JP2004002971A5 - - Google Patents
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- JP2004002971A5 JP2004002971A5 JP2003072406A JP2003072406A JP2004002971A5 JP 2004002971 A5 JP2004002971 A5 JP 2004002971A5 JP 2003072406 A JP2003072406 A JP 2003072406A JP 2003072406 A JP2003072406 A JP 2003072406A JP 2004002971 A5 JP2004002971 A5 JP 2004002971A5
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- JP
- Japan
- Prior art keywords
- less
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- heterogeneity
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【請求項26】
前記層の異質性は、20%未満、好ましくは10%未満、本質的には8%未満であるこ
とを特徴とする、請求項21〜25記載の対象物。
前記層の異質性は、20%未満、好ましくは10%未満、本質的には8%未満であるこ
とを特徴とする、請求項21〜25記載の対象物。
塗布された層は、好ましくは1nmから5nmの減摩剤の層であるが、1.5nmから3nmであれば、更に良好である。層の異質性は、20%未満になるが、好ましくは10%未満、本質的には8%未満である。
本発明は、例えばハードディスク等の環状データ記録ディスクのような対象物に特に適している。本発明に従う装置は、多数個について1nmから5nmの範囲で、好ましくは1.5nmから3nmの範囲で蒸気堆積層の厚さを産出する為に使用可能であり、これが実行されると、20%未満の異質な層、すなわち約10%、或いは8%でさえも、得ることができる。好ましくは、1nm/sまでの蒸着速度が、この目的の為に使用されるので、1000ぐらいのディスクは1時間で被覆可能である。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10211573A DE10211573A1 (de) | 2002-03-15 | 2002-03-15 | Vakuumverdampfungseinrichtung |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2004002971A JP2004002971A (ja) | 2004-01-08 |
JP2004002971A5 true JP2004002971A5 (ja) | 2006-03-02 |
JP4384866B2 JP4384866B2 (ja) | 2009-12-16 |
Family
ID=7714121
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003072406A Expired - Fee Related JP4384866B2 (ja) | 2002-03-15 | 2003-03-17 | 真空気化装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7155115B2 (ja) |
JP (1) | JP4384866B2 (ja) |
DE (1) | DE10211573A1 (ja) |
GB (1) | GB2389546A (ja) |
IE (1) | IE20030185A1 (ja) |
SG (1) | SG110028A1 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4344631B2 (ja) * | 2004-03-02 | 2009-10-14 | 長州産業株式会社 | 有機物薄膜堆積用分子線源 |
KR101094001B1 (ko) * | 2005-07-20 | 2011-12-15 | 쵸슈 산교 가부시키가이샤 | 유기물 박막퇴적용 분자빔원 |
US20080241366A1 (en) * | 2007-03-29 | 2008-10-02 | Intevac Corporation | Apparatus for and method of applying lubricant coatings to magnetic disks via a vapor flow path including a selectively opened and closed shutter |
US20080241367A1 (en) * | 2007-03-29 | 2008-10-02 | Intevac Corporation | Apparatus for and method of applying lubricant coatings to magnetic disks via a vapor flow path including a selectively opened and closed shutter |
US20090047417A1 (en) * | 2007-03-30 | 2009-02-19 | Barnes Michael S | Method and system for vapor phase application of lubricant in disk media manufacturing process |
KR101046520B1 (ko) | 2007-09-07 | 2011-07-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 내부 챔버 상의 부산물 막 증착을 제어하기 위한 pecvd 시스템에서의 소스 가스 흐름 경로 제어 |
KR102144321B1 (ko) | 2011-10-21 | 2020-08-31 | 에바텍 아크티엔게젤샤프트 | 직접 액상 증착 |
JP2014075166A (ja) | 2012-10-04 | 2014-04-24 | Showa Denko Kk | 磁気記録媒体の製造方法及び装置 |
JP6118114B2 (ja) | 2013-01-15 | 2017-04-19 | 昭和電工株式会社 | 磁気記録媒体の製造方法及び装置 |
JP2014146400A (ja) | 2013-01-29 | 2014-08-14 | Showa Denko Kk | 磁気記録媒体の製造方法 |
JP2014146401A (ja) | 2013-01-29 | 2014-08-14 | Showa Denko Kk | 磁気記録媒体の製造方法及び装置 |
JP6118130B2 (ja) | 2013-02-25 | 2017-04-19 | 昭和電工株式会社 | 磁気記録媒体の製造方法及び装置 |
JP6175265B2 (ja) | 2013-04-02 | 2017-08-02 | 昭和電工株式会社 | 磁気記録媒体の製造方法 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4125086A (en) * | 1977-01-06 | 1978-11-14 | The United States Of America As Represented By The Secretary Of The Army | Nozzle beam type metal vapor source |
US4412508A (en) * | 1980-12-15 | 1983-11-01 | The United States Of America As Represented By The Secretary Of The Army | Nozzle beam source for vapor deposition |
US4383645A (en) * | 1980-12-15 | 1983-05-17 | Allied Corporation | Vapor sprayer and process for providing a volatile fluid as a vapor spray |
US4392453A (en) * | 1981-08-26 | 1983-07-12 | Varian Associates, Inc. | Molecular beam converters for vacuum coating systems |
CH654596A5 (de) * | 1983-09-05 | 1986-02-28 | Balzers Hochvakuum | Verdampferzelle. |
FR2562099B1 (fr) * | 1984-03-30 | 1986-06-20 | Commissariat Energie Atomique | Cellule d'evaporation d'un compose liquide adaptee a l'epitaxie par jets moleculaires |
JPS63310792A (ja) * | 1987-06-12 | 1988-12-19 | Nissin Electric Co Ltd | 分子線エピタキシ−装置の原料補給装置 |
US5336324A (en) * | 1991-12-04 | 1994-08-09 | Emcore Corporation | Apparatus for depositing a coating on a substrate |
DE4342574C1 (de) | 1993-12-14 | 1995-04-13 | Hilmar Weinert | Bandbedampfungsanlage |
US5562965A (en) | 1995-06-07 | 1996-10-08 | Seagate Technologies, Inc. | Vapor lubrication of fractionated lubricant on thin film discs |
US6011904A (en) * | 1997-06-10 | 2000-01-04 | Board Of Regents, University Of Texas | Molecular beam epitaxy effusion cell |
WO1999004909A1 (en) | 1997-07-25 | 1999-02-04 | Seagate Technology, Inc. | Method and apparatus for zone lubrication of magnetic media |
US6214410B1 (en) | 1997-09-09 | 2001-04-10 | Seagate Technology Llc | Vacuum assisted lubrication of magnetic recording media |
JPH11172418A (ja) | 1997-12-12 | 1999-06-29 | Ulvac Corp | 成膜装置 |
US6264751B1 (en) | 1998-05-18 | 2001-07-24 | Hoya Corporation | Mechanism for performing water repellency processing on both sides simultaneously |
US6183831B1 (en) | 1998-08-20 | 2001-02-06 | Intevac, Inc. | Hard disk vapor lube |
JP2000068055A (ja) * | 1998-08-26 | 2000-03-03 | Tdk Corp | 有機el素子用蒸発源、この有機el素子用蒸発源を用いた有機el素子の製造装置および製造方法 |
JP4112702B2 (ja) | 1998-09-11 | 2008-07-02 | 株式会社アルバック | 成膜装置 |
DE19843818A1 (de) * | 1998-09-24 | 2000-03-30 | Leybold Systems Gmbh | Bedampfungsvorrichtung für Vakuum-Bedampfungsanlagen |
KR100368319B1 (ko) * | 1998-12-30 | 2003-03-17 | 주식회사 하이닉스반도체 | 액체운송장치 |
JP2000200781A (ja) * | 1999-01-07 | 2000-07-18 | Ebara Corp | 液体原料気化装置及び方法 |
JP3782255B2 (ja) | 1999-04-28 | 2006-06-07 | 株式会社アルバック | 有機化合物用の蒸着源、及び蒸着装置 |
US6596085B1 (en) * | 2000-02-01 | 2003-07-22 | Applied Materials, Inc. | Methods and apparatus for improved vaporization of deposition material in a substrate processing system |
-
2002
- 2002-03-15 DE DE10211573A patent/DE10211573A1/de not_active Withdrawn
- 2002-04-09 US US10/119,541 patent/US7155115B2/en not_active Expired - Fee Related
-
2003
- 2003-03-12 IE IE20030185A patent/IE20030185A1/en not_active IP Right Cessation
- 2003-03-14 SG SG200301288A patent/SG110028A1/en unknown
- 2003-03-14 GB GB0305900A patent/GB2389546A/en not_active Withdrawn
- 2003-03-17 JP JP2003072406A patent/JP4384866B2/ja not_active Expired - Fee Related
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