JP2005042118A5 - - Google Patents
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- JP2005042118A5 JP2005042118A5 JP2004260262A JP2004260262A JP2005042118A5 JP 2005042118 A5 JP2005042118 A5 JP 2005042118A5 JP 2004260262 A JP2004260262 A JP 2004260262A JP 2004260262 A JP2004260262 A JP 2004260262A JP 2005042118 A5 JP2005042118 A5 JP 2005042118A5
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004260262A JP2005042118A (ja) | 2004-09-07 | 2004-09-07 | シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004260262A JP2005042118A (ja) | 2004-09-07 | 2004-09-07 | シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001370441A Division JP3702842B2 (ja) | 2001-12-04 | 2001-12-04 | シリカ系被膜形成用組成物、シリカ系被膜、シリカ系被膜の製造方法及び電子部品 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005042118A JP2005042118A (ja) | 2005-02-17 |
| JP2005042118A5 true JP2005042118A5 (enExample) | 2005-08-11 |
Family
ID=34270241
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004260262A Pending JP2005042118A (ja) | 2004-09-07 | 2004-09-07 | シリカ系被膜形成用組成物、シリカ系被膜の製造方法及び電子部品 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005042118A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8784985B2 (en) | 2009-06-10 | 2014-07-22 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| US8901268B2 (en) | 2004-08-03 | 2014-12-02 | Ahila Krishnamoorthy | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6803842B2 (ja) | 2015-04-13 | 2020-12-23 | ハネウェル・インターナショナル・インコーポレーテッドHoneywell International Inc. | オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング |
| CN112479601B (zh) * | 2020-09-27 | 2022-05-13 | 比亚迪股份有限公司 | 一种覆膜制品及其制备方法、电子设备壳体 |
-
2004
- 2004-09-07 JP JP2004260262A patent/JP2005042118A/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8901268B2 (en) | 2004-08-03 | 2014-12-02 | Ahila Krishnamoorthy | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof |
| US8784985B2 (en) | 2009-06-10 | 2014-07-22 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
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