JP2003504609A5 - - Google Patents

Download PDF

Info

Publication number
JP2003504609A5
JP2003504609A5 JP2001509941A JP2001509941A JP2003504609A5 JP 2003504609 A5 JP2003504609 A5 JP 2003504609A5 JP 2001509941 A JP2001509941 A JP 2001509941A JP 2001509941 A JP2001509941 A JP 2001509941A JP 2003504609 A5 JP2003504609 A5 JP 2003504609A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001509941A
Other languages
Japanese (ja)
Other versions
JP2003504609A (ja
Filing date
Publication date
Priority claimed from US09/350,701 external-priority patent/US6399944B1/en
Application filed filed Critical
Publication of JP2003504609A publication Critical patent/JP2003504609A/ja
Publication of JP2003504609A5 publication Critical patent/JP2003504609A5/ja
Pending legal-status Critical Current

Links

JP2001509941A 1999-07-09 2000-06-22 非弾性電子散乱による膜厚測定 Pending JP2003504609A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/350,701 US6399944B1 (en) 1999-07-09 1999-07-09 Measurement of film thickness by inelastic electron scattering
US09/350,701 1999-07-09
PCT/US2000/017234 WO2001004574A1 (en) 1999-07-09 2000-06-22 Measurement of film thickness by inelastic electron scattering

Publications (2)

Publication Number Publication Date
JP2003504609A JP2003504609A (ja) 2003-02-04
JP2003504609A5 true JP2003504609A5 (enExample) 2008-02-28

Family

ID=23377837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001509941A Pending JP2003504609A (ja) 1999-07-09 2000-06-22 非弾性電子散乱による膜厚測定

Country Status (8)

Country Link
US (1) US6399944B1 (enExample)
EP (1) EP1192416B1 (enExample)
JP (1) JP2003504609A (enExample)
AT (1) ATE291731T1 (enExample)
AU (1) AU5759400A (enExample)
DE (1) DE60018932T2 (enExample)
TW (1) TW457362B (enExample)
WO (1) WO2001004574A1 (enExample)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6635869B2 (en) * 2001-02-26 2003-10-21 Fei Company Step function determination of Auger peak intensity
US6781126B2 (en) * 2002-02-04 2004-08-24 Applied Materials, Inc. Auger-based thin film metrology
DE60334842D1 (de) * 2002-12-27 2010-12-16 High Voltage Engineering Corp Zerstörungsfreie charakterisierung von dünnen schichten durch messung von basisspektren und/oder basiert auf einem aufgenommenen spektrum
US6891158B2 (en) 2002-12-27 2005-05-10 Revera Incorporated Nondestructive characterization of thin films based on acquired spectrum
JP4344197B2 (ja) * 2003-08-26 2009-10-14 パナソニック株式会社 絶縁膜測定装置、絶縁膜測定方法及び絶縁膜評価装置
CN101091101A (zh) * 2004-12-27 2007-12-19 新科实业有限公司 通过俄歇电子能谱测量纳米薄膜厚度的方法
CN100592028C (zh) * 2005-01-07 2010-02-24 精工电子纳米科技有限公司 薄膜样品测量方法和设备及薄膜样品制备方法和设备
US7231324B2 (en) * 2005-04-29 2007-06-12 Revera Incorporated Techniques for analyzing data generated by instruments
US7420163B2 (en) * 2005-04-29 2008-09-02 Revera Incorporated Determining layer thickness using photoelectron spectroscopy
US7411188B2 (en) 2005-07-11 2008-08-12 Revera Incorporated Method and system for non-destructive distribution profiling of an element in a film
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
DK2251454T3 (da) 2009-05-13 2014-10-13 Sio2 Medical Products Inc Coating og inspektion af beholder
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US8581602B2 (en) 2009-09-02 2013-11-12 Systems And Materials Research Corporation Method and apparatus for nondestructive measuring of a coating thickness on a curved surface
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
WO2011162411A1 (ja) * 2010-06-25 2011-12-29 日本電気株式会社 2次元薄膜原子構造の層数決定方法および2次元薄膜原子構造の層数決定装置
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US8853078B2 (en) 2011-01-30 2014-10-07 Fei Company Method of depositing material
US9090973B2 (en) 2011-01-31 2015-07-28 Fei Company Beam-induced deposition of low-resistivity material
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
AU2012318242A1 (en) 2011-11-11 2013-05-30 Sio2 Medical Products, Inc. Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
EP2846755A1 (en) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US8658973B2 (en) * 2012-06-12 2014-02-25 Kla-Tencor Corporation Auger elemental identification algorithm
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
KR101241007B1 (ko) * 2012-10-26 2013-03-11 나노씨엠에스(주) 엑스선을 이용한 박막층의 두께 측정 방법 및 장치
CA2890066C (en) 2012-11-01 2021-11-09 Sio2 Medical Products, Inc. Coating inspection method
WO2014078666A1 (en) 2012-11-16 2014-05-22 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
EP2925903B1 (en) 2012-11-30 2022-04-13 Si02 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
EP2961858B1 (en) 2013-03-01 2022-09-07 Si02 Medical Products, Inc. Coated syringe.
CN105392916B (zh) 2013-03-11 2019-03-08 Sio2医药产品公司 涂布包装材料
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
EP2971227B1 (en) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Coating method.
CN103713002B (zh) * 2013-12-27 2016-04-27 昆明贵研催化剂有限责任公司 一种测定汽车尾气催化剂涂层厚度的方法
EP3693493A1 (en) 2014-03-28 2020-08-12 SiO2 Medical Products, Inc. Antistatic coatings for plastic vessels
EP3104155A1 (en) 2015-06-09 2016-12-14 FEI Company Method of analyzing surface modification of a specimen in a charged-particle microscope
US11077233B2 (en) 2015-08-18 2021-08-03 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
US9837246B1 (en) 2016-07-22 2017-12-05 Fei Company Reinforced sample for transmission electron microscope
WO2018229848A1 (ja) * 2017-06-13 2018-12-20 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料の厚さ測定法
US10895541B2 (en) * 2018-01-06 2021-01-19 Kla-Tencor Corporation Systems and methods for combined x-ray reflectometry and photoelectron spectroscopy
DE102018202985A1 (de) 2018-02-28 2018-04-12 Carl Zeiss Smt Gmbh Verfahren zum Bestimmen einer Ablösewahrscheinlichkeit einer Schicht
CN114046736B (zh) * 2021-11-09 2023-02-28 北京理工大学 一种基于泵浦探测分析确定金属电子弹道深度的方法
CN114923938B (zh) * 2022-05-24 2025-04-29 长江存储科技有限责任公司 样品的表征方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2611411C3 (de) 1976-03-18 1980-07-17 Helmut Fischer Gmbh & Co Institut Fuer Elektronik Und Messtechnik, 7032 Sindelfingen Vorrichtung zum Messen der Dicke von Schichten mit einem die Schicht bestrahlenden Radionuklid
JPS52127292A (en) * 1976-04-16 1977-10-25 Hitachi Ltd Analyzer
GB2054136B (en) 1979-07-19 1983-06-29 Fischer H Apparatus for measuring the thickness of thin layers
JPS60128306A (ja) * 1983-12-16 1985-07-09 Nippon Telegr & Teleph Corp <Ntt> 磁気デイスク媒体の潤滑剤膜厚測定方法
JPH0766507B2 (ja) * 1984-02-16 1995-07-19 コニカ株式会社 磁気記録媒体
DE3570012D1 (en) * 1985-01-29 1989-06-08 Ibm Field-emission scanning auger electron microscope
JPS639807A (ja) * 1986-06-30 1988-01-16 Nec Corp 膜厚測定方法およびその装置
US5594245A (en) * 1990-10-12 1997-01-14 Hitachi, Ltd. Scanning electron microscope and method for dimension measuring by using the same
US5280176A (en) 1992-11-06 1994-01-18 The United States Of America As Represented By The Secretary Of Commerce X-ray photoelectron emission spectrometry system
JP2930866B2 (ja) * 1994-05-25 1999-08-09 理学電機工業株式会社 X線分析方法およびこれに用いる装置
JPH0914947A (ja) * 1995-06-29 1997-01-17 Sony Corp カーボン膜の膜厚測定方法
US5924058A (en) * 1997-02-14 1999-07-13 Applied Materials, Inc. Permanently mounted reference sample for a substrate measurement tool
US6067154A (en) * 1998-10-23 2000-05-23 Advanced Micro Devices, Inc. Method and apparatus for the molecular identification of defects in semiconductor manufacturing using a radiation scattering technique such as raman spectroscopy

Similar Documents

Publication Publication Date Title
BE2016C059I2 (enExample)
BE2014C009I2 (enExample)
BE2012C026I2 (enExample)
BE2012C016I2 (enExample)
BRPI0113085B8 (enExample)
BRPI0112928B8 (enExample)
BE2011C041I2 (enExample)
BE2010C040I2 (enExample)
CN3135789S (enExample)
CN3139842S (enExample)
AU2000267632A8 (enExample)
AU2000265180A8 (enExample)
CN3139851S (enExample)
BY7030C1 (enExample)
CL2001002979A1 (enExample)
CN3133795S (enExample)
CN3134542S (enExample)
CN3134543S (enExample)
CN3134619S (enExample)
CN3134893S (enExample)
CN3135488S (enExample)
CN3135563S (enExample)
CN3135584S (enExample)
CN3135640S (enExample)
CN3142225S (enExample)