JPH1017383A5 - - Google Patents
Info
- Publication number
- JPH1017383A5 JPH1017383A5 JP1997027080A JP2708097A JPH1017383A5 JP H1017383 A5 JPH1017383 A5 JP H1017383A5 JP 1997027080 A JP1997027080 A JP 1997027080A JP 2708097 A JP2708097 A JP 2708097A JP H1017383 A5 JPH1017383 A5 JP H1017383A5
- Authority
- JP
- Japan
- Prior art keywords
- coating composition
- coating
- group
- silicon
- electronic substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/605576 | 1996-02-22 | ||
| US08/605,576 US5707683A (en) | 1996-02-22 | 1996-02-22 | Electronic coating composition method of coating an electronic substrate, composition and article |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH1017383A JPH1017383A (ja) | 1998-01-20 |
| JPH1017383A5 true JPH1017383A5 (enExample) | 2004-12-09 |
Family
ID=24424264
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9027080A Pending JPH1017383A (ja) | 1996-02-22 | 1997-02-10 | エレクトロニクス被覆組成物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5707683A (enExample) |
| EP (1) | EP0791567B1 (enExample) |
| JP (1) | JPH1017383A (enExample) |
| KR (1) | KR970062005A (enExample) |
| DE (1) | DE69725634T2 (enExample) |
| TW (1) | TW438870B (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6020410A (en) * | 1996-10-29 | 2000-02-01 | Alliedsignal Inc. | Stable solution of a silsesquioxane or siloxane resin and a silicone solvent |
| US6015457A (en) * | 1997-04-21 | 2000-01-18 | Alliedsignal Inc. | Stable inorganic polymers |
| US6143855A (en) * | 1997-04-21 | 2000-11-07 | Alliedsignal Inc. | Organohydridosiloxane resins with high organic content |
| US6743856B1 (en) | 1997-04-21 | 2004-06-01 | Honeywell International Inc. | Synthesis of siloxane resins |
| US6218497B1 (en) | 1997-04-21 | 2001-04-17 | Alliedsignal Inc. | Organohydridosiloxane resins with low organic content |
| US6444008B1 (en) | 1998-03-19 | 2002-09-03 | Cabot Corporation | Paint and coating compositions containing tantalum and/or niobium powders |
| US6218020B1 (en) | 1999-01-07 | 2001-04-17 | Alliedsignal Inc. | Dielectric films from organohydridosiloxane resins with high organic content |
| US6177199B1 (en) | 1999-01-07 | 2001-01-23 | Alliedsignal Inc. | Dielectric films from organohydridosiloxane resins with low organic content |
| JP2000119595A (ja) * | 1998-10-14 | 2000-04-25 | Shin Etsu Chem Co Ltd | 焼成皮膜形成用オルガノポリシロキサン組成物 |
| US6331329B1 (en) | 1999-05-17 | 2001-12-18 | University Of Massachusetts | Surface modification using hydridosilanes to prepare monolayers |
| DE19930782A1 (de) * | 1999-07-03 | 2001-01-04 | Bosch Gmbh Robert | Verfahren zum selektiven Beschichten keramischer Oberflächenbereiche |
| US6440550B1 (en) * | 1999-10-18 | 2002-08-27 | Honeywell International Inc. | Deposition of fluorosilsesquioxane films |
| US6472076B1 (en) | 1999-10-18 | 2002-10-29 | Honeywell International Inc. | Deposition of organosilsesquioxane films |
| US7264668B2 (en) | 2001-10-16 | 2007-09-04 | The Chinese University Of Hong Kong | Decorative hard coating and method for manufacture |
| US11482454B2 (en) * | 2021-02-17 | 2022-10-25 | Tokyo Electron Limited | Methods for forming self-aligned contacts using spin-on silicon carbide |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4756977A (en) * | 1986-12-03 | 1988-07-12 | Dow Corning Corporation | Multilayer ceramics from hydrogen silsesquioxane |
| US4749631B1 (en) * | 1986-12-04 | 1993-03-23 | Multilayer ceramics from silicate esters | |
| US5380553A (en) * | 1990-12-24 | 1995-01-10 | Dow Corning Corporation | Reverse direction pyrolysis processing |
| US5145723A (en) * | 1991-06-05 | 1992-09-08 | Dow Corning Corporation | Process for coating a substrate with silica |
| EP0560617A3 (en) * | 1992-03-13 | 1993-11-24 | Kawasaki Steel Co | Method of manufacturing insulating film on semiconductor device and apparatus for carrying out the same |
| US5436029A (en) * | 1992-07-13 | 1995-07-25 | Dow Corning Corporation | Curing silicon hydride containing materials by exposure to nitrous oxide |
| JP3174416B2 (ja) * | 1992-12-10 | 2001-06-11 | ダウ・コ−ニング・コ−ポレ−ション | 酸化ケイ素膜の形成方法 |
| JP3174417B2 (ja) * | 1992-12-11 | 2001-06-11 | ダウ・コ−ニング・コ−ポレ−ション | 酸化ケイ素膜の形成方法 |
| JP3210457B2 (ja) * | 1992-12-14 | 2001-09-17 | ダウ・コ−ニング・コ−ポレ−ション | 酸化ケイ素膜の形成方法 |
| US5380555A (en) * | 1993-02-09 | 1995-01-10 | Dow Corning Toray Silicone Co., Ltd. | Methods for the formation of a silicon oxide film |
-
1996
- 1996-02-22 US US08/605,576 patent/US5707683A/en not_active Expired - Fee Related
-
1997
- 1997-02-10 EP EP97300830A patent/EP0791567B1/en not_active Expired - Lifetime
- 1997-02-10 JP JP9027080A patent/JPH1017383A/ja active Pending
- 1997-02-10 DE DE69725634T patent/DE69725634T2/de not_active Expired - Fee Related
- 1997-02-17 TW TW086101834A patent/TW438870B/zh active
- 1997-02-20 KR KR1019970005068A patent/KR970062005A/ko not_active Ceased
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