JP2003064307A5 - - Google Patents
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- Publication number
- JP2003064307A5 JP2003064307A5 JP2001257113A JP2001257113A JP2003064307A5 JP 2003064307 A5 JP2003064307 A5 JP 2003064307A5 JP 2001257113 A JP2001257113 A JP 2001257113A JP 2001257113 A JP2001257113 A JP 2001257113A JP 2003064307 A5 JP2003064307 A5 JP 2003064307A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- silica
- resin
- less
- based film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011347 resin Substances 0.000 claims 9
- 229920005989 resin Polymers 0.000 claims 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 8
- 239000000377 silicon dioxide Substances 0.000 claims 4
- 150000001450 anions Chemical class 0.000 claims 3
- 238000010438 heat treatment Methods 0.000 claims 3
- 229910052710 silicon Inorganic materials 0.000 claims 3
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- 229910052796 boron Inorganic materials 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 2
- 229910052731 fluorine Inorganic materials 0.000 claims 2
- 229910052732 germanium Inorganic materials 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 125000000962 organic group Chemical group 0.000 claims 2
- 229910052698 phosphorus Inorganic materials 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- 229910052719 titanium Inorganic materials 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 229910001413 alkali metal ion Inorganic materials 0.000 claims 1
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 claims 1
- 125000004429 atom Chemical group 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 230000005494 condensation Effects 0.000 claims 1
- 238000009833 condensation Methods 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- -1 halogen ion Chemical class 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 230000003301 hydrolyzing effect Effects 0.000 claims 1
- 150000008040 ionic compounds Chemical class 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 239000003039 volatile agent Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001257113A JP2003064307A (ja) | 2001-08-28 | 2001-08-28 | シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001257113A JP2003064307A (ja) | 2001-08-28 | 2001-08-28 | シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012106042A Division JP2012188668A (ja) | 2012-05-07 | 2012-05-07 | シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003064307A JP2003064307A (ja) | 2003-03-05 |
| JP2003064307A5 true JP2003064307A5 (enExample) | 2005-10-13 |
Family
ID=19084825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001257113A Pending JP2003064307A (ja) | 2001-08-28 | 2001-08-28 | シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003064307A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| US8901268B2 (en) | 2004-08-03 | 2014-12-02 | Ahila Krishnamoorthy | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7682701B2 (en) | 2002-02-27 | 2010-03-23 | Hitachi Chemical Co., Ltd. | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts |
| WO2003072668A1 (fr) * | 2002-02-27 | 2003-09-04 | Hitachi Chemical Co., Ltd. | Composition permettant de former un film de revetement a base de silice, film de revetement a base de silice, procede de preparation associe et parties electroniques |
| US7687590B2 (en) | 2002-02-27 | 2010-03-30 | Hitachi Chemical Company, Ltd. | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts |
| JP2004277502A (ja) * | 2003-03-13 | 2004-10-07 | Hitachi Chem Co Ltd | シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法並びにシリカ系被膜を備える電子部品 |
| TW200605220A (en) * | 2004-06-21 | 2006-02-01 | Hitachi Chemical Co Ltd | Organic siloxane film, semiconductor device using same, flat panel display and raw material liquid |
| US20060047034A1 (en) | 2004-09-02 | 2006-03-02 | Haruaki Sakurai | Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film |
| JP2006213908A (ja) * | 2004-12-21 | 2006-08-17 | Hitachi Chem Co Ltd | シリカ系被膜形成用組成物、シリカ系被膜の形成方法、シリカ系被膜、及び、電子部品 |
| EP1829945A4 (en) * | 2004-12-21 | 2011-03-23 | Hitachi Chemical Co Ltd | FILM, SILICON FILM AND METHOD OF MANUFACTURING THEREOF, COMPOSITION FOR FORMING THE SILICON FILM AND ELECTRONIC COMPONENT |
| KR100930854B1 (ko) * | 2005-04-13 | 2009-12-10 | 도오꾜오까고오교 가부시끼가이샤 | 실리카계 피막 형성용 조성물 |
| JP4757525B2 (ja) * | 2005-04-13 | 2011-08-24 | 東京応化工業株式会社 | シリカ系被膜形成用組成物 |
| JP4757524B2 (ja) * | 2005-04-13 | 2011-08-24 | 東京応化工業株式会社 | シリカ系被膜形成用組成物 |
| JP5326307B2 (ja) | 2007-03-13 | 2013-10-30 | 三菱化学株式会社 | シリカ多孔質体、光学用途積層体及び組成物、並びに、シリカ多孔質体の製造方法 |
| EP3194502A4 (en) | 2015-04-13 | 2018-05-16 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3287119B2 (ja) * | 1994-07-13 | 2002-05-27 | 住友化学工業株式会社 | シリカ系絶縁膜形成用塗布液 |
| JP3328545B2 (ja) * | 1997-05-28 | 2002-09-24 | 東レ・ダウコーニング・シリコーン株式会社 | 半導体装置の製造方法 |
| US6592980B1 (en) * | 1999-12-07 | 2003-07-15 | Air Products And Chemicals, Inc. | Mesoporous films having reduced dielectric constants |
| JP4195773B2 (ja) * | 2000-04-10 | 2008-12-10 | Ｊｓｒ株式会社 | 層間絶縁膜形成用組成物、層間絶縁膜の形成方法およびシリカ系層間絶縁膜 |
| US6576568B2 (en) * | 2000-04-04 | 2003-06-10 | Applied Materials, Inc. | Ionic additives for extreme low dielectric constant chemical formulations |
-
2001
- 2001-08-28 JP JP2001257113A patent/JP2003064307A/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8901268B2 (en) | 2004-08-03 | 2014-12-02 | Ahila Krishnamoorthy | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| US8784985B2 (en) | 2009-06-10 | 2014-07-22 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
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