JP2004002971A5 - - Google Patents

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Publication number
JP2004002971A5
JP2004002971A5 JP2003072406A JP2003072406A JP2004002971A5 JP 2004002971 A5 JP2004002971 A5 JP 2004002971A5 JP 2003072406 A JP2003072406 A JP 2003072406A JP 2003072406 A JP2003072406 A JP 2003072406A JP 2004002971 A5 JP2004002971 A5 JP 2004002971A5
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JP
Japan
Prior art keywords
less
layer
heterogeneity
disks
many
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003072406A
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English (en)
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JP2004002971A (ja
JP4384866B2 (ja
Filing date
Publication date
Priority claimed from DE10211573A external-priority patent/DE10211573A1/de
Application filed filed Critical
Publication of JP2004002971A publication Critical patent/JP2004002971A/ja
Publication of JP2004002971A5 publication Critical patent/JP2004002971A5/ja
Application granted granted Critical
Publication of JP4384866B2 publication Critical patent/JP4384866B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【請求項２６】
前記層の異質性は、２０％未満、好ましくは１０％未満、本質的には８％未満であるこ
とを特徴とする、請求項２１〜２５記載の対象物。
塗布された層は、好ましくは１ｎｍから５ｎｍの減摩剤の層であるが、１．５ｎｍから３ｎｍであれば、更に良好である。層の異質性は、２０％未満になるが、好ましくは１０％未満、本質的には８％未満である。
本発明は、例えばハードディスク等の環状データ記録ディスクのような対象物に特に適している。本発明に従う装置は、多数個について１ｎｍから５ｎｍの範囲で、好ましくは１．５ｎｍから３ｎｍの範囲で蒸気堆積層の厚さを産出する為に使用可能であり、これが実行されると、２０％未満の異質な層、すなわち約１０％、或いは８％でさえも、得ることができる。好ましくは、１ｎｍ／ｓまでの蒸着速度が、この目的の為に使用されるので、１０００ぐらいのディスクは１時間で被覆可能である。
JP2003072406A 2002-03-15 2003-03-17 真空気化装置 Expired - Fee Related JP4384866B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10211573A DE10211573A1 (de) 2002-03-15 2002-03-15 Vakuumverdampfungseinrichtung

Publications (3)

Publication Number Publication Date
JP2004002971A JP2004002971A (ja) 2004-01-08
JP2004002971A5 true JP2004002971A5 (ja) 2006-03-02
JP4384866B2 JP4384866B2 (ja) 2009-12-16

Family

ID=7714121

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003072406A Expired - Fee Related JP4384866B2 (ja) 2002-03-15 2003-03-17 真空気化装置

Country Status (6)

Country Link
US (1) US7155115B2 (ja)
JP (1) JP4384866B2 (ja)
DE (1) DE10211573A1 (ja)
GB (1) GB2389546A (ja)
IE (1) IE20030185A1 (ja)
SG (1) SG110028A1 (ja)

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JP4344631B2 (ja) * 2004-03-02 2009-10-14 長州産業株式会社 有機物薄膜堆積用分子線源
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US20080241367A1 (en) * 2007-03-29 2008-10-02 Intevac Corporation Apparatus for and method of applying lubricant coatings to magnetic disks via a vapor flow path including a selectively opened and closed shutter
US20080241366A1 (en) * 2007-03-29 2008-10-02 Intevac Corporation Apparatus for and method of applying lubricant coatings to magnetic disks via a vapor flow path including a selectively opened and closed shutter
US20090047417A1 (en) * 2007-03-30 2009-02-19 Barnes Michael S Method and system for vapor phase application of lubricant in disk media manufacturing process
KR101046520B1 (ko) 2007-09-07 2011-07-04 어플라이드 머티어리얼스, 인코포레이티드 내부 챔버 상의 부산물 막 증착을 제어하기 위한 ｐｅｃｖｄ 시스템에서의 소스 가스 흐름 경로 제어
SG11201401495TA (en) 2011-10-21 2014-05-29 Oerlikon Advanced Technologies Ag Direct liquid deposition
JP2014075166A (ja) 2012-10-04 2014-04-24 Showa Denko Kk 磁気記録媒体の製造方法及び装置
JP6118114B2 (ja) 2013-01-15 2017-04-19 昭和電工株式会社 磁気記録媒体の製造方法及び装置
JP2014146400A (ja) 2013-01-29 2014-08-14 Showa Denko Kk 磁気記録媒体の製造方法
JP2014146401A (ja) 2013-01-29 2014-08-14 Showa Denko Kk 磁気記録媒体の製造方法及び装置
JP6118130B2 (ja) 2013-02-25 2017-04-19 昭和電工株式会社 磁気記録媒体の製造方法及び装置
JP6175265B2 (ja) 2013-04-02 2017-08-02 昭和電工株式会社 磁気記録媒体の製造方法

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