number
JP2004002971A5
JP2004002971A5 JP2003072406A JP2003072406A JP2004002971A5 JP 2004002971 A5 JP2004002971 A5 JP 2004002971A5 JP 2003072406 A JP2003072406 A JP 2003072406A JP 2003072406 A JP2003072406 A JP 2003072406A JP 2004002971 A5 JP2004002971 A5 JP 2004002971A5
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JP
Japan
Prior art keywords
less
layer
heterogeneity
disks
many
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003072406A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004002971A (ja
JP4384866B2 (ja
Filing date
Publication date
Priority claimed from DE10211573A external-priority patent/DE10211573A1/de
Application filed filed Critical
Publication of JP2004002971A publication Critical patent/JP2004002971A/ja
Publication of JP2004002971A5 publication Critical patent/JP2004002971A5/ja
Application granted granted Critical
Publication of JP4384866B2 publication Critical patent/JP4384866B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2003072406A 2002-03-15 2003-03-17 真空気化装置 Expired - Fee Related JP4384866B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10211573A DE10211573A1 (de) 2002-03-15 2002-03-15 Vakuumverdampfungseinrichtung

Publications (3)

Publication Number Publication Date
JP2004002971A JP2004002971A (ja) 2004-01-08
JP2004002971A5 true JP2004002971A5 (enExample) 2006-03-02
JP4384866B2 JP4384866B2 (ja) 2009-12-16

Family

ID=7714121

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003072406A Expired - Fee Related JP4384866B2 (ja) 2002-03-15 2003-03-17 真空気化装置

Country Status (6)

Country Link
US (1) US7155115B2 (enExample)
JP (1) JP4384866B2 (enExample)
DE (1) DE10211573A1 (enExample)
GB (1) GB2389546A (enExample)
IE (1) IE20030185A1 (enExample)
SG (1) SG110028A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4344631B2 (ja) * 2004-03-02 2009-10-14 長州産業株式会社 有機物薄膜堆積用分子線源
KR101094001B1 (ko) * 2005-07-20 2011-12-15 쵸슈 산교 가부시키가이샤 유기물 박막퇴적용 분자빔원
US20080241366A1 (en) * 2007-03-29 2008-10-02 Intevac Corporation Apparatus for and method of applying lubricant coatings to magnetic disks via a vapor flow path including a selectively opened and closed shutter
US20080241367A1 (en) * 2007-03-29 2008-10-02 Intevac Corporation Apparatus for and method of applying lubricant coatings to magnetic disks via a vapor flow path including a selectively opened and closed shutter
US20090047417A1 (en) * 2007-03-30 2009-02-19 Barnes Michael S Method and system for vapor phase application of lubricant in disk media manufacturing process
KR101046520B1 (ko) 2007-09-07 2011-07-04 어플라이드 머티어리얼스, 인코포레이티드 내부 챔버 상의 부산물 막 증착을 제어하기 위한 ｐｅｃｖｄ 시스템에서의 소스 가스 흐름 경로 제어
KR102144321B1 (ko) 2011-10-21 2020-08-31 에바텍 아크티엔게젤샤프트 직접 액상 증착
JP2014075166A (ja) 2012-10-04 2014-04-24 Showa Denko Kk 磁気記録媒体の製造方法及び装置
JP6118114B2 (ja) 2013-01-15 2017-04-19 昭和電工株式会社 磁気記録媒体の製造方法及び装置
JP2014146400A (ja) 2013-01-29 2014-08-14 Showa Denko Kk 磁気記録媒体の製造方法
JP2014146401A (ja) 2013-01-29 2014-08-14 Showa Denko Kk 磁気記録媒体の製造方法及び装置
JP6118130B2 (ja) 2013-02-25 2017-04-19 昭和電工株式会社 磁気記録媒体の製造方法及び装置
JP6175265B2 (ja) 2013-04-02 2017-08-02 昭和電工株式会社 磁気記録媒体の製造方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4125086A (en) * 1977-01-06 1978-11-14 The United States Of America As Represented By The Secretary Of The Army Nozzle beam type metal vapor source
US4412508A (en) * 1980-12-15 1983-11-01 The United States Of America As Represented By The Secretary Of The Army Nozzle beam source for vapor deposition
US4383645A (en) * 1980-12-15 1983-05-17 Allied Corporation Vapor sprayer and process for providing a volatile fluid as a vapor spray
US4392453A (en) * 1981-08-26 1983-07-12 Varian Associates, Inc. Molecular beam converters for vacuum coating systems
CH654596A5 (de) * 1983-09-05 1986-02-28 Balzers Hochvakuum Verdampferzelle.
FR2562099B1 (fr) * 1984-03-30 1986-06-20 Commissariat Energie Atomique Cellule d'evaporation d'un compose liquide adaptee a l'epitaxie par jets moleculaires
JPS63310792A (ja) * 1987-06-12 1988-12-19 Nissin Electric Co Ltd 分子線エピタキシ−装置の原料補給装置
US5336324A (en) * 1991-12-04 1994-08-09 Emcore Corporation Apparatus for depositing a coating on a substrate
DE4342574C1 (de) 1993-12-14 1995-04-13 Hilmar Weinert Bandbedampfungsanlage
US5562965A (en) 1995-06-07 1996-10-08 Seagate Technologies, Inc. Vapor lubrication of fractionated lubricant on thin film discs
US6011904A (en) * 1997-06-10 2000-01-04 Board Of Regents, University Of Texas Molecular beam epitaxy effusion cell
GB2342100B (en) 1997-07-25 2002-12-04 Seagate Technology Method and apparatus for zone lubrication of magnetic media
US6214410B1 (en) 1997-09-09 2001-04-10 Seagate Technology Llc Vacuum assisted lubrication of magnetic recording media
JPH11172418A (ja) 1997-12-12 1999-06-29 Ulvac Corp 成膜装置
US6264751B1 (en) 1998-05-18 2001-07-24 Hoya Corporation Mechanism for performing water repellency processing on both sides simultaneously
US6183831B1 (en) 1998-08-20 2001-02-06 Intevac, Inc. Hard disk vapor lube
JP2000068055A (ja) * 1998-08-26 2000-03-03 Tdk Corp 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法
JP4112702B2 (ja) 1998-09-11 2008-07-02 株式会社アルバック 成膜装置
DE19843818A1 (de) * 1998-09-24 2000-03-30 Leybold Systems Gmbh Bedampfungsvorrichtung für Vakuum-Bedampfungsanlagen
KR100368319B1 (ko) * 1998-12-30 2003-03-17 주식회사 하이닉스반도체 액체운송장치
JP2000200781A (ja) * 1999-01-07 2000-07-18 Ebara Corp 液体原料気化装置及び方法
JP3782255B2 (ja) 1999-04-28 2006-06-07 株式会社アルバック 有機化合物用の蒸着源、及び蒸着装置
US6596085B1 (en) * 2000-02-01 2003-07-22 Applied Materials, Inc. Methods and apparatus for improved vaporization of deposition material in a substrate processing system

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