JP2003064307A - シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品 - Google Patents

シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品

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Publication number
JP2003064307A
JP2003064307A JP2001257113A JP2001257113A JP2003064307A JP 2003064307 A JP2003064307 A JP 2003064307A JP 2001257113 A JP2001257113 A JP 2001257113A JP 2001257113 A JP2001257113 A JP 2001257113A JP 2003064307 A JP2003064307 A JP 2003064307A
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JP
Japan
Prior art keywords
silica
film
based coating
forming
coating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001257113A
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English (en)
Japanese (ja)
Other versions
JP2003064307A5 (enExample
Inventor
Kazuhiro Enomoto
和宏 榎本
Haruaki Sakurai
治彰 桜井
Shigeru Nobe
茂 野部
Koichi Abe
浩一 阿部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2001257113A priority Critical patent/JP2003064307A/ja
Publication of JP2003064307A publication Critical patent/JP2003064307A/ja
Publication of JP2003064307A5 publication Critical patent/JP2003064307A5/ja
Pending legal-status Critical Current

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  • Paints Or Removers (AREA)
  • Formation Of Insulating Films (AREA)
  • Silicon Compounds (AREA)
JP2001257113A 2001-08-28 2001-08-28 シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品 Pending JP2003064307A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001257113A JP2003064307A (ja) 2001-08-28 2001-08-28 シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品

Applications Claiming Priority (1)

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JP2001257113A JP2003064307A (ja) 2001-08-28 2001-08-28 シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012106042A Division JP2012188668A (ja) 2012-05-07 2012-05-07 シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品

Publications (2)

Publication Number Publication Date
JP2003064307A true JP2003064307A (ja) 2003-03-05
JP2003064307A5 JP2003064307A5 (enExample) 2005-10-13

Family

ID=19084825

Family Applications (1)

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JP2001257113A Pending JP2003064307A (ja) 2001-08-28 2001-08-28 シリカ系被膜、シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品

Country Status (1)

Country Link
JP (1) JP2003064307A (enExample)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003072668A1 (fr) * 2002-02-27 2003-09-04 Hitachi Chemical Co., Ltd. Composition permettant de former un film de revetement a base de silice, film de revetement a base de silice, procede de preparation associe et parties electroniques
JP2004277502A (ja) * 2003-03-13 2004-10-07 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法並びにシリカ系被膜を備える電子部品
JP2006213908A (ja) * 2004-12-21 2006-08-17 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜の形成方法、シリカ系被膜、及び、電子部品
JP2006291107A (ja) * 2005-04-13 2006-10-26 Tokyo Ohka Kogyo Co Ltd シリカ系被膜形成用組成物
JP2006291106A (ja) * 2005-04-13 2006-10-26 Tokyo Ohka Kogyo Co Ltd シリカ系被膜形成用組成物
WO2006112230A1 (ja) * 2005-04-13 2006-10-26 Tokyo Ohka Kogyo Co., Ltd. シリカ系被膜形成用組成物
JPWO2005124846A1 (ja) * 2004-06-21 2008-04-17 日立化成工業株式会社 有機シロキサン膜、それを用いた半導体装置、及び、平面表示装置、並びに、原料液
JPWO2006068181A1 (ja) * 2004-12-21 2008-06-12 日立化成工業株式会社 被膜、シリカ系被膜及びその形成方法、シリカ系被膜形成用組成物、並びに電子部品
WO2008111636A1 (ja) 2007-03-13 2008-09-18 Mitsubishi Chemical Corporation シリカ多孔質体、光学用途積層体及び組成物、並びに、シリカ多孔質体の製造方法
US7682701B2 (en) 2002-02-27 2010-03-23 Hitachi Chemical Co., Ltd. Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts
US7687590B2 (en) 2002-02-27 2010-03-30 Hitachi Chemical Company, Ltd. Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts
US8466229B2 (en) 2004-09-02 2013-06-18 Hitachi Chemical Co., Ltd. Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8901268B2 (en) 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0827420A (ja) * 1994-07-13 1996-01-30 Sumitomo Chem Co Ltd シリカ系絶縁膜形成用塗布液
JPH10335454A (ja) * 1997-05-28 1998-12-18 Toray Dow Corning Silicone Co Ltd 半導体装置及びその製造方法
JP2001226171A (ja) * 1999-12-07 2001-08-21 Air Prod And Chem Inc セラミックフィルムの形成方法及びセラミックフィルム
JP2001354904A (ja) * 2000-04-10 2001-12-25 Jsr Corp 膜形成用組成物、膜の形成方法およびシリカ系膜
JP2002026003A (ja) * 2000-04-04 2002-01-25 Applied Materials Inc 極低誘電率化学調剤用のイオン系添加物

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0827420A (ja) * 1994-07-13 1996-01-30 Sumitomo Chem Co Ltd シリカ系絶縁膜形成用塗布液
JPH10335454A (ja) * 1997-05-28 1998-12-18 Toray Dow Corning Silicone Co Ltd 半導体装置及びその製造方法
JP2001226171A (ja) * 1999-12-07 2001-08-21 Air Prod And Chem Inc セラミックフィルムの形成方法及びセラミックフィルム
JP2002026003A (ja) * 2000-04-04 2002-01-25 Applied Materials Inc 極低誘電率化学調剤用のイオン系添加物
JP2001354904A (ja) * 2000-04-10 2001-12-25 Jsr Corp 膜形成用組成物、膜の形成方法およびシリカ系膜

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003072668A1 (fr) * 2002-02-27 2003-09-04 Hitachi Chemical Co., Ltd. Composition permettant de former un film de revetement a base de silice, film de revetement a base de silice, procede de preparation associe et parties electroniques
US7687590B2 (en) 2002-02-27 2010-03-30 Hitachi Chemical Company, Ltd. Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts
US7682701B2 (en) 2002-02-27 2010-03-23 Hitachi Chemical Co., Ltd. Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts
JP2008297550A (ja) * 2002-02-27 2008-12-11 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜及びその製造方法、並びに電子部品
US7358300B2 (en) 2002-02-27 2008-04-15 Hitachi Chemical Co., Ltd. Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts
JP2004277502A (ja) * 2003-03-13 2004-10-07 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法並びにシリカ系被膜を備える電子部品
JPWO2005124846A1 (ja) * 2004-06-21 2008-04-17 日立化成工業株式会社 有機シロキサン膜、それを用いた半導体装置、及び、平面表示装置、並びに、原料液
US8466229B2 (en) 2004-09-02 2013-06-18 Hitachi Chemical Co., Ltd. Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film
JPWO2006068181A1 (ja) * 2004-12-21 2008-06-12 日立化成工業株式会社 被膜、シリカ系被膜及びその形成方法、シリカ系被膜形成用組成物、並びに電子部品
JP2006213908A (ja) * 2004-12-21 2006-08-17 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜の形成方法、シリカ系被膜、及び、電子部品
WO2006112230A1 (ja) * 2005-04-13 2006-10-26 Tokyo Ohka Kogyo Co., Ltd. シリカ系被膜形成用組成物
KR100930854B1 (ko) * 2005-04-13 2009-12-10 도오꾜오까고오교 가부시끼가이샤 실리카계 피막 형성용 조성물
JP2006291106A (ja) * 2005-04-13 2006-10-26 Tokyo Ohka Kogyo Co Ltd シリカ系被膜形成用組成物
JP2006291107A (ja) * 2005-04-13 2006-10-26 Tokyo Ohka Kogyo Co Ltd シリカ系被膜形成用組成物
US7939590B2 (en) 2005-04-13 2011-05-10 Tokyo Ohka Kogyo Co., Ltd. Composition for forming silica-based coating film
CN101155887B (zh) * 2005-04-13 2012-06-27 东京应化工业株式会社 二氧化硅系被膜形成用组合物
WO2008111636A1 (ja) 2007-03-13 2008-09-18 Mitsubishi Chemical Corporation シリカ多孔質体、光学用途積層体及び組成物、並びに、シリカ多孔質体の製造方法
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications

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