WO2009022583A1 - 多孔質シリカ前駆体組成物及びその作製方法、多孔質シリカ膜及びその形成方法、半導体素子、画像表示装置、並びに液晶表示装置 - Google Patents

多孔質シリカ前駆体組成物及びその作製方法、多孔質シリカ膜及びその形成方法、半導体素子、画像表示装置、並びに液晶表示装置 Download PDF

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WO2009022583A1
WO2009022583A1 PCT/JP2008/064046 JP2008064046W WO2009022583A1 WO 2009022583 A1 WO2009022583 A1 WO 2009022583A1 JP 2008064046 W JP2008064046 W JP 2008064046W WO 2009022583 A1 WO2009022583 A1 WO 2009022583A1
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WIPO (PCT)
Prior art keywords
porous silica
display device
same
precursor composition
liquid crystal
Prior art date
Application number
PCT/JP2008/064046
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English (en)
French (fr)
Inventor
Takahiro Nakayama
Tatsuhiro Nozue
Hirohiko Murakami
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Ulvac, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac, Inc. filed Critical Ulvac, Inc.
Priority to DE112008002142T priority Critical patent/DE112008002142T5/de
Priority to US12/670,117 priority patent/US8471140B2/en
Priority to JP2009528087A priority patent/JP5586227B2/ja
Priority to KR1020107002372A priority patent/KR101167548B1/ko
Priority to CN200880100611A priority patent/CN101765561A/zh
Publication of WO2009022583A1 publication Critical patent/WO2009022583A1/ja

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/314—Inorganic layers
    • H01L21/316—Inorganic layers composed of oxides or glassy oxides or oxide based glass
    • H01L21/31695—Deposition of porous oxides or porous glassy oxides or oxide based porous glass
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/02—Polysilicates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
    • H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02203—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being porous
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
    • H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
    • H01L21/02214—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen
    • H01L21/02216—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
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    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
    • H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
    • H01L21/02337—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to a gas or vapour
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • H—ELECTRICITY
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    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
    • H01L23/5329—Insulating materials
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    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/3027—IV compounds
    • H01S5/3031—Si
    • H01S5/304—Si porous Si

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Silicon Compounds (AREA)
  • Formation Of Insulating Films (AREA)
  • Paints Or Removers (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)

Abstract

　多孔質シリカ前駆体組成物が、化学式１：　Ｒ１ ｍ（Ｒ２－Ｏ）４－ｍＳｉ（式中、Ｒ１及びＲ２はアルキル基であって、同一であっても異なっていてもよく、ｍは０～３のいずれかの整数を示す）で表される有機シランと、水と、アルコールと、化学式２：　Ｒ３Ｎ（Ｒ４）３Ｘ（式中、Ｒ３及びＲ４はアルキル基であって、同一であっても異なっていてもよく、Ｘはハロゲン原子を示す）で表される第４級アンモニウム化合物とを含有してなり、これら成分を混合して作製される。多孔質シリカ前駆体組成物を塗布、焼成して多孔質シリカ膜を形成する。多孔質シリカ膜を有する半導体素子、画像表示素子、液晶表示素子。
PCT/JP2008/064046 2007-08-10 2008-08-05 多孔質シリカ前駆体組成物及びその作製方法、多孔質シリカ膜及びその形成方法、半導体素子、画像表示装置、並びに液晶表示装置 WO2009022583A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE112008002142T DE112008002142T5 (de) 2007-08-10 2008-08-05 Vorläuferzusammensetzung für poröse Siliziumdioxid und Verfahren zur Herstellung der Vorläuferzusammensetzung, poröser Siliziumdioxidfilm und Verfahren zur Herstellung des porösen Siliziumdioxidfilms, Halbleiterelement, Gerät zur Anzeige eines Bilds sowie Flüssigkristallanzeige
US12/670,117 US8471140B2 (en) 2007-08-10 2008-08-05 Porous silica precursor composition and method for preparing the precursor composition, porous silica film and method for preparing the porous silica film, semiconductor element, apparatus for displaying an image, as well as liquid crystal display
JP2009528087A JP5586227B2 (ja) 2007-08-10 2008-08-05 多孔質シリカ前駆体組成物及びその作製方法、多孔質シリカ膜及びその形成方法、半導体素子、画像表示装置、並びに液晶表示装置
KR1020107002372A KR101167548B1 (ko) 2007-08-10 2008-08-05 다공질 실리카 전구체 조성물 및 그 제조 방법, 다공질 실리카막 및 그 형성 방법, 반도체 소자, 화상 표시 장치, 그리고 액정 표시 장치
CN200880100611A CN101765561A (zh) 2007-08-10 2008-08-05 多孔质二氧化硅前体组合物及其制备方法、多孔质二氧化硅膜及其形成方法、半导体元件、图像显示装置及液晶显示装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007209486 2007-08-10
JP2007-209486 2007-08-10

Publications (1)

Publication Number Publication Date
WO2009022583A1 true WO2009022583A1 (ja) 2009-02-19

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PCT/JP2008/064046 WO2009022583A1 (ja) 2007-08-10 2008-08-05 多孔質シリカ前駆体組成物及びその作製方法、多孔質シリカ膜及びその形成方法、半導体素子、画像表示装置、並びに液晶表示装置

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US (1) US8471140B2 (ja)
JP (1) JP5586227B2 (ja)
KR (1) KR101167548B1 (ja)
CN (1) CN101765561A (ja)
DE (1) DE112008002142T5 (ja)
TW (1) TW200924060A (ja)
WO (1) WO2009022583A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010254559A (ja) * 2009-03-31 2010-11-11 Mitsubishi Chemicals Corp シリカ多孔質体の製造方法
JP2017039618A (ja) * 2015-08-19 2017-02-23 京セラドキュメントソリューションズ株式会社 シリカ粉体及び正帯電性トナー
WO2022059353A1 (ja) * 2020-09-18 2022-03-24 Ａｇｃ株式会社 シリカ膜付き基板

Families Citing this family (4)

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Publication number Priority date Publication date Assignee Title
FR2980040B1 (fr) * 2011-09-14 2016-02-05 Commissariat Energie Atomique Transistor organique a effet de champ
CN108461383A (zh) * 2018-02-08 2018-08-28 澳洋集团有限公司 降低SiO2钝化层中孔隙的方法及LED的制备方法
CN110330235B (zh) * 2019-06-11 2021-10-01 惠科股份有限公司 多孔二氧化硅薄膜及其制备方法、以及显示面板
KR102531279B1 (ko) * 2021-01-15 2023-05-11 한국세라믹기술원 비불소계 알킬실란 표면 처리에 의한 소수성 메조포러스 실리카 및 이의 제조방법

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JP3954842B2 (ja) 2001-08-02 2007-08-08 株式会社アルバック 疎水性多孔質材料の製造方法
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Patent Citations (2)

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JP2005154723A (ja) * 2003-10-30 2005-06-16 Jsr Corp 絶縁膜形成用組成物、絶縁膜形成用組成物の製造方法、絶縁膜およびその形成方法
JP2007134420A (ja) * 2005-11-09 2007-05-31 Ulvac Japan Ltd 疎水性多孔質シリカ材料による構造物内部の埋め込み方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010254559A (ja) * 2009-03-31 2010-11-11 Mitsubishi Chemicals Corp シリカ多孔質体の製造方法
JP2017039618A (ja) * 2015-08-19 2017-02-23 京セラドキュメントソリューションズ株式会社 シリカ粉体及び正帯電性トナー
WO2022059353A1 (ja) * 2020-09-18 2022-03-24 Ａｇｃ株式会社 シリカ膜付き基板

Also Published As

Publication number Publication date
JPWO2009022583A1 (ja) 2010-11-11
KR20100038423A (ko) 2010-04-14
KR101167548B1 (ko) 2012-07-20
TW200924060A (en) 2009-06-01
DE112008002142T5 (de) 2010-07-15
JP5586227B2 (ja) 2014-09-10
US8471140B2 (en) 2013-06-25
CN101765561A (zh) 2010-06-30
US20100220274A1 (en) 2010-09-02

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