JP2002539331A - 支持体に硬磁性ｓｅ−ｆｅ−ｂ材を被着する方法と装置 - Google Patents

支持体に硬磁性ｓｅ−ｆｅ−ｂ材を被着する方法と装置

Info

Publication number
JP2002539331A
JP2002539331A JP2000605800A JP2000605800A JP2002539331A JP 2002539331 A JP2002539331 A JP 2002539331A JP 2000605800 A JP2000605800 A JP 2000605800A JP 2000605800 A JP2000605800 A JP 2000605800A JP 2002539331 A JP2002539331 A JP 2002539331A
Authority
JP
Japan
Prior art keywords
support
temperature
deposition
coating
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000605800A
Other languages
English (en)
Japanese (ja)
Inventor
リーガー、ゴットハルト
ヴェッカー、ヨアヒム
ドゥーダ、トーマス
ウンターベルク、ヴォルフラム
ローデヴァルト、ヴェルナー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10002346A external-priority patent/DE10002346A1/de
Application filed by Siemens AG filed Critical Siemens AG
Publication of JP2002539331A publication Critical patent/JP2002539331A/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C23C4/08—Metallic material containing only metal elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/126—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing rare earth metals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Thin Magnetic Films (AREA)
  • Hard Magnetic Materials (AREA)
JP2000605800A 1999-03-16 2000-03-13 支持体に硬磁性ｓｅ−ｆｅ−ｂ材を被着する方法と装置 Withdrawn JP2002539331A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE19911609 1999-03-16
DE19911609.1 2000-01-20
DE10002346.0 2000-01-20
DE10002346A DE10002346A1 (de) 1999-03-16 2000-01-20 Verfahren und Vorrichtung zur Beschichtung eines Trägerkörpers mit einem hartmagnetischen SE-FE-B-Material mittels Plasmaspritzens
PCT/DE2000/000781 WO2000055384A1 (de) 1999-03-16 2000-03-13 Verfahren und vorrichtung zur beschichtung eines trägerkörpers mit einem hartmagnetischen se-fe-b-material mittels plasmaspritzens

Publications (1)

Publication Number Publication Date
JP2002539331A true JP2002539331A (ja) 2002-11-19

Family

ID=26003944

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000605800A Withdrawn JP2002539331A (ja) 1999-03-16 2000-03-13 支持体に硬磁性ｓｅ−ｆｅ−ｂ材を被着する方法と装置

Country Status (3)

Country Link
EP (1) EP1161570B1 (de)
JP (1) JP2002539331A (de)
WO (1) WO2000055384A1 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107254656A (zh) * 2017-08-17 2017-10-17 桂林电子科技大学 钕铁硼永磁材料表面等离子喷涂陶瓷层及其制备方法
KR20210126827A (ko) * 2020-04-10 2021-10-21 (주)티티에스 냉각장치를 포함하는 지그 및 이를 포함하는 슬러리 플라즈마 스프레이 장치

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5599455B2 (ja) * 2009-05-08 2014-10-01 ズルツァー・メットコ・アクチェンゲゼルシャフト 基材のコーティングのための方法及びコーティングを有する基材
DE102009032222A1 (de) 2009-07-08 2010-04-15 Daimler Ag Elektrische Maschine sowie Verfahren zum Herstellen einer elektrischen Maschine
CN101830865B (zh) * 2010-03-19 2012-05-02 华东交通大学 一种含羟基的噻二唑衍生物及其制备方法和应用
CN109468576B (zh) * 2018-12-29 2021-01-22 安徽大地熊新材料股份有限公司 一种烧结钕铁硼磁体表面高耐蚀涂层及其制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4297388A (en) * 1978-11-06 1981-10-27 The Charles Stark Draper Laboratory, Inc. Process of making permanent magnets
US4897283A (en) * 1985-12-20 1990-01-30 The Charles Stark Draper Laboratory, Inc. Process of producing aligned permanent magnets
JPH04214849A (ja) * 1990-12-14 1992-08-05 Toyota Autom Loom Works Ltd トルクセンサ用磁歪膜の形成方法
AU6733196A (en) * 1995-08-30 1997-03-19 Danfoss A/S Method of producing magnetic poles on a base member, and rotor of an electrical machine

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107254656A (zh) * 2017-08-17 2017-10-17 桂林电子科技大学 钕铁硼永磁材料表面等离子喷涂陶瓷层及其制备方法
CN107254656B (zh) * 2017-08-17 2023-06-13 桂林电子科技大学 钕铁硼永磁材料表面等离子喷涂陶瓷层及其制备方法
KR20210126827A (ko) * 2020-04-10 2021-10-21 (주)티티에스 냉각장치를 포함하는 지그 및 이를 포함하는 슬러리 플라즈마 스프레이 장치
KR102396336B1 (ko) 2020-04-10 2022-05-11 (주)티티에스 냉각장치를 포함하는 지그 및 이를 포함하는 슬러리 플라즈마 스프레이 장치

Also Published As

Publication number Publication date
EP1161570B1 (de) 2003-07-30
EP1161570A1 (de) 2001-12-12
WO2000055384A1 (de) 2000-09-21

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A300 Withdrawal of application because of no request for examination

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Effective date: 20070605