JP2003064307A5 - - Google Patents

Claims (7)

(A) a siloxane resin obtained by hydrolytic condensation of a compound represented by the following general formula (1),

(Wherein R ¹ represents H or F or a group containing B, N, Al, P, Si, Ge or Ti, or an organic group having 1 to 20 carbon atoms, and may be the same or different, and X is , represents a hydrolyzable group, it may be the same or different, n represents an integer of 0 or 1)
(B) an ionic compound represented by the following general formula (2);

(Wherein R ² represents a hydrogen atom or an organic group having 1 to 20 carbon atoms, Y represents an anion, and n represents the valence of the anion)
(C) A silica-based film forming composition containing a solvent capable of dissolving the component (a) and the component (b) is applied on a substrate, and the solvent contained in the applied film is removed. Resin obtained by baking at a heating temperature of ℃. (A) The total number of at least one atom selected from the group consisting of H, F, B, N, Al, P, Si, Ge, Ti, and C bonded per silicon atom of the siloxane resin is 0. 65 or less is claim 1, wherein the resin. The resin according to claim 1 or 2, wherein the composition for forming a silica-based film further comprises (d) a pyrolytic volatile compound that thermally decomposes or volatilizes at a heating temperature of 250 to 500 ° C. The resin according to any one of claims 1 to 3, wherein R ² is a group that thermally decomposes or volatilizes at a heating temperature of 50 to 500 ° C or less. Y ^{n-is Cl} -, Br ^- or I ^- other resins according to any one of claims 1 to 4 is an anion. The resin according to any one of claims 1 to 5, wherein a halogen ion concentration of the composition for forming a silica-based film is 10 ppm or less. The resin according to any one of claims 1 to 6, wherein each of the alkali metal ions and the alkaline earth metal ions of the composition for forming a silica-based film is 100 ppb or less.