JP2003133274A5 - - Google Patents
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- Publication number
- JP2003133274A5 JP2003133274A5 JP2001323860A JP2001323860A JP2003133274A5 JP 2003133274 A5 JP2003133274 A5 JP 2003133274A5 JP 2001323860 A JP2001323860 A JP 2001323860A JP 2001323860 A JP2001323860 A JP 2001323860A JP 2003133274 A5 JP2003133274 A5 JP 2003133274A5
- Authority
- JP
- Japan
- Prior art keywords
- exhaust
- cleaning unit
- polishing
- polished
- unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 description 94
- 238000005498 polishing Methods 0.000 description 79
- 238000005192 partition Methods 0.000 description 35
- 238000006073 displacement reaction Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 238000011109 contamination Methods 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- 239000002184 metal Substances 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 238000005406 washing Methods 0.000 description 7
- 239000007788 liquid Substances 0.000 description 6
- 238000001035 drying Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 4
- 239000006061 abrasive grain Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001323860A JP2003133274A (ja) | 2001-10-22 | 2001-10-22 | 研磨装置 |
| US10/277,131 US6783427B2 (en) | 2001-10-22 | 2002-10-22 | Polishing system with air exhaust system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001323860A JP2003133274A (ja) | 2001-10-22 | 2001-10-22 | 研磨装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003133274A JP2003133274A (ja) | 2003-05-09 |
| JP2003133274A5 true JP2003133274A5 (enExample) | 2005-01-06 |
Family
ID=19140685
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001323860A Pending JP2003133274A (ja) | 2001-10-22 | 2001-10-22 | 研磨装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6783427B2 (enExample) |
| JP (1) | JP2003133274A (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2839331B1 (fr) * | 2002-05-02 | 2004-07-16 | Cit Alcatel | Installation de fabrication de composants semi-conducteurs a faux-plancher ventile |
| JP2005033135A (ja) * | 2003-07-11 | 2005-02-03 | Kobe Steel Ltd | 微細構造体の洗浄装置 |
| KR20070115310A (ko) * | 2006-06-01 | 2007-12-06 | 주식회사 케이씨텍 | 습식세정장비의 세정액 유출방지장치 |
| JP4654209B2 (ja) | 2007-02-27 | 2011-03-16 | 信越半導体株式会社 | 研磨装置 |
| DE102011082869B4 (de) * | 2011-09-16 | 2013-11-14 | Felsomat Gmbh & Co Kg | Honmaschine mit öldichter Arbeitswanne |
| CN105922139B (zh) * | 2014-06-19 | 2017-11-03 | 衢州市优德工业设计有限公司 | 一种无尘的石雕磨削方法 |
| CN105751074B (zh) * | 2014-06-19 | 2017-10-24 | 衢州市优德工业设计有限公司 | 一种自动控制的无尘石雕磨削系统 |
| CN105751077B (zh) * | 2014-06-19 | 2017-09-29 | 衢州市优德工业设计有限公司 | 一种无尘石雕磨削系统的除尘系统 |
| KR101759877B1 (ko) * | 2015-12-24 | 2017-07-20 | 주식회사 엘지실트론 | 웨이퍼 연마챔버 및 이를 포함하는 웨이퍼 연마시스템 |
| JP6727044B2 (ja) * | 2016-06-30 | 2020-07-22 | 株式会社荏原製作所 | 基板処理装置 |
| JP6844970B2 (ja) * | 2016-08-18 | 2021-03-17 | 株式会社ディスコ | 研磨装置 |
| CN114084565B (zh) * | 2021-11-30 | 2022-08-19 | 重庆机电智能制造有限公司 | 一种具备惰性气体保护的自动存取立体库 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19544328B4 (de) * | 1994-11-29 | 2014-03-20 | Ebara Corp. | Poliervorrichtung |
| US5655954A (en) * | 1994-11-29 | 1997-08-12 | Toshiba Kikai Kabushiki Kaisha | Polishing apparatus |
| US5904611A (en) * | 1996-05-10 | 1999-05-18 | Canon Kabushiki Kaisha | Precision polishing apparatus |
| JP3679871B2 (ja) * | 1996-09-04 | 2005-08-03 | 株式会社荏原製作所 | ポリッシング装置及び搬送ロボット |
| EP1325793B1 (en) * | 1996-11-14 | 2010-01-13 | Ebara Corporation | Drainage structure in polishing plant |
| JPH11207606A (ja) * | 1998-01-21 | 1999-08-03 | Ebara Corp | 研磨装置 |
| JPH11219930A (ja) * | 1998-01-30 | 1999-08-10 | Ebara Corp | 洗浄装置 |
| US6102782A (en) * | 1998-04-06 | 2000-08-15 | Micron Technology, Inc. | System and apparatus for distributing flush fluid to processing equipment |
| JP2000012493A (ja) | 1998-06-19 | 2000-01-14 | Ebara Corp | ポリッシング装置 |
| JP3375294B2 (ja) | 1998-12-17 | 2003-02-10 | 東京エレクトロン株式会社 | 処理装置、処理システムおよび該装置における清浄エアの供給方法 |
| JP3953682B2 (ja) * | 1999-06-02 | 2007-08-08 | 株式会社荏原製作所 | ウエハ洗浄装置 |
| JP3556148B2 (ja) * | 2000-03-23 | 2004-08-18 | 株式会社東京精密 | ウェハ研磨装置 |
| US6616512B2 (en) * | 2000-07-28 | 2003-09-09 | Ebara Corporation | Substrate cleaning apparatus and substrate polishing apparatus with substrate cleaning apparatus |
-
2001
- 2001-10-22 JP JP2001323860A patent/JP2003133274A/ja active Pending
-
2002
- 2002-10-22 US US10/277,131 patent/US6783427B2/en not_active Expired - Lifetime
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