JP2003171616A5 - - Google Patents
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- Publication number
- JP2003171616A5 JP2003171616A5 JP2001370441A JP2001370441A JP2003171616A5 JP 2003171616 A5 JP2003171616 A5 JP 2003171616A5 JP 2001370441 A JP2001370441 A JP 2001370441A JP 2001370441 A JP2001370441 A JP 2001370441A JP 2003171616 A5 JP2003171616 A5 JP 2003171616A5
- Authority
- JP
- Japan
- Prior art keywords
- atom
- silica
- component
- composition
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004429 atom Chemical group 0.000 claims 33
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 26
- 229910052710 silicon Inorganic materials 0.000 claims 13
- 239000000377 silicon dioxide Substances 0.000 claims 13
- 125000004432 carbon atom Chemical group C* 0.000 claims 5
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 5
- 125000001153 fluoro group Chemical group F* 0.000 claims 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 5
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 5
- 125000004437 phosphorous atom Chemical group 0.000 claims 5
- 239000011347 resin Substances 0.000 claims 5
- 229920005989 resin Polymers 0.000 claims 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 4
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 150000003863 ammonium salts Chemical class 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000009833 condensation Methods 0.000 claims 1
- 230000005494 condensation Effects 0.000 claims 1
- 238000010304 firing Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 230000003301 hydrolyzing effect Effects 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 239000003039 volatile agent Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001370441A JP3702842B2 (ja) | 2001-12-04 | 2001-12-04 | シリカ系被膜形成用組成物、シリカ系被膜、シリカ系被膜の製造方法及び電子部品 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001370441A JP3702842B2 (ja) | 2001-12-04 | 2001-12-04 | シリカ系被膜形成用組成物、シリカ系被膜、シリカ系被膜の製造方法及び電子部品 |
Related Child Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004260262A Division JP2005042118A (ja) | 2004-09-07 | 2004-09-07 | シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品 |
| JP2004316467A Division JP2005105284A (ja) | 2004-10-29 | 2004-10-29 | シリカ系被膜形成用組成物、シリカ系被膜、シリカ系被膜の製造方法及び電子部品 |
| JP2004316470A Division JP2005072615A (ja) | 2004-10-29 | 2004-10-29 | シリカ系被膜形成用組成物、シリカ系被膜、シリカ系被膜の製造方法及び電子部品 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003171616A JP2003171616A (ja) | 2003-06-20 |
| JP2003171616A5 true JP2003171616A5 (enExample) | 2005-07-07 |
| JP3702842B2 JP3702842B2 (ja) | 2005-10-05 |
Family
ID=19179665
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001370441A Expired - Fee Related JP3702842B2 (ja) | 2001-12-04 | 2001-12-04 | シリカ系被膜形成用組成物、シリカ系被膜、シリカ系被膜の製造方法及び電子部品 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3702842B2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100820992B1 (ko) | 2002-02-27 | 2008-04-10 | 히다치 가세고교 가부시끼가이샤 | 실리카계 피막형성용 조성물, 실리카계 피막 및 그제조방법 및 전자부품 |
| US7687590B2 (en) | 2002-02-27 | 2010-03-30 | Hitachi Chemical Company, Ltd. | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts |
| US7682701B2 (en) | 2002-02-27 | 2010-03-23 | Hitachi Chemical Co., Ltd. | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts |
| JP2004277502A (ja) * | 2003-03-13 | 2004-10-07 | Hitachi Chem Co Ltd | シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法並びにシリカ系被膜を備える電子部品 |
| JP2005314616A (ja) * | 2004-04-30 | 2005-11-10 | Shin Etsu Chem Co Ltd | シリコーンコーティング組成物及び被覆物品 |
| TW200605220A (en) * | 2004-06-21 | 2006-02-01 | Hitachi Chemical Co Ltd | Organic siloxane film, semiconductor device using same, flat panel display and raw material liquid |
| US20060047034A1 (en) | 2004-09-02 | 2006-03-02 | Haruaki Sakurai | Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film |
| JP4756128B2 (ja) * | 2004-10-20 | 2011-08-24 | 日揮触媒化成株式会社 | 半導体加工用保護膜形成用塗布液、その調製方法およびこれより得られる半導体加工用保護膜 |
| WO2006068181A1 (ja) * | 2004-12-21 | 2006-06-29 | Hitachi Chemical Company, Ltd. | 被膜、シリカ系被膜及びその形成方法、シリカ系被膜形成用組成物、並びに電子部品 |
| JP2006213908A (ja) * | 2004-12-21 | 2006-08-17 | Hitachi Chem Co Ltd | シリカ系被膜形成用組成物、シリカ系被膜の形成方法、シリカ系被膜、及び、電子部品 |
| JP2007254678A (ja) * | 2006-03-24 | 2007-10-04 | Tokyo Ohka Kogyo Co Ltd | シリカ系被膜形成用組成物およびシリカ系被膜 |
-
2001
- 2001-12-04 JP JP2001370441A patent/JP3702842B2/ja not_active Expired - Fee Related
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